Preparation of large ultrathin free-standing polymer films

US10968325B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10968325-B2
Application numberUS-201816163220-A
CountryUS
Kind codeB2
Filing dateOct 17, 2018
Priority dateApr 21, 2015
Publication dateApr 6, 2021
Grant dateApr 6, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method of making large ultrathin free-standing polymer films without use of a sacrificial layer includes the steps of providing a substrate, applying a polyelectrolyte material to said substrate, applying a polymer material onto said substrate and onto said polyelectrolyte material, and directly delaminating said polymer material from said substrate and said polyelectrolyte to produce the ultrathin free-standing polymer film.

First claim

Opening claim text (preview).

The invention claimed is: 1. An ultrathin polymer film product adapted to be positioned in a water bath, comprising: a polymer film, a silicon wafer, an oxidizing acid cleaned wafer surface on said silicon wafer, an electrostatically mediated adsorbed polyelectrolyte monolayer on said oxidizing acid cleaned wafer surface, wherein said polymer film has a thicknesses below 100 nm, a polymer film surface on said polymer film wherein said polymer film is initially positioned on said silicon wafer and said polymer film surface is initially on said oxidizing acid cleaned wafer surface and said electrostatically mediated adsorbed polyelectrolyte monolayer, a marker on said polymer film, wherein said electrostatically mediated adsorbed polyelectrolyte on said wafer surface of said silicon wafer enables said polymer film surface to separate from said wafer surface in said water bath leaving said polymer film in said water bath, and wherein said marker on said polymer film enables said polymer film to be located in said water bath.

Assignees

Inventors

Classifications

  • C08J5/18Primary

    Manufacture of films or sheets · CPC title

  • Polystyrene · CPC title

  • as the main or only constituent of a layer, {which is} next to another layer of {the same or of} a {different material (next to a layer of a particular substance B32B9/045; next to a bituminous or tarry layer B32B11/046; next to a water setting substance layer B32B13/12; next to a metal layer B32B15/08; next to a glass layer B32B17/10; next to a layer formed of natural mineral fibres or particles B32B19/045; next to a wood layer B32B21/08; next to a cellulosic plastic layer B32B23/08; next to a natural or synthetic rubber layer B32B25/08)} · CPC title

  • Homopolymers or copolymers of methyl methacrylate · CPC title

  • Moistening · CPC title

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What does patent US10968325B2 cover?
A method of making large ultrathin free-standing polymer films without use of a sacrificial layer includes the steps of providing a substrate, applying a polyelectrolyte material to said substrate, applying a polymer material onto said substrate and onto said polyelectrolyte material, and directly delaminating said polymer material from said substrate and said polyelectrolyte to produce the ult…
Who is the assignee on this patent?
L Livermore Nat Security Llc, General Atomics
What technology area does this patent fall under?
Primary CPC classification C08J5/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 06 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).