Multilayer reflector, method of manufacturing a multilayer reflector and lithographic apparatus

Patent metadata

Field	Value
Publication number	US-10955595-B2
Application number	US-201716072399-A
Country	US
Kind code	B2
Filing date	Feb 17, 2017
Priority date	Mar 7, 2016
Publication date	Mar 23, 2021
Grant date	Mar 23, 2021

Abstract

A reflector for EUV radiation, the reflector comprising a reflector substrate and a reflective surface, the reflector substrate having a plurality of coolant channels formed therein, the coolant channels being substantially straight, substantially parallel to each other and substantially parallel to the reflective surface and configured so that coolant flows in parallel through the coolant channels and in contact with the reflector substrate.

First claim

The invention claimed is:

1. A reflector for extreme ultraviolet (EUV) radiation, the reflector comprising:
a reflector substrate and a reflective surface, wherein:
the reflector substrate comprises a plurality of coolant channels formed therein,
the plurality of coolant channels are substantially straight, substantially parallel to each other, and substantially parallel to the reflective surface, and are configured so that a coolant flows in parallel through the plurality of coolant channels and in contact with the reflector substrate, and
each one of the plurality of coolant channels is spaced apart from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the respective one of the plurality of coolant channels.

2. The reflector of claim 1 , wherein the each one of the plurality of coolant channels has a substantially constant cross-section.

3. The reflector of claim 1 , wherein a distance between centers of two adjacent coolant channels of the plurality of channels is in a range of about 5 to about 10 times a diameter of at least one of the two adjacent coolant channels.

4. The reflector of claim 1 , wherein the reflector substrate comprises a first reflector substrate part joined to a second reflector substrate part, the second reflector substrate part having a different composition from the first reflector substrate part.

5. The reflector of claim 1 , wherein the reflector substrate is formed of a titania silicate glass.

6. The reflector of claim 1 , further comprising:
a coolant supply system connected to the plurality of coolant channels and configured to supply a coolant comprising water and/or liquid carbon dioxide.

7. The reflector of claim 6 , wherein the coolant supply system is configured to supply the water at a pressure in a range of about 0.001 to about 10 bar.

8. The reflector of claim 6 , wherein the coolant supply system is configured to supply the liquid carbon dioxide at a pressure in a range of about 20 bar to about 100 bar or about 50 bar to about 70 bar.

9. A method comprising:
projecting a patterned beam of radiation onto a substrate,
wherein the patterned beam is directed or patterned using at least one reflector of claim 1 , while coolant is conducted through the plurality of coolant channels.

10. A lithographic apparatus, comprising:
a projection system configured to project a pattern from a patterning device onto a substrate,
wherein the projection system comprises at least one reflector comprising:
a reflector substrate and a reflective surface, wherein:
the reflector substrate comprises a plurality of coolant channels formed therein,
the plurality of coolant channels are substantially straight, substantially parallel to each other, and substantially parallel to the reflective surface, and are configured so that a coolant flows in parallel through the plurality of coolant channels and in contact with the reflector substrate, and
each one of the plurality of coolant channels is spaced apart from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the respective one of the plurality of coolant channels.

11. The lithographic apparatus of claim 10 , wherein the reflector is a first reflector after the patterning device.

12. A mask for use in a lithographic apparatus, the mask comprising:
at least one reflector comprising:
a reflector substrate and a reflective surface, wherein:
the reflector substrate comprises a plurality of coolant channels formed therein,
the plurality of coolant channels are substantially straight, substantially parallel to each other, and substantially parallel to the reflective surface, and are configured so that a coolant flows in parallel through the plurality of coolant channels and in contact with the reflector substrate, and
each one of the plurality of coolant channels is spaced apart from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the respective one of the plurality of coolant channels.

13. A method of manufacturing a reflector for a projection system of a lithographic apparatus using extreme ultraviolet (EUV) radiation, the method comprising:
forming a reflector surface on a reflector substrate;
embedding a plurality of coolant channels in the reflector substrate, the plurality of coolant channels being substantially parallel to the reflective surface;
polishing the reflective surface while a pressurized fluid is provided to the plurality of coolant channels; and
spacing each one of the plurality of coolant channels from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the respective one of the plurality of coolant channels.

14. The method of claim 13 , wherein the pressurized fluid is at a pressure in a range of about 0.001 to about 10 bar.

15. A projection system comprising at least one reflector, the at least one reflector comprising:
a reflector substrate and a reflective surface, wherein:
the reflector substrate comprises a plurality of coolant channels formed therein,
the plurality of coolant channels are substantially straight, substantially parallel to each other, and substantially parallel to the reflective surface, and are configured so that a coolant flows in parallel through the plurality of coolant channels and in contact with the reflector substrate, and
each one of the plurality of coolant channels is spaced apart from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the respective one of the plurality of coolant channels.

16. A mask inspection apparatus comprising at least one reflector, the at least one reflector comprising:
a reflector substrate and a reflective surface, wherein:
the reflector substrate comprises a plurality of coolant channels formed therein,
the plurality of coolant channels are substantially straight, substantially parallel to each other, and substantially parallel to the reflective surface, and are configured so that a coolant flows in parallel through the plurality of coolant channels and in contact with the reflector substrate, and
each one of the plurality of coolant channels is spaced apart from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the respective one of the plurality of coolant channels.

17. A metrology apparatus comprising at least one reflector, the at least one reflector comprising:
a reflector substrate and a reflective surface, wherein:
the reflector substrate comprises a plurality of coolant channels formed therein,
the plurality of coolant channels are substantially straight, substantially parallel to each other, and substantially parallel to the reflective surface, and are configured so that a coolant flows in parallel through the plurality of coolant channels and in contact with the reflector substrate, and
each one of the plurality of coolant channels is spaced apart from the reflective surface by a distance in a range of about 3 to about 30 times a diameter of the respective one of the plurality of coolant channels.

18. A method of manufacturing a reflector, the method comprising:
forming a reflector surface on a reflector substrate;
embedding a plurality of coolant channels in the reflector substrate, the plurality of coolant channels being substantially parallel to the reflective surface;
polishing the reflective surface while a pressurized fluid is provided to the plurality of coolant channels; and
spacing each one of the plurality

Assignees

• Asml Netherlands Bv

Inventors

• Van Berkel Koos
• Koevoets Adrianus Hendrik

Classifications

• G03F7/70891

  Temperature · CPC title

• G02B7/1815

  with cooling or heating systems (cooling arrangements for laser mirrors H01S3/0401) · CPC title

• G03F7/70258

  Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system · CPC title

• G03F7/70875

  Temperature, e.g. temperature control of masks or workpieces via control of stage temperature · CPC title

• G03F1/24 Primary

  Reflection masks; Preparation thereof · CPC title