Pellicle frame and pellicle

US10955740B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10955740-B2
Application numberUS-201716316501-A
CountryUS
Kind codeB2
Filing dateJun 30, 2017
Priority dateJul 12, 2016
Publication dateMar 23, 2021
Grant dateMar 23, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention provides; a pellicle frame which can effectively inhibit distortion of the photo mask (8) caused by mounting the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided, and a manufacturing method of a blackened pellicle frame is also provided which can reduce the defect of the surface flickering under concentrated light and which facilitates inspection of the foreign matter adhesion prior to use. The present invention relates to a pellicle frame with an anodized film on a surface of an aluminum alloy frame, characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by mass with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al4Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al4Ca phase is monoclinic; wherein the Al4Ca phase dispersed in the anodized film is anodized, and the anodized film is stained with a black dye.

First claim

Opening claim text (preview).

The invention claimed is: 1. A pellicle frame with an anodized film on a surface of an aluminum alloy frame, characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by mass with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al 4 Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al 4 Ca phase is monoclinic; wherein the Al 4 Ca phase dispersed in the anodized film is anodized, and the anodized film is stained with a black dye. 2. The pellicle frame according to claim 1 , wherein a V content and a Fe content of the aluminum alloy are 0.0001 to 0.005% by mass and 0.05 to 1.0% by mass, respectively. 3. The pellicle frame according to claim 1 , wherein an average crystal grain size of the Al 4 Ca phase is 1. 5 μm or less. 4. The pellicle frame according to claim 1 , further comprising a resin film on the anodized film. 5. A method for manufacturing a pellicle frame, comprising: a first step for obtaining an aluminum alloy plastic worked by subjecting an aluminum alloy ingot which contains 5.0 to 10.0% by mass of Ca with the remainder aluminum and inevitable impurities, and has a volume ratio of an Al 4 Ca phase which is a dispersed phase of 25% or more to a plastic working, a second step for subjecting the aluminum alloy plastic worked to a heat treatment in a temperature range of 100 to 300° C., and a third step for subjecting the heat-treated aluminum alloy plastic worked to an anodizing treatment with an alkaline electrolytic solution containing tartaric acid as an electrolyte. 6. The method for manufacturing a pellicle frame according to claim 5 , wherein, before the first step, the aluminum alloy ingot is subjected to a heat treatment where the ingot is maintained at a temperature of 400° C. or more. 7. A pellicle comprising the pellicle frame according to claim 1 and a pellicle film supported by the pellicle frame.

Assignees

Inventors

Classifications

  • G03F1/64Primary

    characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

  • Alloys based on aluminium · CPC title

  • After-treatment, e.g. pore-sealing · CPC title

  • Inspecting · CPC title

  • of aluminium or alloys based thereon · CPC title

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Frequently asked questions

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What does patent US10955740B2 cover?
The present invention provides; a pellicle frame which can effectively inhibit distortion of the photo mask (8) caused by mounting the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided, and a manufacturing method of a blackened pellicle frame is also provided which can reduce the defect of the surface flickering under concentrated …
Who is the assignee on this patent?
Nippon Light Metal Co, Mitsui Chemicals Inc
What technology area does this patent fall under?
Primary CPC classification G03F1/64. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 23 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).