Optical member and its production method
US-2015378058-A1 · Dec 31, 2015 · US
US10989842B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10989842-B2 |
| Application number | US-201815961100-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 24, 2018 |
| Priority date | Jun 5, 2015 |
| Publication date | Apr 27, 2021 |
| Grant date | Apr 27, 2021 |
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The present application discloses a method of fabricating an anti-reflective film, comprising forming a zinc oxynitride layer on a substrate; annealing the zinc oxynitride layer; and etching the surface of the zinc oxynitride layer with an etching solution to form a micro lenses layer comprising a plurality of micro lenses on surface.
Opening claim text (preview).
What is claimed is: 1. A light emitting display panel, comprising: a counter substrate; an array substrate opposite to the counter substrate; and an anti-reflective film; wherein the array substrate comprises thin film transistors, a light emitting layer, and a plurality of metal lines; the anti-reflective film is on a first side of a base substrate of the array substrate facing the counter substrate; the base substrate has a second side facing away from the counter substrate, the second side is a light emitting side of the display panel; the anti-reflective film comprises a micro lenses layer comprising a plurality of micro lenses, each of the plurality of micro lenses comprises a zinc oxynitride grain; and each of the plurality of micro lenses has a diameter in a range of about 1 nm to about 10 μm. 2. The display panel of claim 1 , wherein each of the plurality of micro lenses has a diameter in a range of about 20 nm to about 500 nm. 3. The display panel of claim 1 , wherein the zinc oxynitride grain has a sphere or hemisphere shape. 4. The display panel of claim 1 , wherein the anti-reflective film further comprises a transparent insulating layer on a side of the micro lenses layer away from the base substrate, the transparent insulating layer has a refractive index larger than that of the micro lenses layer. 5. The display panel of claim 4 , wherein the transparent insulating layer is made of a material comprising silicon nitride. 6. The display panel of claim 1 , wherein each of the plurality of micro lenses has a diameter in a range of about 20 nm to about 5 μm. 7. The display panel of claim 1 , wherein the plurality of micro lenses are formed as a non-uniform two-dimensional array. 8. The display panel of claim 1 , wherein the plurality of micro lenses are formed to be non-uniformly spaced and have non-uniform size distribution. 9. The display panel of claim 1 , wherein the display panel is an organic light emitting display panel. 10. The display panel of claim 1 , wherein the anti-reflective film is between the base substrate and the light emitting layer or the plurality of metal lines or the thin film transistors.
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