Method for producing high-purity scandium oxide

US10968112B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10968112-B2
Application numberUS-201916964353-A
CountryUS
Kind codeB2
Filing dateJan 23, 2019
Priority dateJan 25, 2018
Publication dateApr 6, 2021
Grant dateApr 6, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Provided is a method for obtaining high-purity scandium oxide efficiently from a solution containing scandium. The method for producing high-purity scandium oxide of the present invention has a first firing step S12 for subjecting a solution containing scandium to oxalation treatment using oxalic acid and firing the obtained crystals of scandium oxalate at a temperature of 400 to 600° C., inclusive, a dissolution step S13 for dissolving the scandium compound obtained by firing in one or more solutions selected from hydrochloric acid and nitric acid to obtain a solution, a reprecipitation step S14 for subjecting the solution to oxalation treatment using oxalic acid and generating a reprecipitate of scandium oxalate, and a second firing step S15 for firing the reprecipitate of obtained scandium oxalate to obtain scandium oxide.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing high-purity scandium oxide, the method comprising: a first calcination step of subjecting a solution containing scandium to an oxalate formation treatment using oxalic acid and calcinating crystals of obtained scandium oxalate at a temperature of 400° C. to 600° C.; a dissolution step of dissolving a scandium compound obtained by calcinating, in at least one selected from hydrochloric acid and nitric acid to obtain a solution; a reprecipitation step of subjecting the solution to an oxalate formation treatment using oxalic acid to generate a reprecipitation product of scandium oxalate; and a second calcination step of calcinating the obtained reprecipitation product of scandium oxalate to obtain scandium oxide. 2. The method for producing high-purity scandium oxide according to claim 1 , wherein in the reprecipitation step, the oxalate formation treatment is performed while a temperature of the solution is adjusted to 40° C. or higher and lower than 100° C. 3. The method for producing high-purity scandium oxide according to claim 1 , wherein in the second calcination step, the calcination is performed while a calcination temperature is set to 900° C. or higher. 4. The method for producing high-purity scandium oxide according to claim 1 , wherein the solution containing scandium is obtained by subjecting a raw solution containing scandium to an ion exchange treatment and/or a solvent extraction treatment. 5. The method for producing high-purity scandium oxide according to claim 2 , wherein in the second calcination step, the calcination is performed while a calcination temperature is set to 900° C. or higher. 6. The method for producing high-purity scandium oxide according to claim 2 , wherein the solution containing scandium is obtained by subjecting a raw solution containing scandium to an ion exchange treatment and/or a solvent extraction treatment. 7. The method for producing high-purity scandium oxide according to claim 3 , wherein the solution containing scandium is obtained by subjecting a raw solution containing scandium to an ion exchange treatment and/or a solvent extraction treatment. 8. The method for producing high-purity scandium oxide according to claim 5 , wherein the solution containing scandium is obtained by subjecting a raw solution containing scandium to an ion exchange treatment and/or a solvent extraction treatment.

Assignees

Inventors

Classifications

  • C01F17/32Primary

    oxide or hydroxide being the only anion, e.g. NaCeO2 or MgxCayEuO · CPC title

  • C01F17/282Primary

    Sulfates · CPC title

  • Scandium oxides or hydroxides · CPC title

  • Hydrochloric acid {, other halogenated acids or salts thereof} · CPC title

  • in inorganic acid solutions {, e.g. with acids generated in situ; in inorganic salt solutions other than ammonium salt solutions} · CPC title

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What does patent US10968112B2 cover?
Provided is a method for obtaining high-purity scandium oxide efficiently from a solution containing scandium. The method for producing high-purity scandium oxide of the present invention has a first firing step S12 for subjecting a solution containing scandium to oxalation treatment using oxalic acid and firing the obtained crystals of scandium oxalate at a temperature of 400 to 600° C., inclu…
Who is the assignee on this patent?
Sumitomo Metal Mining Co
What technology area does this patent fall under?
Primary CPC classification C01F17/32. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 06 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).