Exposure machine and method of transferring a substrate of same

Patent metadata

Field	Value
Publication number	US-10941011-B2
Application number	US-201916347817-A
Country	US
Kind code	B2
Filing date	Apr 15, 2019
Priority date	Sep 19, 2018
Publication date	Mar 9, 2021
Grant date	Mar 9, 2021

Abstract

An exposure machine includes a base portion, a port portion, and a conveying structure. The base portion includes a work table and a bearing frame. The bearing frame is disposed on the work table and is configured to carry a tray. The port portion is configured to serve as a feed port and a discharge port of the exposure machine. The conveying structure includes at least one upper arm, at least one lower arm, and a movable tray guide. The movable tray guide is connected to the base portion and the port portion. The at least one lower arm is provided with a hook configured to hook the tray and move the tray to the port portion.

First claim

What is claimed is:

1. An exposure machine, comprising:
a base portion comprising a work table and a bearing frame, wherein the bearing frame is disposed on the work table configured to carry a tray, and the tray is configured to hold a substrate;
a port portion configured to serve as a feed port and a discharge port of the exposure machine; and
a conveying structure comprising at least one upper arm, at least one lower arm, and a movable tray guide, wherein the movable tray guide is connected to the base portion and the port portion;
wherein the at least one lower arm is provided with a hook configured to hook the tray and move the tray to the port portion;
wherein the movable tray guide comprises an inclined plate, a fixed base, and a rotating shaft on the fixed base, and the inclined plate is mounted on the fixed base through the rotating shaft.

2. The exposure machine according to claim 1 , wherein the port portion comprises a plurality of rollers and a plate loader.

3. The exposure machine according to claim 2 , wherein the rollers are disposed on two sides of the plate loader and are configured to define a movement direction of the tray.

4. The exposure machine according to claim 3 , wherein the plate loader is provided with a first set of thimbles configured to support the substrate and a second set of thimbles configured to support the tray.

5. The exposure machine according to claim 1 , wherein a frame of the exposure machine is provided with a first track for an upper arm movement and a second track for a lower arm movement.

6. A method of transferring a substrate of the exposure machine according to claim 1 , the method comprising:
S 101 , taking a set of trays carrying the substrate from the port portion using the at least one upper arm and performing an exposure to the trays when the trays are placed on the bearing frame disposed on the work table;
S 102 , after the exposure is completed, the movable tray guide rotates, such that the base portion and the port portion are in a same plane; and
S 103 , hooking the trays with the hook and pulling the trays to the port portion to complete a transfer.

7. The method according to claim 6 , wherein when an exposure process is performed in S 101 , the at least one lower arm is disposed on two sides of the port portion.

8. The method according to claim 6 , wherein the at least one lower arm moves to the base portion when the movable tray guide rotates in S 102 .

9. The method according to claim 6 , when the hook hooks and moves the trays in S 103 , the at least one upper arm grips a next set of substrates onto the bearing frame to perform the exposure process.

Assignees

• Wuhan China Star Optoelectronics Technology Co Ltd

Inventors

• Wang Wei

Classifications

• H10P72/3311

  Horizontal transfer of a batch of workpieces · CPC title

• B65H5/08 Primary

  by grippers, e.g. suction grippers · CPC title

• G03F7/70733 Primary

  Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask · CPC title

• H01L21/67754

  Electricity · mapped topic