Sanitizing soap preparations comprising an amphoteric/cationic surfactant mixture

Patent metadata

Field	Value
Publication number	US-10920174-B2
Application number	US-201916430333-A
Country	US
Kind code	B2
Filing date	Jun 3, 2019
Priority date	Apr 24, 2017
Publication date	Feb 16, 2021
Grant date	Feb 16, 2021

Abstract

Anti-microbial compositions for cleaning and sanitizing skin are disclosed. The anti-microbial compositions preferably comprises at least one quaternary ammonium chloride active and results in low irritation cleansing and sanitizing products that allow more frequent application.

First claim

What is claimed:

1. A skin soap or skin sanitizer anti-microbial cleansing composition comprising:
A) at least one amphoteric surfactant selected from the group consisting of one or more betaines and amine oxides;
B) from about 0.1% to about 0.3% of at least one quaternary ammonium chloride surfactant selected from the group consisting of one or more benzalkonium chloride surfactants and benzethonium chloride surfactants, wherein the at least one surfactant comprises an alkyl substituent that is at least 80% C 12 and C 14 in carbon chain length;
C) at least one alkyl trimethyl ammonium cationic surfactant present in an amount of 1.5% to 3.0%;
D) at least one preservative in the amount of from about 0.1% to about 0.5%;
E) at least one humectant in an amount of from about 0.1 to about 2.5%; and
wherein the non-active organic content of the composition is below about 8% of the compositions by weight.

2. The anti-microbial cleansing composition of claim 1 , wherein the pH of the composition is from about 5 to about 13.

3. The anti-microbial composition of claim 1 , wherein the quaternary ammonium chloride surfactant is one or more benzalkonium chlorides.

4. The anti-microbial composition of claim 3 , wherein the benzalkonium chloride comprises an alkyl substituent that is at least 85% C 12 and C 14 in carbon chain length.

5. The anti-microbial composition of claim 1 , wherein the level of non-active organics is below about 4%.

6. The anti-microbial composition of claim 1 , wherein the level of non-active organics is below about 2%.

7. The anti-microbial composition of claim 6 , wherein the composition is dye free, fragrance free, or dye and fragrance free.

8. A method of using the skin soap or skin sanitizer anti-microbial cleansing composition of claim 1 , comprising;
applying the cleansing composition to skin of a user; and
optionally, rinsing the composition from the skin with water.

9. A method of using the skin soap or skin sanitizer anti-microbial cleansing composition of claim 6 , comprising;
applying the cleansing composition to skin of a user; and
optionally, rinsing the composition from the skin with water.

10. The anti-microbial composition of claim 1 , further comprising at least one vitamin in an amount of from about 0.01% to about 5.0%.

11. The anti-microbial composition of claim 10 , wherein one of the at least one vitamin is Tocopheryl Acetate.

12. The anti-microbial composition of claim 1 , further comprising at least one botanical in an amount of from about 0.01% to about 5.0%.

13. The anti-microbial composition of claim 12 , wherein the at least one botanical is chosen from one or more of chamomile extract or oat extract.

14. The anti-microbial composition of claim 1 , wherein the at least one amphoteric surfactant is selected from the group consisting of Lauramine Oxide or Cocoamidopropyl Betaine.

15. The anti-microbial composition of claim 1 , wherein the at least one amphoteric surfactant is present in an in an amount of from about 0.01% to about 3.0%.

16. The anti-microbial composition of claim 1 , wherein the at least one preservative comprises Tetrasodium EDTA.

17. The anti-microbial composition of claim 1 , wherein the at least one humectant is selected from the group consisting of Sorbitol, Propylene Glycol, Glycerin or Sodium PCA.

18. The anti-microbial composition of claim 2 , wherein the pH of the composition is from about 6 to about 8.

19. A skin soap or skin sanitizer anti-microbial cleansing composition comprising:
A) at least one betaine in an amount of from about 0.01% to about 3.0%;
B) from about 0.1% to about 0.3% of at least one quaternary ammonium chloride surfactant selected from the group consisting of one or more benzalkonium chloride surfactants and benzethonium chloride surfactants, wherein the at least one surfactant comprises an alkyl substituent that is at least 80% C 12 and C 14 in carbon chain length;
C) at least one alkyl trimethyl ammonium cationic surfactant present in an amount of 1.5% to 3.0%;
D) at least one preservative in the amount of from about 0.1% to about 0.5%;
E) at least one humectant in an amount of from about 0.1 to about 2.5%; and
wherein the non-active organic content of the composition is below about 8% of the compositions by weight.

Assignees

• Gpcp Ip Holdings Llc

Inventors

• Argo Brian Patrick
• Shah Varsha
• Callahan Molly Ryan

Classifications

• A61Q19/007

  Preparations for dry skin · CPC title

• C11D1/62 Primary

  Quaternary ammonium compounds · CPC title

• C11D1/94

  Mixtures with anionic, cationic or non-ionic compounds · CPC title

• C11D1/88

  Ampholytes; Electroneutral compounds {(C11D1/002, C11D1/004, C11D1/008 take precedence)} · CPC title

• A61Q17/005

  Antimicrobial preparations · CPC title