Light field generation system including directionally-sensitive optical element for improved contrast

US11009770B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11009770-B2
Application numberUS-201916540650-A
CountryUS
Kind codeB2
Filing dateAug 14, 2019
Priority dateAug 14, 2018
Publication dateMay 18, 2021
Grant dateMay 18, 2021

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Abstract

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A light field generation system includes a two dimensional emitter array for projecting light and a directionally-sensitive optical element in front of the emitter array but before a directional diffuser. Certain classes of emitters are intended to project information principally along one axis (e.g. amplitude modulated in the horizontal plane, i.e. so that each eye sees a potentially different image) and are the basis of horizontal-parallax-only (HPO) displays. Examples include surface acoustic wave (SAW) modulators, such as edge-emitting or surface-emitting modulators. They often project undesired or stray light along directions along a different axis (e.g. vertically) and the diffuser will also spread the visibility of the stray light field components. Thus, the directionally-sensitive optical element will improve contrast in this scenario.

First claim

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What is claimed is: 1. A method for improving contrast in a light field generation system, comprising: projecting light with a two dimensional emitter array; blocking stray light with a directionally-sensitive optical element in front of the emitter array; and placing a directional diffuser after the directionally-sensitive optical element. 2. A light field generation system, including: a two dimensional emitter array for projecting light; a directionally-sensitive optical element in front of the emitter array; and a directional diffuser after the directionally-sensitive optical element. 3. A light field generation system, including: a two dimensional emitter array for projecting light; a directionally-sensitive optical element in front of the emitter array; and wherein the two dimensional emitter array comprises a two dimensional array of surface acoustic wave (SAW) modulators. 4. A system as claimed in claim 3 , wherein the SAW modulators are surface-emitting. 5. A system as claimed in claim 3 , wherein the SAW modulators are edge-emitting. 6. A light field generation system, including: a two dimensional emitter array for projecting light, wherein each emitter of the two dimensional emitter array projects light with controllable amplitudes in an x-z plane; and a directionally-sensitive optical element in front of the emitter array that blocks stray light along a y-axis direction from the emitter array. 7. A system as claimed in claim 6 , wherein the directionally-sensitive optical element comprises an aperture grille. 8. A system as claimed in claim 7 , wherein a pitch between apertures of the aperture grille matches a pitch between rows of emitters of the emitter array. 9. A system as claimed in claim 6 , wherein the directionally-sensitive optical element comprises microlouver material. 10. A system as claimed in claim 6 , wherein the directionally-sensitive optical element comprises arrays of diffractive optical elements, a reflective element, or a holographic optical element. 11. A system as claimed in claim 6 , wherein the light field generation system is a horizontal parallax only system. 12. A method for improving contrast in a light field generation system, comprising: projecting light with a two dimensional emitter array, with each emitter of the two dimensional emitter array projecting light with controllable amplitudes in an x-z plane; and blocking stray light along y-axis direction from the emitter array with a directionally-sensitive optical element in front of the emitter array. 13. A method as claimed in claim 12 , wherein the light field generation system is a horizontal parallax only system. 14. A method as claimed in claim 12 , wherein the two dimensional emitter array comprises a two dimensional array of surface acoustic wave (SAW) modulators. 15. A method as claimed in claim 14 , wherein the SAW modulators are edge-emitting. 16. A method as claimed in claim 14 , wherein the SAW modulators are surface-emitting. 17. A method as claimed in claim 12 , wherein the directionally-sensitive optical element comprises an aperture grille. 18. A method as claimed in claim 17 , wherein a pitch between apertures of the aperture grille matches a pitch between rows of emitters of the emitter array. 19. A method as claimed in claim 12 , wherein the directionally-sensitive optical element comprises microlouver material. 20. A method as claimed in claim 12 , wherein the directionally-sensitive optical element comprises arrays of diffractive optical elements, a reflective element, or a holographic optical element.

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What does patent US11009770B2 cover?
A light field generation system includes a two dimensional emitter array for projecting light and a directionally-sensitive optical element in front of the emitter array but before a directional diffuser. Certain classes of emitters are intended to project information principally along one axis (e.g. amplitude modulated in the horizontal plane, i.e. so that each eye sees a potentially different…
Who is the assignee on this patent?
Charles Stark Draper Laboratory Inc
What technology area does this patent fall under?
Primary CPC classification G02F1/335. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 18 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).