Spiral gas adsorption apparatus and method of using the same

US10994239B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10994239-B2
Application numberUS-201815915252-A
CountryUS
Kind codeB2
Filing dateMar 8, 2018
Priority dateMar 8, 2018
Publication dateMay 4, 2021
Grant dateMay 4, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A gas scrubber includes a canister having a rotatable spiral separator which provides a non-linear path configured to be filled with modular adsorbent material portions between a gas inlet and a gas outlet.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of scrubbing halogen gas from an etching or deposition chamber comprising passing a halogen containing exhaust gas from the etching or deposition chamber through a canister containing a plurality of modular sorbent material portions each shaped in a block and at least one partition comprising a series of interdigitated walls between the respective modular sorbent material portions, such that the at least one partition in the canister forces the halogen containing exhaust gas through the sorbent material in at least two directions. 2. The method of claim 1 , wherein: the plurality of modular adsorbent material portions comprise activated carbon, calcium hydroxide, calcium carbonate, calcium oxide, calcium aluminate, aluminium hydroxide, aluminium oxide, nickel oxide, nickel carbonate, nickel hydroxide, boehmite, diatomaceous earth, attapulgite or mixtures thereof; and the modular adsorbent material portions are selected to adsorb a halogen containing gas which comprises SiF 4 , SiCl 4 , CF 4 , Cl 2 , Bra, HBr, HI, HCl, NF 3 , SiH 2 Cl 2 , CH 3 CCl 3 or mixtures thereof. 3. The method of claim 1 , wherein the series of interdigitated walls comprises a series of vertically oriented walls. 4. The method of claim 1 , wherein the series of interdigitated walls comprises a series of horizontally oriented walls. 5. A method of scrubbing halogen gas from an etching or deposition chamber comprising passing a halogen containing exhaust gas from the etching or deposition chamber through a canister containing at least one modular sorbent material portion shaped in a block and at least one partition comprising a series of interdigitated walls, such that the at least one partition in the canister forces the halogen containing exhaust gas through the sorbent material in at least two directions, wherein the series of interdigitated walls comprises at least three horizontally oriented walls which are provided only in a top portion of the canister. 6. The method of claim 5 , wherein: the at least one modular adsorbent material portion comprise activated carbon, calcium hydroxide, calcium carbonate, calcium oxide, calcium aluminate, aluminium hydroxide, aluminium oxide, nickel oxide, nickel carbonate, nickel hydroxide, boehmite, diatomaceous earth, attapulgite or mixtures thereof; and the modular adsorbent material portions are selected to adsorb a halogen containing gas which comprises SiF 4 , SiCl 4 , CF 4 , Cl 2 , Bra, HBr, HI, HCl, NF 3 , SiH 2 Cl 2 , CH 3 CCl 3 or mixtures thereof.

Assignees

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Classifications

  • B01J20/06Primary

    comprising oxides or hydroxides of metals not provided for in group B01J20/04 · CPC title

  • Constructional details of adsorbing systems · CPC title

  • comprising aluminium oxide or hydroxide; comprising bauxite · CPC title

  • Naturally occurring clays or bleaching earth · CPC title

  • comprising free carbon; comprising carbon obtained by carbonising processes · CPC title

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What does patent US10994239B2 cover?
A gas scrubber includes a canister having a rotatable spiral separator which provides a non-linear path configured to be filled with modular adsorbent material portions between a gas inlet and a gas outlet.
Who is the assignee on this patent?
Sandisk Technologies Llc
What technology area does this patent fall under?
Primary CPC classification B01J20/06. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 04 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).