Solder mask inkjet inks for manufacturing printed circuit boards

US10947402B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10947402-B2
Application numberUS-201716348162-A
CountryUS
Kind codeB2
Filing dateNov 7, 2017
Priority dateNov 10, 2016
Publication dateMar 16, 2021
Grant dateMar 16, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

An inkjet method for producing a solder mask in the manufacture of a Printed Circuit uses a solder mask inkjet ink containing at least one photo-initiator, at least one free radical polymerizable compound and at least one allyl sulfone compound as adhesion promoter. A high quality solder mask withstanding the high thermal stress during the soldering process while maintaining excellent physical properties is produced.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of manufacturing an electronic device, the method comprising: jetting a radiation curable solder mask inkjet ink onto a dielectric substrate including an electrically conductive pattern; and curing the jetted solder mask inkjet ink; wherein the solder mask inkjet ink includes: a photoinitiator; a free radical polymerizable compound; and an adhesion promoter according to Formula I: wherein n represents an integer from 0 to 2; R2 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, and a substituted or unsubstituted aryl group; E is selected from the group consisting of COR10 and a nitrile; R10 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aryl group or heteroaryl group, OR11, and NR12R13; R11, R12, and R13 are independently selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, and a substituted or unsubstituted aryl group or heteroaryl group; and R12 and R13 may represent atoms that form a 5 to 8 membered ring; if n=0, then: R1 is selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aryl group or heteroaryl group, R3C═O, R4C═S, and R5SO 2 ; R3 and R4 are independently selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aryl group or heteroaryl group, OR6, NR7R8, and SR9; R5, R6, and R9 are independently selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, and a substituted or unsubstituted aryl group or heteroaryl group; R7 and R8 are independently selected from a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, and a substituted or unsubstituted aryl group or heteroaryl group; and R7 and R8 may represent atoms that form a 5 to 8 membered ring; if n=1 or 2, then: R1 is selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, and a substituted or unsubstituted aryl group or heteroaryl group. 2. The method according to claim 1 , wherein R2 represents a hydrogen atom. 3. The method according to claim 1 , wherein E represents COOR14; and R14 is selected from the group consisting of a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, a substituted or unsubstituted aryl group or heteroaryl group, and a substituted or unsubstituted alkyl group optionally substituted in the aliphatic chain by oxygen or nitrogen atoms. 4. The method according to claim 1 , wherein n=2. 5. The method according to claim 1 , wherein the adhesion promoter has a chemical structure according to Formula II: wherein R15 is selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, and a substituted or unsubstituted aryl group or heteroaryl group; and R16 is selected from the group consisting of a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkenyl group, a substituted or unsubstituted alkynyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, and a substituted or unsubstituted aryl group or heteroaryl group. 6. The method according to claim 5 , wherein R16 represents a substituted or unsubstituted alkyl group optionally substituted in the aliphatic chain by oxygen or nitrogen atoms. 7. The method according to claim 1 , wherein an amount of the adhesion promoter is between 0.5 and 20 wt % relative to a total weight of the solder mask inkjet ink. 8. The method according to claim 1 , wherein the free radical polymerizable compound is selected from the group consisting of neopentyl glycol hydroxypivalate diacrylate, isobornyl acrylate, dipropylene glycol diacrylate, trimethylol propane triacrylate, and 2-(vinylethoxy)ethyl acrylate. 9. The method according to claim 1 , wherein the radiation curable solder mask inkjet ink includes a cyan pigment, a yellow pigment, or a green pigment. 10. The method according to claim 1 , wherein the step of curing is performed using UV radiation. 11. The method according to claim 1 , wherein the step of curing is performed using UV LED radiation. 12. The method according to claim 1 , further comprising: heating the jetted solder mask inkjet ink. 13. The method according to claim 12 , wherein the step of heating is performed at a temperature between 80° C. and 250° C. 14. The method according to claim 1 , wherein the electrically conductive pattern includes copper. 15. The method according to claim 1 , wherein the electronic device is a printed circuit board.

Assignees

Inventors

Classifications

  • Inkjet printing, e.g. for printing insulating material or resist · CPC title

  • from unsaturated acids or derivatives thereof · CPC title

  • Patterns of chemical products used for a specific purpose, e.g. pesticides, perfumes, adhesive patterns; use of microencapsulated material; Printing on smoking articles · CPC title

  • Dispersed materials, e.g. conductive pastes or inks · CPC title

  • by ink-jet printing · CPC title

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What does patent US10947402B2 cover?
An inkjet method for producing a solder mask in the manufacture of a Printed Circuit uses a solder mask inkjet ink containing at least one photo-initiator, at least one free radical polymerizable compound and at least one allyl sulfone compound as adhesion promoter. A high quality solder mask withstanding the high thermal stress during the soldering process while maintaining excellent physical …
Who is the assignee on this patent?
Agfa Gevaert Nv, Electra Polymer Ltd, Afga Gevaert Nv
What technology area does this patent fall under?
Primary CPC classification C09D11/38. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 16 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).