Photosensitive composition, color filter, pattern forming method, solid-state imaging device, and image display device

US11009739B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11009739-B2
Application numberUS-201816137856-A
CountryUS
Kind codeB2
Filing dateSep 21, 2018
Priority dateMar 25, 2016
Publication dateMay 18, 2021
Grant dateMay 18, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a photosensitive composition capable of forming a cured film having excellent adhesiveness and pattern forming properties, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The photosensitive composition includes a photopolymerization initiator I, a polymerizable monomer M having two or more groups having an ethylenically unsaturated double bond, and a halogenated zinc phthalocyanine, in which the polymerizable monomer M contains a polymerizable monomer M1 having three groups having an ethylenically unsaturated double bond, the photopolymerization initiator I contains a photopolymerization initiator I1 having a molar light absorption coefficient at a wavelength of 365 nm of 12,000 L·mol−1·cm−1 or more, and the ratio of the mass of the photopolymerization initiator I to the mass of the polymerizable monomer M is 0.15 or less in terms of the mass of the photopolymerization initiator I/the mass of the polymerizable monomer M.

First claim

Opening claim text (preview).

What is claimed is: 1. A photosensitive composition comprising: a photopolymerization initiator I; a polymerizable monomer M having two or more groups having an ethylenically unsaturated double bond; and a halogenated zinc phthalocyanine, wherein the polymerizable monomer M contains a polymerizable monomer M 1 having three groups having an ethylenically unsaturated double bond, the photopolymerization initiator I includes a photopolymerization initiator I 1 having a molar light absorption coefficient at a wavelength of 365 nm of 12,000 L·mol −1 ·cm −1 or more, and the ratio of the mass of the photopolymerization initiator I to the mass of the polymerizable monomer M is 0.15 or less in terms of the mass of the photopolymerization initiator I/the mass of the polymerizable monomer M. 2. The photosensitive composition according to claim 1 , wherein the polymerizable monomer M contains 50% to 100% by mass of the polymerizable monomer M 1 . 3. The photosensitive composition according to claim 1 , wherein the polymerizable monomer M 1 has an alkyleneoxy group. 4. The photosensitive composition according to claim 1 , wherein the photopolymerization initiator I 1 includes at least one selected from an oxime compound having a nitro group and an oxime compound having a naphthalene ring. 5. The photosensitive composition according to of claim 1 , wherein the photopolymerization initiator I 1 contains a compound represented by Formula (I-1), in Formula (I-1), Ar 1 and Ar 2 each independently represent an aromatic ring, Ar 3 represents an aryl group, R 2 and R 3 each independently represent an alkyl group or an aryl group, and at least one of Ar 1 to Ar 3 , R 2 , and R 3 has a fluorine atom, a group including a fluorine atom, or a nitro group as a substituent. 6. The photosensitive composition according to claim 1 , wherein the polymerizable monomer M contains 50% by mass or less of a polymerizable monomer M 2 having four or more groups having an ethylenically unsaturated double bond. 7. A color filter using the photosensitive composition according to claim 1 . 8. A solid-state imaging device comprising the color filter according to claim 7 . 9. An image display device comprising the color filter according to claim 7 . 10. A pattern forming method comprising: forming a photosensitive composition layer on a support, using the photosensitive composition according to claim 1 ; patternwise-exposing the photosensitive composition layer; and removing the unexposed area by development to form a pattern. 11. The pattern forming method according to claim 10 , wherein the exposure is carried out with i-rays.

Assignees

Inventors

Classifications

  • having substances, e.g. indicators, for forming visible images · CPC title

  • Filters, e.g. additive colour filters; Components for display devices · CPC title

  • G03F7/027Primary

    Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence) · CPC title

  • Filters (polarising elements G02B5/30) · CPC title

  • Obtaining compounds having halogen atoms directly bound to the phthalocyanine skeleton · CPC title

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What does patent US11009739B2 cover?
Provided are a photosensitive composition capable of forming a cured film having excellent adhesiveness and pattern forming properties, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The photosensitive composition includes a photopolymerization initiator I, a polymerizable monomer M having two or more groups having an ethylenically unsaturat…
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/027. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 18 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).