Encoder scale, manufacturing method for encoder scale, and encoder

US10955265B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10955265-B2
Application numberUS-201816173023-A
CountryUS
Kind codeB2
Filing dateOct 29, 2018
Priority dateOct 30, 2017
Publication dateMar 23, 2021
Grant dateMar 23, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

An encoder scale includes a tabular base material and an optical pattern provided above one surface of the base material, a first region and a second region being disposed side by side above the optical pattern. The first region includes a resin layer disposed above the base material and including photosensitive resin and a metal film disposed above the resin layer and formed of a metal material. The surface of the first region is configured mainly by a first surface having a normal line in the thickness direction of the base material. The surface of the second region is configured mainly by a second surface inclined with respect to the first surface.

First claim

Opening claim text (preview).

What is claimed is: 1. An encoder scale comprising: a tabular base material; and an optical pattern provided above one surface of the base material, a first region and a second region being disposed side by side above the optical pattern, wherein the first region includes: a resin layer disposed above the base material and including photosensitive resin; and a metal film disposed above the resin layer, a surface of the first region is configured mainly by a first surface having a normal line in a thickness direction of the base material, and a surface of the second region is configured mainly by a second surface inclined with respect to the first surface. 2. The encoder scale according to claim 1 , wherein the base material is formed of an anisotropically etchable crystal material. 3. The encoder scale according to claim 2 , wherein the crystal material is single crystal silicon. 4. The encoder scale according to claim 3 , wherein a plane orientation of the single crystal silicon is (100). 5. The encoder scale according to claim 2 , wherein the second surface is provided along a crystal surface of the crystal material. 6. The encoder scale according to claim 1 , wherein the photosensitive resin is a negative type. 7. A manufacturing method for an encoder scale comprising: performing anisotropic etching above one surface of a tabular base material and forming an inclined surface region configured mainly by a surface inclined with respect to a surface having a normal line in a thickness direction of the base material; and applying photosensitive resin above the one surface and patterning the photosensitive resin to form a resin layer and thereafter forming a metal film above the resin layer to thereby form a thickness direction normal line surface region configured mainly by a surface having a normal line in the thickness direction of the base material. 8. An encoder comprising: the encoder scale according to claim 1 ; a light emitting section configured to emit light toward the encoder scale; and a light detecting section configured to detect the light reflected on the encoder scale. 9. An encoder comprising: the encoder scale according to claim 2 ; a light emitting section configured to emit light toward the encoder scale; and a light detecting section configured to detect the light reflected on the encoder scale. 10. An encoder comprising: the encoder scale according to claim 3 ; a light emitting section configured to emit light toward the encoder scale; and a light detecting section configured to detect the light reflected on the encoder scale. 11. An encoder comprising: the encoder scale according to claim 4 ; a light emitting section configured to emit light toward the encoder scale; and a light detecting section configured to detect the light reflected on the encoder scale. 12. An encoder comprising: the encoder scale according to claim 5 ; a light emitting section configured to emit light toward the encoder scale; and a light detecting section configured to detect the light reflected on the encoder scale. 13. An encoder comprising: the encoder scale according to claim 6 ; a light emitting section configured to emit light toward the encoder scale; and a light detecting section configured to detect the light reflected on the encoder scale.

Assignees

Inventors

Classifications

  • Scales; Discs, e.g. fixation, fabrication, compensation · CPC title

  • Sensor working in reflection · CPC title

  • Particular pulse shapes · CPC title

  • G01D5/347Primary

    using displacement encoding scales · CPC title

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What does patent US10955265B2 cover?
An encoder scale includes a tabular base material and an optical pattern provided above one surface of the base material, a first region and a second region being disposed side by side above the optical pattern. The first region includes a resin layer disposed above the base material and including photosensitive resin and a metal film disposed above the resin layer and formed of a metal materia…
Who is the assignee on this patent?
Seiko Epson Corp
What technology area does this patent fall under?
Primary CPC classification G01D5/34707. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 23 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).