Resolution enhanced digital lithography with anti-blazed DMD

US10983441B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10983441-B2
Application numberUS-201916532187-A
CountryUS
Kind codeB2
Filing dateAug 5, 2019
Priority dateJan 20, 2017
Publication dateApr 20, 2021
Grant dateApr 20, 2021

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.

First claim

Opening claim text (preview).

What is claimed is: 1. A spatial light modulator, comprising: an array of spatial light modulator pixels having at least: a first pair of adjacent spatial light modulator pixels including a first spatial light modulator pixel and a second spatial light modulator pixel adjacent to one another; and a second pair of adjacent spatial light modulator pixels including a third spatial light modulator pixel and a fourth spatial light modulator pixel adjacent to one another, wherein: either the first or the second spatial light modulator pixel of the first pair of adjacent spatial light modulator pixels is tilted to achieve a phase shift of 180 degrees between the adjacent first spatial light modulator pixel and the second spatial light modulator pixel, and either the third or the fourth spatial light modulator pixel of the second pair of adjacent spatial light modulator pixels is tilted to achieve a phase shift of 180 degrees between the adjacent third spatial light modulator pixel and the fourth spatial light modulator pixel, and wherein the first pair of adjacent spatial light modulator pixels and the second pair of adjacent spatial light modulator pixels form a first image and a second image that partially overlap on a substrate. 2. The spatial light modulator of claim 1 , wherein the array of spatial light modulator pixels is an array of micromirrors, and wherein at least one of the first spatial light modulator pixel and the second spatial light modulator pixel is positioned at a height selected to achieve the phase shift of 180 degrees. 3. The spatial light modulator of claim 1 , wherein the array of spatial light modulator pixels is an array of micromirrors, and wherein the spatial light modulator further comprises a plurality of hinges, at least one of the plurality of hinges being associated with at least one of the array of micromirrors. 4. The spatial light modulator of claim 3 , wherein at least one of the first spatial light modulator pixel and the second spatial light modulator pixel is tilted about at least one of the plurality of hinges at a tilt angle selected to achieve the phase shift of 180 degrees. 5. The spatial light modulator of claim 4 , wherein electrostatically controlling the tilt angle by varying an applied voltage achieves the tilt angle selected and the phase shift of 180 degrees. 6. The spatial light modulator of claim 4 , wherein utilizing a fluid with a predetermined index of refraction achieves the tilt angle selected and the phase shift of 180 degrees. 7. The spatial light modulator of claim 6 , wherein the fluid is a gas. 8. The spatial light modulator of claim 3 , wherein each of a first portion of the plurality of hinges is oriented a diagonal orientation, and wherein each of a second portion of the plurality of hinges is oriented parallel to an edge of each of the micromirrors. 9. The spatial light modulator of claim 1 , wherein each pixel in the array of spatial light modulator pixels is bright, dark, or attenuated. 10. The spatial light modulator of claim 1 , wherein the array of spatial light modulator pixels are switchable to generate a pattern of spatial light modulator pixels. 11. The spatial light modulator of claim 10 , wherein the pattern of spatial light modulator pixels modulates an optical beam to provide a selected level of attenuation. 12. The spatial light modulator of claim 1 , further comprises an array of liquid crystals. 13. The spatial light modulator of claim 1 , further comprises an array of microscopic light emitting devices (microLEDs).

Assignees

Inventors

Classifications

  • Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems · CPC title

  • Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets · CPC title

  • Reflectors · CPC title

  • the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

  • Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10983441B2 cover?
Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial lig…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G03F7/70116. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 20 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).