Photoelectric conversion element, photoelectric conversion module, and solar photovoltaic power generation system

US11031516B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11031516-B2
Application numberUS-201415031838-A
CountryUS
Kind codeB2
Filing dateOct 24, 2014
Priority dateOct 25, 2013
Publication dateJun 8, 2021
Grant dateJun 8, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

There is provided a photoelectric conversion element which can prevent the contact resistance between a non-crystalline semiconductor layer containing impurities and an electrode formed on the non-crystalline semiconductor layer from increasing, and can improve the element characteristics. A photoelectric conversion element (10) includes a semiconductor substrate (12), a first semiconductor layer (20n), a second semiconductor layer (20p), a first electrode (22n), and a second electrode (22p). The first semiconductor layer has a first conductive type. The second semiconductor layer has a second conductive type. The first electrode is formed on the first semiconductor layer. The second electrode is formed on the second semiconductor layer. The first electrode includes a first transparent conductive layer (26n) formed on the first semiconductor layer, and a first metal layer (28n) formed on the first transparent conductive layer. The first metal layer includes a plurality of metal crystal grains in which the average crystal grain size in the in-surface direction of the first metal layer is greater than the thickness of the first metal layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A photoelectric conversion element comprising: a semiconductor substrate; a first non-crystalline semiconductor layer having a first conductive type; a second non-crystalline semiconductor layer having a second conductive type opposite to the first conductive type; a first electrode which is in contact with the first non-crystalline semiconductor layer; and a second electrode which is in contact with the second non-crystalline semiconductor layer, wherein the first electrode includes a first transparent conductive layer formed on the first non-crystalline semiconductor layer and a first metal layer formed on the first transparent conductive layer, wherein the first metal layer includes a plurality of metal crystal grains, wherein an average crystal grain size of the plurality of metal crystal grains in an in-surface direction of the first metal layer is greater than 1.5 times a thickness of the first metal layer, wherein the plurality of metal crystal grains includes metal crystal grains oriented in a <110> direction, metal crystal grains oriented in a <100> direction, and metal crystal grains oriented in a <111> direction, wherein each of the <100> direction, the <110> direction, and the <111> direction is within 10 degrees with respect to a thickness direction of the semiconductor substrate, and wherein an area of the plurality of metal crystal grains oriented in the <111> direction is greater than an area of the plurality of metal crystal grains oriented in the <100> direction and an area of the plurality of metal crystal grains oriented in the <110> direction. 2. The photoelectric conversion element according to claim 1 , wherein the first electrode is made of a metal film which has silver as a main component. 3. The photoelectric conversion element according to claim 1 , wherein the first non-crystalline semiconductor layer and the second non-crystalline semiconductor layer are formed on a rear surface opposite to a light-receiving surface on the semiconductor substrate. 4. The photoelectric conversion element according to claim 1 , wherein the first conductive type is an n-type, and wherein the average crystal grain size is less than 3.33 times the thickness of the first metal layer. 5. The photoelectric conversion element according to claim 1 , wherein the first conductive type is an n-type, and wherein the average crystal grain size is less than or equal to 2.85 times the thickness of the first metal layer. 6. The photoelectric conversion element according to claim 1 , wherein the first conductive type is an n-type, and wherein the average crystal grain size is greater than or equal to 1.55 times and less than or equal to 2.85 times the thickness of the first metal layer. 7. The photoelectric conversion element according to claim 1 , wherein the first conductive type is a p-type, and wherein the average crystal grain size is less than or equal to 3.3 times the thickness of the first metal layer. 8. The photoelectric conversion element according to claim 1 , wherein the first conductive type is a p-type, and wherein the average crystal grain size is greater than 1.5 times and less than or equal to 2.95 times the thickness of the first metal layer. 9. The photoelectric conversion element according to claim 1 , wherein the first conductive type is a p-type, and wherein the average crystal grain size is greater than or equal to 1.53 times and less than or equal to 2.15 times the thickness of the first metal layer. 10. The photoelectric conversion element according to claim 1 , wherein the second electrode includes a second transparent conductive layer formed on the second non-crystalline semiconductor layer, and a second metal layer formed on the second transparent conductive layer, wherein the second metal layer includes a plurality of metal crystal grains, wherein a contact area between the second electrode and the second non-crystalline semiconductor layer is greater than or equal to 1 time a contact area between the first electrode and the first non-crystalline semiconductor layer, and wherein an average value of the average crystal grain size of the metal crystal grain in the first metal layer, and the average crystal grain size of the metal crystal grain in the second metal layer, is greater than 1.5 times and less than or equal to 2.15 times the thickness of the first metal layer and the second metal layer.

Assignees

Inventors

Classifications

  • for photovoltaic cells · CPC title

  • Arrangements for electrodes of back-contact photovoltaic cells · CPC title

  • for photovoltaic cells · CPC title

  • Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies · CPC title

  • H10F10/166Primary

    the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells · CPC title

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What does patent US11031516B2 cover?
There is provided a photoelectric conversion element which can prevent the contact resistance between a non-crystalline semiconductor layer containing impurities and an electrode formed on the non-crystalline semiconductor layer from increasing, and can improve the element characteristics. A photoelectric conversion element (10) includes a semiconductor substrate (12), a first semiconductor lay…
Who is the assignee on this patent?
Sharp Kk
What technology area does this patent fall under?
Primary CPC classification H10F10/166. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 08 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).