Advanced hydrogen passivation that mitigates hydrogen-induced recombination (HIR) and surface passivation deterioration in PV devices

Patent metadata

Field	Value
Publication number	US-11031520-B2
Application number	US-201716461852-A
Country	US
Kind code	B2
Filing date	Nov 22, 2017
Priority date	Nov 22, 2016
Publication date	Jun 8, 2021
Grant date	Jun 8, 2021

Abstract

The present disclosure provides methodologies for manufacturing photovoltaic devices. In particular, the disclosure relates to the use of hydrogen during manufacturing of photovoltaic devices for passivating defects in the silicon and addressing light-induced degradation. The methodologies in the present disclosures take advantage of generation and manipulation of hydrogen in the neutral or charged state to optimise defect passivation. Some of the methodologies disclose use thermal treatments, illumination with sub-bandgap photons, electric fields or defects in the silicon to control the state of charge or hydrogen, move hydrogen to different locations in the device or retain hydrogen at specific locations.

First claim

The claims as defined in the invention are as follows:

1. A method for processing a silicon-based photovoltaic device having doped silicon regions that are doped with a hydrogen concentration of at least 1e16 atoms/cm 3 , the method comprising the steps of:
(a) providing the photovoltaic device, wherein the photovoltaic device includes hydrogen;
(b) thermally treating at least a portion of the photovoltaic device by heating the photovoltaic device in an environment with a temperature above 600° C., such that hydrogen migrates towards at least one of the doped regions so that a concentration of hydrogen within the at least one of the doped regions increases to above a minimum concentration of hydrogen at which hydrogen causes degradation to the electrical characteristics of that region;
(c) applying an electric field across at least a portion of the photovoltaic device in a manner such that, charged hydrogen atoms are driven away, by the electric field, from the at least one of the doped silicon regions;
wherein:
step (b) is conducted such that hydrogen atoms distribute within the at least one of the doped silicon regions;
step (c) comprises applying a forward biasing electric field across the photovoltaic device to promote drifting of charged hydrogen atoms away from regions with high atomic hydrogen concentration; and
step (c) is conducted such that hydrogen migrates out of the at least one of the doped silicon regions.

2. The method of claim 1 wherein step (c) is performed in a manner such that negatively charged hydrogen atoms are drifted away from a p-type regions of the photovoltaic device and positively charged hydrogen atoms are drifted away from an n-type regions of the photovoltaic device.

3. A method for processing a silicon-based photovoltaic device having doped silicon regions that are doped with a hydrogen concentration of at least 1e16 atoms/cm 3 , the photovoltaic device comprising:
a first silicon doped region with a doping concentration below a doping threshold;
a second silicon doped region with a doping concentration above the doping threshold; and
a dielectric region;
wherein the first silicon doped region, the second silicon doped region and the dielectric region contain atomic hydrogen that has been introduced during a hydrogenation step; with respective hydrogen concentrations being at least 1e16 atoms/cm 3 ;
wherein the method comprising the steps of treating the photovoltaic device by heating the photovoltaic device in an environment with a temperature above 150° C., such that atomic hydrogen redistributes throughout the photovoltaic device and the concentration of atomic hydrogen at the first silicon doped region and the second silicon doped region drops below 1e16 atoms/cm 3 .

4. The method of claim 3 wherein, the step of treating the device is such that light-induced degradation during light-soaking or subsequent operation in an electric field is reduced or eliminated.

5. The method of claim 3 wherein, the step of treating the device is such that the concentration of atomic hydrogen drops below 1e16 atoms/cm 3 through the entire device.

6. The method of claim 3 wherein, the step of treating the device is such that the concentration of atomic hydrogen within the first and second silicon doped regions becomes such that Hydrogen Induced Recombination at the regions no longer affects a performance of the device.

7. The method of claim 1 , wherein a first intensity of the electric field is applied for a first period of time and a second intensity of the electric field is applied for a second period of time.

8. The method of claim 1 , wherein the electric field is a pulsed field.

9. The method of claim 3 , wherein the step of treating the photovoltaic device is such that the concentration of atomic hydrogen within the first and second silicon doped regions becomes lower than 1e15 atoms/cm3.

Assignees

• Newsouth Innovations Pty Ltd

Inventors

• Wenham Stuart Ross
• Ciesla Alison
• Bagnall Darren
• Chen Ran
• Abbott Malcolm David
• Hallam Brett Jason
• Chan Catherine Emily
• Chong Chee Mun
• Chen Daniel
• Payne David Neil
• Mai Ly
• Kim Moonyong
• Fung Tsun Hang
• Shi Zhengrong

Classifications

• H10F71/128

  Annealing · CPC title

• H10F71/129 Primary

  Passivating · CPC title

• H10F77/1223

  characterised by the dopants · CPC title

• H10F71/121

  The active layers comprising only Group IV materials · CPC title

• Y02P70/50

  Manufacturing or production processes characterised by the final manufactured product · CPC title