Fluoromonomer and fluorooligomer compounds, photopolymerizable composition, and hydrophobic film using the same

US10995215B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10995215-B2
Application numberUS-201816032712-A
CountryUS
Kind codeB2
Filing dateJul 11, 2018
Priority dateJul 12, 2017
Publication dateMay 4, 2021
Grant dateMay 4, 2021

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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The present disclosure relates to novel fluoromonomer and fluorooligomer compounds, a photopolymerizable composition including these compounds, methods for producing these compounds, and a hydrophobic film using the photopolymerizable composition.

First claim

Opening claim text (preview).

We claim: 1. A fluoromonomer compound, represented by the following Chemical Formula 2: wherein in the Chemical Formula 2, k is an integer of from 1 to 5. 2. A fluorooligomer compound, represented by the following Chemical Formula 3: wherein in the Chemical Formula 3, R 1 and R 2 are each independently, and k is an integer of from 1 to 5. 3. A photopolymerizable composition, comprising the fluorooligomer compound according to claim 2 and a photoinitiator. 4. The photopolymerizable composition of claim 3 , further comprising a fluoromonomer compound selected from the group consisting of a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and combinations thereof: wherein in the Chemical Formula 1, n is an integer of 1 to 5; wherein in the Chemical Formula 2, k is an integer of from 1 to 5. 5. The photopolymerizable composition of claim 3 , wherein the composition comprises the fluorooligomer compound of from 10 to 99 parts by weight and the photoinitiator of from 1 to 10 parts by weight. 6. The photopolymerizable composition of claim 4 , wherein the composition comprises the fluorooligomer compound of from 10 to 50 parts by weight, the photoinitiator of from 1 to 10 parts by weight, and the fluoromonomer compound of from 60 to 80 parts by weight. 7. A hydrophobic film, formed by photopolymerization and photo-curing of the photopolymerizable composition according to claim 3 . 8. The hydrophobic film of claim 7 , wherein the photopolymerizable composition further comprises a fluoromonomer compound selected from the group consisting of a compound represented by the following Chemical Formula 1, a compound represented by the following Chemical Formula 2, and combinations thereof: wherein in the Chemical Formula 1, n is an integer of 1 to 5; wherein in the Chemical Formula 2, k is an integer of from 1 to 5. 9. The hydrophobic film of claim 7 , wherein the photopolymerizable composition comprises the fluorooligomer compound of from 10 to 99 parts by weight and the photoinitiator of from 1 to 10 parts by weight. 10. The hydrophobic film of claim 7 , wherein the photopolymerizable composition comprises the fluorooligomer compound of from 10 to 50 parts by weight, the photoinitiator of from 1 to 10 parts by weight, and the fluoromonomer compound of from 60 to 80 parts by weight. 11. A method for producing a fluoromonomer compound, comprising mixing a second fluorine-containing compound represented by the following Chemical Formula 5 and a third fluorine-containing compound represented by the following Chemical Formula 6 to obtain a first mixture; mixing a basic material and an organic solvent to obtain a second mixture; and adding the second mixture to the first mixture followed by controlling pH thereof to react the second fluorine-containing compound with the third fluorine-containing compound so as to obtain the fluoromonomer compound according to claim 1 : wherein in the Chemical Formula 6, k is an integer of from 1 to 5. 12. The method for producing a fluoromonomer compound of claim 11 , wherein the controlling pH is performed by adding an acidic material. 13. A method for producing a photopolymerizable oligomer compound, comprising a) mixing a second fluorine-containing compound represented by the following Chemical Formula 5 and a third fluorine-containing compound represented by the following Chemical Formula 6 to obtain a first mixture: wherein in the Chemical Formula 6, k is an integer of from 1 to 5; b) mixing a basic material and an organic solvent to obtain a second mixture; c) adding the second mixture to the first mixture followed by controlling pH thereof to react the second fluorine-containing compound with the third fluorine-containing compound so as to obtain a fluoromonomer compound represented by the following Chemical Formula 2; wherein in the Chemical Formula 2, k is an integer of from 1 to 5; d) mixing an acrylate compound including a hydroxy group and a solvent to obtain a third mixture; e) adding a compound including a cyanate group to the third mixture to synthesize an acrylate compound including a cyanate group; and f) adding the fluorinated monomer compound represented by the Chemical Formula 2 to the acrylate compound including the cyanate group to synthesize the photopolymerizable oligomer compound according to claim 2 . 14. The method for producing a photopolymerizable oligomer compound of claim 13 , wherein the controlling pH in the step c) is performed by adding an acidic material. 15. The method for producing a photopolymerizable oligomer compound of claim 13 , wherein the acrylate compound including a hydroxy group in the step d) is a compound represented by the following Chemical Formula 7: and the compound including a cyanate group is a compound represented by the following Chemical Formula 8, and the acrylate compound including a cyanate group is a compound represented by the following Chemical Formula 9 in the step e): 16. The method for producing a photopolymerizable oligomer compound of claim 13 , wherein the solvent in the step d) includes a solvent selected from the group consisting of butyl acetate, ethyl acetate, dimethyl formamide, acetone, and combinations thereof.

Assignees

Inventors

Classifications

  • C09D4/00Primary

    Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond {; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16} · CPC title

  • C08L75/14Primary

    Polyurethanes having carbon-to-carbon unsaturated bonds · CPC title

  • containing halogen atoms · CPC title

  • having terminal carbon-to-carbon unsaturated bonds · CPC title

  • the ester chains containing seven or more carbon atoms · CPC title

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What does patent US10995215B2 cover?
The present disclosure relates to novel fluoromonomer and fluorooligomer compounds, a photopolymerizable composition including these compounds, methods for producing these compounds, and a hydrophobic film using the photopolymerizable composition.
Who is the assignee on this patent?
Ewha University—Industry Collaboration Found
What technology area does this patent fall under?
Primary CPC classification C09D4/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 04 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).