Method for producing trifluoroamine oxide
US-2023331552-A1 · Oct 19, 2023 · US
Preparation method of trifluoroamine oxide
US10934167B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10934167-B2 |
| Application number | US-201916624752-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 31, 2019 |
| Priority date | Nov 23, 2018 |
| Publication date | Mar 2, 2021 |
| Grant date | Mar 2, 2021 |
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Abstract
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The present invention relates to a preparation method of trifluoroamine oxide comprising the steps of producing an intermediate product by reacting nitrogen trifluoride and nitrous oxide in the presence of a reaction catalyst; and producing trifluoroamine oxide by reacting the intermediate product with sodium fluoride in vacuum condition up to 100 mmHg.
First claim
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What is claimed is: 1. A preparation method of trifluoroamine oxide comprising the following steps: producing an intermediate product by reacting nitrogen trifluoride and nitrous oxide in the presence of a reaction catalyst; and producing trifluoroamine oxide by reacting the intermediate product with sodium fluoride in vacuum condition up to 100 mmHg. 2. The preparation method of trifluoroamine oxide according to claim 1 , wherein the reaction ratio of the reaction catalyst, nitrogen trifluoride and nitrous oxide is in a molar ratio of 2:1-10:1-10 in the step of producing an intermediate product. 3. The preparation method of trifluoroamine oxide according to claim 1 , wherein the reaction is performed preferably at a temperature range of 110° C.˜150° C. in the step of producing an intermediate product. 4. The preparation method of trifluoroamine oxide according to claim 1 , wherein the stirring speed in the reaction is maintained at 50 rpm˜800 rpm in the step of producing an intermediate product. 5. The preparation method of trifluoroamine oxide according to claim 1 , wherein the vacuum condition is a pressure condition of 1 mmHg to 100 mmHg in the step of producing trifluoroamine oxide. 6. The preparation method of trifluoroamine oxide according to claim 1 , wherein the reaction ratio of the intermediate product and sodium fluoride is in a molar ratio of 1:1-4 in the step of producing trifluoroamine oxide. 7. The preparation method of trifluoroamine oxide according to claim 1 , wherein the reaction is performed at a temperature range of 150° C.˜200° C. in the step of producing trifluoroamine oxide. 8. A method to increase yield of trifluoroamine oxide comprising the following steps: producing an intermediate product by reacting nitrogen trifluoride and nitrous oxide in the presence of a reaction catalyst; and producing trifluoroamine oxide by reacting the intermediate product with sodium fluoride, wherein the reaction is characteristically performed in vacuum condition up to 100 mmHg. 9. The method to increase yield of trifluoroamine oxide according to claim 8 , wherein the vacuum condition is a pressure condition of 1 mmHg to 100 mmHg in the step of producing trifluoroamine oxide. 10. The method to increase yield of trifluoroamine oxide according to claim 8 , wherein the reaction is performed at a temperature range of 150° C.˜200° C. in the step of producing trifluoroamine oxide. 11. The method to increase yield of trifluoroamine oxide according to claim 8 , wherein the yield of trifluoroamine oxide is at least 40%.
Assignees
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Classifications
Processes utilising sub-atmospheric pressure; Apparatus therefor · CPC title
- C01B21/0842Primary
Halides of nitrogen oxides · CPC title
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Frequently asked questions
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- What does patent US10934167B2 cover?
- The present invention relates to a preparation method of trifluoroamine oxide comprising the steps of producing an intermediate product by reacting nitrogen trifluoride and nitrous oxide in the presence of a reaction catalyst; and producing trifluoroamine oxide by reacting the intermediate product with sodium fluoride in vacuum condition up to 100 mmHg.
- Who is the assignee on this patent?
- Korea Res Inst Chemical Tech, Sk Mat Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C01B21/0842. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 02 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).