High performance electrodes

US10971729B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10971729-B2
Application numberUS-201615775758-A
CountryUS
Kind codeB2
Filing dateNov 10, 2016
Priority dateNov 12, 2015
Publication dateApr 6, 2021
Grant dateApr 6, 2021

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided herein are high performance direct deposit electrodes that do not require the use of a binder, as well as processes of manufacturing the same by an electrospray process.

First claim

Opening claim text (preview).

What is claimed is: 1. A process for manufacturing an electrode directly on a conductive substrate, the electrode comprises a film comprising (a) a plurality of nanostructured inclusions comprising an active material and (b) a first graphenic component comprising a first graphenic web, wherein the nanostructured inclusions are wrapped within the first graphenic web; the process comprising: a. producing an electrostatically charged plume comprising a plurality of nanoscale particles and/or droplets from a fluid stock by: i. providing the fluid stock to a first inlet of a first conduit of an electrospray nozzle, the first conduit being enclosed along the length of the conduit by a wall having an interior surface and an exterior surface, the first conduit having a first outlet, and the fluid stock comprising a nanostructured inclusion comprising an active material, a graphene oxide, and water, the graphene oxide containing a sulfur atom or sulfur containing compound; ii. providing a pressurized gas to a second inlet of a second conduit of the nozzle, thereby providing high velocity gas at a second outlet of the second conduit, the high velocity gas having a velocity of about 5 m/s or more, the second conduit being enclosed along the length of the conduit by a second wall having an interior surface, the second conduit having a second inlet and a second outlet, the second conduit having a second diameter, and the first conduit being positioned inside the second conduit, the exterior surface of the first wall and the interior surface of the second wall being separated by a conduit gap; and iii. providing a voltage to the nozzle, the voltage providing an electric field; and b. collecting a deposition on the substrate, the deposition comprising (a) a nanostructured inclusion comprising an active material and (b) a second graphenic component, the first and second graphenic components being the same or different. 2. The process of claim 1 , wherein the deposition is a thin layer deposition having a thickness of about 200 microns or less. 3. The process of claim 1 , wherein water is acidic, having a pH of 1 to 5. 4. The process of claim 1 , wherein the active material is a silicon material. 5. The process of claim 4 , wherein the silicon material comprises SiOx, wherein x is 0 to about 1.5. 6. The process of claim 5 , wherein the silicon material is present in a composite comprising the silicon material and carbon. 7. The process of claim 6 , wherein the composite is a nanofiber comprising a carbon matrix with the silicon material embedded therein. 8. The process of claim 4 , wherein the silicon material is silicon nanoparticles. 9. The process of claim 1 , wherein the active material is a tin material. 10. The process of claim 1 , wherein the second graphenic component is reduced graphene oxide. 11. The process of claim 1 , wherein the weight ratio of the nanostructured inclusion comprising the active material to the graphene oxide in the fluid stock is about 1:1 to about 1000:1. 12. The process of claim 1 , wherein the concentration of the nanostructured inclusion comprising the active material in the fluid stock is about 0.1 wt. % to about 25 wt.%. 13. The process of claim 1 , further comprising thermally annealing the deposition to a temperature of at least 100° C. 14. The process of claim 13 , wherein the process comprises annealing the deposition to a temperature of 150° C. to 350° C. 15. The process of claim 1 , wherein the film comprises a first structure including a plurality of active material nanostructures wrapped and/or secured within a web of the graphenic material and a second structure including a plurality of active material nanostructures wrapped and/or secured within a web of the graphenic material, and wherein the first structure stacks on the second structure to form a layered structure. 16. The process of claim 1 , wherein the voltage to the nozzle is provided to the wall of the first conduit. 17. The process of claim 1 , wherein the voltage provides an electric field at the first outlet.

Assignees

Inventors

Classifications

  • Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries · CPC title

  • Silicon or alloys based on silicon · CPC title

  • Electrodes based on metals, Si or alloys · CPC title

  • Electroforming a self-supporting electrode; Electroforming of powdered electrode material · CPC title

  • H01M4/1395Primary

    of electrodes based on metals, Si or alloys · CPC title

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Frequently asked questions

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What does patent US10971729B2 cover?
Provided herein are high performance direct deposit electrodes that do not require the use of a binder, as well as processes of manufacturing the same by an electrospray process.
Who is the assignee on this patent?
Univ Cornell, Dongjin Semichem Co Ltd
What technology area does this patent fall under?
Primary CPC classification H01M4/1395. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 06 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).