Plasma-based methods and systems for treating waters with high electrical conductivity and/or low surface tension

US11027990B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11027990-B2
Application numberUS-201815987504-A
CountryUS
Kind codeB2
Filing dateMay 23, 2018
Priority dateMay 24, 2017
Publication dateJun 8, 2021
Grant dateJun 8, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

An electrical discharge plasma reactor system for treating a liquid, the reactor system including: a reactor chamber configured to hold the liquid and a gas; a discharge electrode disposed within the reactor chamber, wherein the discharge electrode is disposed within the gas; an opposing electrode disposed within the gas within the reactor chamber; one or more gas diffusers disposed within the liquid, wherein the one or more gas diffusers is configured to induce the generation of a layer of foam on a surface of the liquid in a plasma-contact region; and a power supply connected to the discharge electrode and/or the opposing electrode, the power supply configured to induce the discharge electrode and the opposing electrode to generate plasma in the plasma-contact region.

First claim

Opening claim text (preview).

What is claimed is: 1. An electrical discharge plasma reactor system for treating a liquid, the reactor system comprising: a reactor chamber configured to hold the liquid and a gas; a discharge electrode disposed within the reactor chamber, wherein the discharge electrode is disposed within the gas; an opposing electrode disposed within the gas within the reactor chamber; one or more gas diffusers disposed within the liquid, wherein the one or more gas diffusers is configured to induce the generation of a layer of foam on a surface of the liquid in a plasma-contact region; wherein the one or more gas diffusers are connected to the reactor chamber beneath the liquid, which is between the one or more gas diffusers and the gas; and a power supply connected to the discharge electrode and/or the opposing electrode, the power supply configured to induce the discharge electrode and the opposing electrode to generate plasma in the plasma-contact region. 2. The system of claim 1 , wherein the discharge electrode and the opposing electrode are separated by a distance such that the plasma generated forms a continuous spark that contacts the surface of the liquid as it spans the distance between the electrodes. 3. The system of claim 1 , wherein the one or more gas diffusers comprises a plurality of gas diffusers and each gas diffuser has a different gas flowrate to induce the generation of foam on the surface of the liquid. 4. The system of claim 1 , wherein the discharge electrode and the opposing electrode are separated by a distance such that the plasma generated forms distinct discharges that contact the surface of the liquid. 5. An electrical discharge plasma reactor system for treating a liquid, the reactor system comprising: a reactor chamber configured to hold the liquid and a gas; a discharge electrode disposed within the reactor chamber, wherein the discharge electrode is disposed within the gas; an opposing electrode disposed within the gas within the reactor chamber; one or more gas diffusers disposed within the liquid, wherein the one or more gas diffusers is configured to induce the generation of a layer of foam on a surface of the liquid in a plasma-contact region; wherein the one or more gas diffusers are connected to the reactor chamber beneath the liquid, which is between the one or more gas diffusers and the gas; and a power supply connected to the discharge electrode and/or the opposing electrode, the power supply configured to induce the discharge electrode and the opposing electrode to generate plasma in a plasma-contact region; wherein the discharge electrode and the opposing electrode are separated by a distance such that the plasma generated forms a continuous spark that contacts a surface of the liquid as it spans the distance between the electrodes. 6. The system of claim 5 , further comprising a weir configured to obstruct electrolytic conduction through the liquid in a region between the discharge electrode and opposing electrode. 7. The system of claim 5 , wherein each gas diffuser of the one or more gas diffusers has a different gas flowrate. 8. A method for treating a liquid, the method comprising the steps of: providing an electrical discharge plasma reactor including a reactor chamber configured to hold the liquid and a gas; positioning a discharge electrode in the reactor chamber above a surface of the liquid; positioning an opposing electrode in the reactor chamber above the surface of the liquid, wherein the opposing electrode is separated from the discharge electrode by an interelectrode gap; delivering voltage to at least the discharge electrode and inducing the discharge electrode and the opposing electrode to generate plasma in a plasma-contact region on the surface of the liquid to degrade at least one component dissolved within the liquid; and generating foam in the plasma-contact region on the surface of the liquid. 9. The method of claim 8 , further comprising the step of bubbling gas through a diffuser to generate the foam on the surface of the liquid. 10. The method of claim 9 , wherein the diffuser is arranged at least partially within the liquid and beneath the surface of the liquid. 11. The method of claim 8 , further comprising the step of generating a continuous spark that spans the inter-electrode gap between the discharge electrode and the opposing electrode, wherein the continuous spark contacts the surface of the liquid. 12. The method of claim 8 , further comprising the step of generating discrete plasma discharges from the discharge electrode and the opposing electrode, each contacting the surface of the liquid. 13. The method of claim 12 , further comprising the step of positioning an obstructive weir within the liquid between the discharge electrode and the opposing electrode to form a continuous spark. 14. The method of claim 8 , further comprising the step of bubbling gas through first and second diffusers to generate the foam on the surface of the liquid, wherein the first and second diffusers have different gas flowrates. 15. The method of claim 14 , wherein the gas flowrates of the first and second diffusers depend on where each diffuser is located within the reactor. 16. The method of claim 8 , wherein each of the discharge electrode and the opposing electrode is arranged a distance from the surface of the liquid and the distance is smaller than the inter-electrode gap. 17. The method of claim 8 , wherein the inter-electrode gap depends on a conductivity of the liquid. 18. The method of claim 8 , wherein the discharge electrode and the opposing electrode are at least partially disposed within the gas of the reactor chamber.

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11027990B2 cover?
An electrical discharge plasma reactor system for treating a liquid, the reactor system including: a reactor chamber configured to hold the liquid and a gas; a discharge electrode disposed within the reactor chamber, wherein the discharge electrode is disposed within the gas; an opposing electrode disposed within the gas within the reactor chamber; one or more gas diffusers disposed within the …
Who is the assignee on this patent?
Mededovic Selma, Holsen Thomas, Univ Clarkson
What technology area does this patent fall under?
Primary CPC classification C02F1/4608. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jun 08 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).