Solar cell having an emitter region with wide bandgap semiconductor material

US10957809B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10957809-B2
Application numberUS-201916692890-A
CountryUS
Kind codeB2
Filing dateNov 22, 2019
Priority dateMar 23, 2012
Publication dateMar 23, 2021
Grant dateMar 23, 2021

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Solar cells having emitter regions composed of wide bandgap semiconductor material are described. In an example, a method includes forming, in a process tool having a controlled atmosphere, a thin dielectric layer on a surface of a semiconductor substrate of the solar cell. The semiconductor substrate has a bandgap. Without removing the semiconductor substrate from the controlled atmosphere of the process tool, a semiconductor layer is formed on the thin dielectric layer. The semiconductor layer has a bandgap at least approximately 0.2 electron Volts (eV) above the bandgap of the semiconductor substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A solar cell, comprising: a semiconductor substrate; a thin dielectric layer disposed on the semiconductor substrate; a first emitter region of a first conductivity type disposed on the thin dielectric layer, wherein the first emitter region comprises polycrystalline silicon; a first oxide layer disposed on the semiconductor substrate; and a second emitter region of a second conductivity type disposed on the first oxide layer, the second conductivity type opposite the first conductivity type, wherein the second emitter region comprises polycrystalline silicon, wherein a portion of the second emitter region is partially disposed over the first emitter region. 2. The solar cell of claim 1 , wherein the portion of the second emitter region is partially disposed over the thin dielectric layer. 3. The solar cell of claim 1 , wherein a portion of the first oxide layer is partially disposed over the first emitter region. 4. The solar cell of claim 1 , wherein a portion of the first oxide layer is partially disposed over the thin dielectric layer. 5. A solar cell, comprising: a semiconductor substrate; a thin dielectric layer disposed on the semiconductor substrate; a first emitter region of a first conductivity type disposed on the thin dielectric layer, wherein the first emitter region comprises polycrystalline silicon; a first oxide layer disposed on the semiconductor substrate; and a second emitter region of a second conductivity type disposed on the first oxide layer, the second conductivity type opposite the first conductivity type, wherein the second emitter region comprises polycrystalline silicon and a portion of the second emitter region is partially disposed over the first emitter region. 6. The solar cell of claim 5 , wherein the portion of the second emitter region is partially disposed over the thin dielectric layer. 7. The solar cell of claim 5 , wherein a portion of the first oxide layer is partially disposed over the first emitter region. 8. The solar cell of claim 5 , wherein a portion of the first oxide layer is partially disposed over the thin dielectric layer. 9. The solar cell of claim 5 , wherein the first conductivity type is N-type, and the second conductivity type is P-type. 10. The solar cell of claim 5 , wherein the first conductivity type is P-type, and the second conductivity type is N-type. 11. The solar cell of claim 5 , wherein the second emitter region has a dopant concentration approximately in the range of 1×1017-1×1021 atoms/cm3. 12. The solar cell of claim 5 , wherein the first oxide layer comprises silicon oxide. 13. The solar cell of claim 5 , further comprising: a second oxide layer disposed over a light receiving surface of the semiconductor substrate; an amorphous silicon layer disposed on the second oxide layer; and an anti-reflective coating (ARC) layer disposed on the amorphous silicon layer, the ARC layer comprising silicon nitride. 14. A solar cell, comprising: a semiconductor substrate; a thin dielectric layer disposed on the semiconductor substrate; a first emitter region of a first conductivity type disposed on the thin dielectric layer, wherein the first emitter region comprises polycrystalline silicon; a layer of doping material disposed on the first polycrystalline emitter region; a first oxide layer disposed on the semiconductor substrate; and a second emitter region of a second conductivity type disposed on the first oxide layer, the second conductivity type opposite the first conductivity type, wherein the second emitter region comprises polycrystalline silicon and a portion of the second emitter region is partially disposed over the first emitter region. 15. The solar cell of claim 14 , wherein the layer of doping material comprises a positive-type doping material. 16. The solar cell of claim 15 , wherein the positive-type doping material comprises boron. 17. The solar cell of claim 14 , wherein a portion of the second emitter region is partially disposed over the thin dielectric layer. 18. The solar cell of claim 14 , wherein the first conductivity type is N-type, and the second conductivity type is P-type. 19. The solar cell of claim 14 , wherein the first oxide layer comprises silicon oxide.

Assignees

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Classifications

  • Manufacture or treatment of devices covered by this subclass (patterning processes to connect thin photovoltaic cells in integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/33; manufacture or treatment of encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells H10F19/80; manufacture or treatment of integrated devices, or assemblies of multiple devices, comprising at least one element in which radiation controls the flow of current H10F39/00) · CPC title

  • Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side · CPC title

  • Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules · CPC title

  • Amorphous semiconductors · CPC title

  • Polycrystalline semiconductors · CPC title

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What does patent US10957809B2 cover?
Solar cells having emitter regions composed of wide bandgap semiconductor material are described. In an example, a method includes forming, in a process tool having a controlled atmosphere, a thin dielectric layer on a surface of a semiconductor substrate of the solar cell. The semiconductor substrate has a bandgap. Without removing the semiconductor substrate from the controlled atmosphere of …
Who is the assignee on this patent?
Sunpower Corp
What technology area does this patent fall under?
Primary CPC classification H10F77/70. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 23 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).