Gas sensor device, gas measuring equipment, and method for fabricating gas sensor device

US10928355B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10928355-B2
Application numberUS-202016824155-A
CountryUS
Kind codeB2
Filing dateMar 19, 2020
Priority dateAug 8, 2016
Publication dateFeb 23, 2021
Grant dateFeb 23, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A gas sensor device has a crystalline film of copper(I) bromide, wherein a crystal surface of the copper(I) bromide is formed of a stepped terrace having a flat face and a steep slope.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for fabricating a gas sensor device, the method comprising: forming a layered structure in which a copper(I) oxide underlying layer and a copper film are deposited in this order over a substrate; and forming a copper(I) bromide sensing film by enabling the layered structure to react with a copper(II) bromide solution. 2. The method as claimed in claim 1 , wherein a stepped terrace structure in which a (111) plane is dominant appears during formation of the copper(I) bromide sensing film.

Assignees

Inventors

Classifications

  • Composition or fabrication of the electrodes and coatings thereon, e.g. catalysts · CPC title

  • G01N27/125Primary

    Composition of the body, e.g. the composition of its sensitive layer · CPC title

  • Oxides; Hydroxides · CPC title

  • Halides · CPC title

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Frequently asked questions

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What does patent US10928355B2 cover?
A gas sensor device has a crystalline film of copper(I) bromide, wherein a crystal surface of the copper(I) bromide is formed of a stepped terrace having a flat face and a steep slope.
Who is the assignee on this patent?
Fujitsu Ltd
What technology area does this patent fall under?
Primary CPC classification G01N27/4075. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 23 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).