Resin-linear organopolysiloxane block copolymer, use of same, and method for producing same

US10940105B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10940105-B2
Application numberUS-201716339290-A
CountryUS
Kind codeB2
Filing dateOct 3, 2017
Priority dateOct 4, 2016
Publication dateMar 9, 2021
Grant dateMar 9, 2021

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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Provided is a resin-linear organopolysiloxane block copolymer which has a high degree of freedom in formulation due to excellent compatibility with other materials, in addition to exhibiting excellent film forming properties and followability of a film, while the stickiness of a film is suppressed. The resin-linear organopolysiloxane block copolymer has: a resin structure (A1) block that has siloxane units represented by R1SiO3/2 (wherein R1 represents a monovalent organic group, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms) and SiO4/2; and a linear structure (A2) block represented by (R2SiO2/2)n (wherein n represents a number of 5 or more while R represents an alkyl group, a fluoroalkyl group, or an aryl group) in each molecule. The resin structure (A1) and the linear structure (A2) are linked to each other by an Si—O—Si bond, and an Si atom bonded to the resin structure (A1) constitutes an RSiO3/2 unit.

First claim

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The invention claimed is: 1. A resin-linear organopolysiloxane block copolymer comprising: a resin structure (A1) block that has siloxane units represented by R 1 SiO 3/2 and SiO 4/2 wherein R 1 represents a monovalent organic group, a hydroxyl group, or an alkoxy group having 1 to 6 carbon atoms; and a linear structure (A2) block represented by (R 2 SiO 2/2 ) n wherein n represents a number of 5 or more while R represents an alkyl group, a fluoroalkyl group, or an aryl group in each molecule; wherein the resin structure (A1) and the linear structure (A2) are linked to each other by an Si—O—Si bond, wherein one of the Si atoms of the Si—O—Si bond is present in an RSiO 3/2 unit; and wherein 15 mol % or more of all SiO 4/2 units are SiO 4/2 units having hydroxyl groups on Si atoms. 2. The resin-linear organopolysiloxane block copolymer according to claim 1 , wherein a hydroxyl group (OH) content within the molecule is 1.50 mass % or more. 3. The resin-linear organopolysiloxane block copolymer according to claim 2 , wherein the hydroxyl group (OH) content within the molecule is 1.75 mass % or more. 4. The resin-linear organopolysiloxane block copolymer according to claim 1 , which is soluble in cinnamic acid methyl ester. 5. The resin-linear organopolysiloxane block copolymer according to claim 1 , further comprising: one or more functional groups selected from the group consisting of an alkyl group having 6 or more carbon atoms, a fluoroalkyl group, an Si-macromonomer, and an Si-dendrimer modifying group in the molecule. 6. A composition comprising: (A) the resin-linear organopolysiloxane block copolymer according to claim 1 ; and (B) a solvent. 7. The composition according to claim 6 , wherein the solvent (B) is a volatile solvent (B1). 8. A film forming agent comprising: the resin-linear organopolysiloxane block copolymer according to claim 1 . 9. An adhesion imparting agent comprising: the resin-linear organopolysiloxane block copolymer according to claim 1 . 10. A sealant comprising: the resin-linear organopolysiloxane block copolymer according to claim 1 . 11. A composition for an electronic material comprising: the resin-linear organopolysiloxane block copolymer according to claim 1 . 12. A cosmetic composition or a preparation for external use comprising: the resin-linear organopolysiloxane block copolymer according to claim 1 . 13. A method for producing the resin-linear organopolysiloxane block copolymer according to claim 1 , the method comprising: Step (1): subjecting an organopolysiloxane having a hydroxyl group in the molecule and having a polysiloxane structure represented by (R 2 SiO 2/2 ) n wherein n represents a number of 5 or more while R represents an alkyl group, a fluoroalkyl group, or an aryl group to diacyloxy silanization, dioxime silanization, or dialkoxy silanization, using one or more organotri acyloxysilanes, organotrioximesilanes, or organotrialkoxysilanes; and Step (2): subjecting an organopolysiloxane having a diacyloxysilyl group, a dioximesilyl group, or a dialkoxysilyl group in the molecule obtained by the Step (1); and a resin organopolysiloxane having a hydroxyl group in the molecule and having a siloxane unit represented by SiO 4/2 , to a decarboxylation reaction, a deoximation reaction, or a dealcoholization reaction.

Assignees

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Classifications

  • to hydroxy groups · CPC title

  • Preparations for care of the skin · CPC title

  • containing polyether sequences · CPC title

  • Block copolymers (A61K8/89 takes precedence) · CPC title

  • Oil-in-water emulsions · CPC title

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What does patent US10940105B2 cover?
Provided is a resin-linear organopolysiloxane block copolymer which has a high degree of freedom in formulation due to excellent compatibility with other materials, in addition to exhibiting excellent film forming properties and followability of a film, while the stickiness of a film is suppressed. The resin-linear organopolysiloxane block copolymer has: a resin structure (A1) block that has si…
Who is the assignee on this patent?
Dow Toray Co Ltd, Dow Silicones Corp
What technology area does this patent fall under?
Primary CPC classification A61K8/891. Mapped technology areas include Human Necessities.
When was this patent published?
Publication date Tue Mar 09 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).