Material, storage container using the material, valve attached to the storage container, method of storing ClF and method of using ClF storage container

US10982811B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10982811-B2
Application numberUS-201716089717-A
CountryUS
Kind codeB2
Filing dateMar 16, 2017
Priority dateApr 5, 2016
Publication dateApr 20, 2021
Grant dateApr 20, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A material at least partly coated with a passive film of fluoride formed by contact with a gas containing ClF.

First claim

Opening claim text (preview).

The invention claimed is: 1. A storage container characterized in that the storage container is made of a material, the material is at least partly coated with a passive film of fluoride formed by contact with a gas containing ClF; characterized in that the storage container has an inner surface coated with the passive film; and characterized in that the storage container has a valve attached thereto, the valve having a flow passage for the gas to flow through, a valve seat through which the flow passage passes, and a valve member brought into contact with or away from the valve seat to close or open the flow passage, wherein the flow passage and the portions of the valve seat and valve member which are to be exposed to a gas are coated with the passive film. 2. The storage container according to claim 1 , characterized in that the valve member has a sealing surface pressed against the valve seat to close the flow passage, and the sealing surface has a gold plating layer with a thickness of 2 μm to 10 μm. 3. The storage container according to claim 2 , characterized in that the gold plating layer is sealed. 4. The storage container according to claim 2 , characterized in that the gold plating layer is oxidatively treated. 5. The storage container according to claim 2 , characterized in that the gold plating layer is coated with the passive film. 6. The storage container according to claim 1 , characterized in that the valve member is a disc shape. 7. The storage container according to claim 2 , characterized in that the valve member is a diaphragm. 8. The material according to claim 1 , characterized in that the passive film has a thickness of 5 nm to 50 nm. 9. The material according to claim 1 , characterized in that the gas further contains one or more substances chosen from a group consisting of ClF 3 and F 2 . 10. The material according to claim 1 , characterized in that the material comprises at least one of substances: manganese steel, stainless steel, chrome molybdenum steel, nickel alloy, aluminum alloy, cobalt alloy, gold and resin, and is coated with the passive film.

Assignees

Inventors

Classifications

  • F17C1/10Primary

    with provision for protection against corrosion, e.g. due to gaseous acid ({F17C1/14, F17C1/16 take precedence}; inhibiting corrosion of metallic material or incrustation in general C23F) · CPC title

  • with valve member and actuator on the same side of the seat · CPC title

  • Particular materials for seats or closure elements · CPC title

  • using gases (C23C8/36 takes precedence) · CPC title

  • with screw-spindle {or internally threaded actuating means} · CPC title

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Frequently asked questions

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What does patent US10982811B2 cover?
A material at least partly coated with a passive film of fluoride formed by contact with a gas containing ClF.
Who is the assignee on this patent?
Kanto Denka Kogyo Kk
What technology area does this patent fall under?
Primary CPC classification F17C1/10. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Apr 20 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).