Support mount for a wiper blade, associated wiper blade and wiping system

US11027703B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11027703-B2
Application numberUS-201716339275-A
CountryUS
Kind codeB2
Filing dateOct 3, 2017
Priority dateOct 4, 2016
Publication dateJun 8, 2021
Grant dateJun 8, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The invention relates to a support mount (10) for a wiper blade, the mount (10) comprising a body having a main longitudinal extension direction, known as the main direction (X), the body comprising a first means for receiving a bending length and second means defining a lower housing (20), open, to hold an upper mounting stub for a wiper blade of the wiper, characterised in that the first means defines an upper housing (30) designed so as to cover the length along the main direction (X) and in that the upper housing (30) comprises a plurality of recesses (32, 32′, 32″) facilitating the bending of the mount (10), the recesses forming a pattern (M1-M10) on the surface of the upper housing (30), known as the recess distribution pattern (M1-M10). The invention also relates to a wiper blade comprising a mount (10) and a wiping system comprising such a wiper.

First claim

Opening claim text (preview).

The invention claimed is: 1. A support mount for a wiper blade, the mount comprising: a body having a longitudinal extension main direction termed the main direction, the body comprising a first means that receives a bending spine and second means defining an open lower housing to receive an upper mounting stub of a wiper rubber of the wiper, wherein the first means defines an upper housing that covers the spine along the main direction, wherein the upper housing includes a plurality of recesses facilitating the bending of the mount, the plurality of recesses forming a pattern on the surface of the upper housing, termed the recess distribution pattern, defined by the distribution and/or the orientation of the plurality of recesses, and wherein the plurality of recesses are separated with a pitch that varies along the main direction. 2. The mount as claimed in claim 1 , in which the recess distribution pattern comprises the plurality of recesses oriented substantially perpendicularly to the main direction. 3. The mount as claimed in claim 2 , in which the recess distribution pattern further comprises a plurality of recesses oriented substantially parallel to the main direction. 4. The mount as claimed in claim 1 , in which the recess distribution pattern comprises the plurality of recesses oriented relative to the main direction in at least one direction intersecting the main direction. 5. The mount as claimed in claim 1 , in which the recess distribution pattern comprises the plurality of recesses chasing out a curve, the curve extending substantially transversely to the main direction. 6. The mount as claimed in claim 1 , in which the lower housing also includes recesses. 7. A wiper blade comprising a mount as claimed in claim 1 . 8. A wiper system comprising at least one blade as claimed in claim 7 . 9. A support mount for a wiper blade, the mount comprising: a body having a longitudinal extension main direction termed the main direction, the body comprising a first means that receives a bending spine and second means defining an open lower housing to receive an upper mounting stub of a wiper rubber of the wiper, wherein the first means defines an upper housing that covers the spine along the main direction, wherein the upper housing includes a plurality of recesses facilitating the bending of the mount, the plurality of recesses forming a pattern on the surface of the upper housing, termed the recess distribution pattern, defined by the distribution and/or the orientation of the plurality of recesses, and the recess distribution pattern comprises the plurality of recesses chasing out a curve, the curve extending substantially transversely to the main direction.

Assignees

Inventors

Classifications

  • B60S1/3801Primary

    characterised by a blade support harness consisting of several articulated elements (B60S1/3803, B60S1/3806 take precedence) · CPC title

  • the backing strip being a channel-like element, e.g. not continuous · CPC title

  • Means of supporting or holding the squeegee or blade rubber · CPC title

  • Spoilers mounted on the squeegee or on the vertebra · CPC title

  • B60S1/3881Primary

    in additional element, e.g. spoiler · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11027703B2 cover?
The invention relates to a support mount (10) for a wiper blade, the mount (10) comprising a body having a main longitudinal extension direction, known as the main direction (X), the body comprising a first means for receiving a bending length and second means defining a lower housing (20), open, to hold an upper mounting stub for a wiper blade of the wiper, characterised in that the first mean…
Who is the assignee on this patent?
Valeo Systemes Dessuyage
What technology area does this patent fall under?
Primary CPC classification B60S1/3801. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 08 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).