Polyarylene sulfide resin and manufacturing method therefor, poly(arylene sulfonium salt) and manufacturing method therefor, and sulfoxide

US10982049B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10982049-B2
Application numberUS-201916446104-A
CountryUS
Kind codeB2
Filing dateJun 19, 2019
Priority dateSep 3, 2013
Publication dateApr 20, 2021
Grant dateApr 20, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particular constitutional unit, wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, etc.; Ar 1 and Ar 2 each independently represent an arylene group optionally having a substituent; and Z represents a direct bond, etc.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polyarylene sulfide resin having a constitutional unit represented by the following formula (20): wherein R 2b represents —Ar 6 — or —C(CF 3 ) 2 —Ar 6 —; Ar 1 , Ar 2 , and Ar 3b each independently represent a phenylene group or a naphthylene group; Ar 6 represents an arylene group optionally having a substituent; and Z represents a direct bond, —S—, —O—, or —C(CF 3 ) 2 —; wherein Z is —O—, or —C(CF 3 ) 2 — when Ar 1 , Ar 2 and Ar 3b are each a 1,4-phenylene group, R 2b is —Ar 6 — and Ar 6 is a 1,4-phenylene group. 2. The polyarylene sulfide resin of claim 1 , wherein the melting point of the polyarylene sulfide resin is in a range of 100 to 400° C. 3. A polyarylene sulfide resin having a constitutional unit represented by the following formula (20): wherein R 2b represents a direct bond, —Ar—, or —C(CF 3 ) 2 —Ar 6 —; Ar 1 , Ar 2 , and Ar 3b each independently represent a phenylene group or a naphthylene group; Ar 6 represents an arylene group optionally having a substituent; Z represents —S—, —O—, or —C(CF 3 ) 2 —; wherein Z is —C(CF 3 ) 2 — when Ar 1 , Ar 2 and Ar 3b are each a 1,4-phenylene group and R 2b is a direct bond; and Z is —O—, or —C(CF 3 ) 2 — when Ar 1 , Ar 2 and Ar 3b are each a 1,4-phenylene group, R 2b is —Ar 6 — and Ar 6 is a 1,4-phenylene group. 4. The polyarylene sulfide resin of claim 3 , wherein the melting point of the polyarylene sulfide resin is in a range of 100 to 400° C.

Assignees

Inventors

Classifications

  • C07C317/22Primary

    with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton · CPC title

  • Chemical after-treatment · CPC title

  • Polythioether-ethers (C08G75/0245 takes precedence) · CPC title

  • using other sulfur sources · CPC title

  • Polysulfides · CPC title

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What does patent US10982049B2 cover?
The present invention relates to a method for manufacturing a polyarylene sulfide resin comprising: reacting a sulfoxide represented by the following formula (1) with a particular aromatic compound to obtain a poly(arylenesulfonium salt) having a particular constitutional unit; and dealkylating or dearylating the poly(arylenesulfonium salt) to obtain a polyarylene sulfide resin having a particu…
Who is the assignee on this patent?
Dainippon Ink & Chemicals, National Univ Corporation Iwate Univ
What technology area does this patent fall under?
Primary CPC classification C07C317/22. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 20 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).