Substrate processing apparatus, article manufacturing method, substrate processing method, substrate processing system, management apparatus, and storage medium

US10996574B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10996574-B2
Application numberUS-202016830753-A
CountryUS
Kind codeB2
Filing dateMar 26, 2020
Priority dateApr 18, 2019
Publication dateMay 4, 2021
Grant dateMay 4, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A substrate processing apparatus is provided. The apparatus includes an imaging unit that images a mark on a substrate, and a processor that aligns the substrate based on an image of the mark obtained by the imaging unit. If the alignment has failed, the processor identifies a factor of the failure based on information including the image and executes at least one of a plurality of recovery processes based on the identified factor. The processor includes an output unit that outputs a condition for the at least one of recovery processes in accordance with an inference model, and a learning unit that learns the inference model based on an execution result of the at least one of the recovery processes under the condition output from the output unit.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate processing apparatus that processes a substrate, the apparatus comprising: an imaging unit configured to image a mark provided on the substrate; and a processor configured to align the substrate based on a position of the mark obtained by processing an image of the mark obtained by the imaging unit, wherein if the alignment has failed, the processor identifies a factor of the failure based on information including the image and executes at least one of a plurality of recovery processes based on the identified factor of the failure, and the processor includes an output unit configured to output a condition for the at least one of the recovery processes corresponding to the identified factor of the failure, in accordance with an inference model, and a learning unit configured to learn the inference model based on an execution result obtained from the at least one of the recovery processes under the condition output from the output unit. 2. The apparatus according to claim 1 , wherein the learning is performed by setting a factor of the alignment failure as a state and a condition for a recovery process corresponding to the state as an action and evaluating a reward obtained by the action. 3. The apparatus according to claim 2 , wherein the learning is performed so as to maximize an expected value of a sum of rewards obtained by actions selected in observed states. 4. The apparatus according to claim 3 , wherein the learning includes giving a positive reward if a recovery process has succeeded under a condition determined as the selected action and giving a negative reward if the recovery process has failed. 5. The apparatus according to claim 1 , wherein the processor determines that the alignment has failed, if an index corresponding to the image is lower than a predetermined threshold. 6. The apparatus according to claim 5 , wherein the index includes at least one of a signal intensity of the image, a contrast, and a degree of correlation of pattern matching. 7. The apparatus according to claim 1 , further comprising a notification unit configured to notify contents of the executed at least one of the recovery processes. 8. The apparatus according to claim 1 , wherein the plurality of recovery processes include expansion of a search range for an image of the mark in the image, a change of an imaging condition in the imaging unit, and a change of a mark, of a plurality of marks provided on the substrate, which is used. 9. The apparatus according to claim 1 , wherein the information includes an offset setting, a type of the mark, and context information in addition to the image. 10. An article manufacturing method comprising: forming a pattern on a substrate by using a substrate processing apparatus defined in claim 1 ; and processing the substrate on which the pattern is formed, wherein an article is manufactured from the processed substrate. 11. A substrate processing method comprising: imaging a mark provided on a substrate by using an imaging unit: aligning the substrate based on a position of the mark which is obtained by processing an image of the mark which is obtained in the imaging; identifying, if the alignment has failed, a factor of the failure based on information including the image: determining at least one of a plurality of recovery processes, which correspond to the identified factor of the failure; outputting a condition for the determined at least one of the recovery processes in accordance with an inference model; executing the determined at least one of the recovery processes under the output condition; and learning the inference model based on an execution result obtained by the at least one of the recovery processes under the output condition. 12. A substrate processing system comprising a substrate processing apparatus configured to process a substrate and a management apparatus configured to manage the substrate processing apparatus, the substrate processing apparatus comprising: an imaging unit configured to image a mark provided on the substrate; and a transmission unit configured to transmit an image captured by the imaging unit to the management apparatus, the management apparatus comprising: a reception unit configured to receive the image transmitted from the transmission unit of the substrate processing apparatus; and a processor configured to instruct the substrate processing apparatus to align the substrate based on a position of the mark obtained by processing the received image, wherein the processor instructs, if the alignment has failed, the substrate processing apparatus to identify a factor of the failure based on information including the image and execute at least one of a plurality of recovery processes based on the identified factor of the failure, and the processor includes: an output unit configured to output a condition for the at least one of the recovery processes corresponding to the identified factor of the failure, in accordance with an inference model, and a learning unit configured to learn the inference model based on an execution result obtained from the at least one of the recovery processes under the condition output from the output unit. 13. A management apparatus that manages a substrate processing apparatus configured to process a substrate, the management apparatus comprising: a reception unit configured to receive an image of a mark provided on the substrate which is imaged by an imaging unit of the substrate processing apparatus; and a processor configured to instruct the substrate processing apparatus to align the substrate based on a position of the mark which is obtained by processing the received image, wherein the processor instructs, if the alignment has failed, the substrate processing apparatus to identify a factor of the failure based on information including the image and execute at least one of a plurality of recovery processes based on the identified factor of the failure, and the processor includes: an output unit configured to output a condition for the at least one of recovery processes corresponding to the identified factor of the failure, in accordance with an inference model, and a learning unit configured to learn the inference model based on an execution result obtained from the at least one of the recovery processes under the condition output from the output unit. 14. A non-transitory computer-readable storage medium storing a program for causing a computer to function as each unit of a management apparatus defined in claim 13 .

Assignees

Inventors

Classifications

  • Photolithographic processes · CPC title

  • Signal processing · CPC title

  • Inference or reasoning models · CPC title

  • G03F9/7088Primary

    Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection · CPC title

  • Determination of transform parameters for the alignment of images, i.e. image registration · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10996574B2 cover?
A substrate processing apparatus is provided. The apparatus includes an imaging unit that images a mark on a substrate, and a processor that aligns the substrate based on an image of the mark obtained by the imaging unit. If the alignment has failed, the processor identifies a factor of the failure based on information including the image and executes at least one of a plurality of recovery pro…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification G03F9/7088. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 04 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).