Device and method for inducing by thermal poling a spatially controlled refractive index gradient inside an amorphous inorganic material

Patent metadata

Field	Value
Publication number	US-10919801-B2
Application number	US-201716312759-A
Country	US
Kind code	B2
Filing date	Jun 27, 2017
Priority date	Jun 28, 2016
Publication date	Feb 16, 2021
Grant date	Feb 16, 2021

Abstract

A device for inducing by thermal poling a spatially controlled refractive index gradient inside at least one amorphous inorganic material to be treated, includes a structured electrode arranged on the surface or in proximity to the surface of the material to be treated; and at least one dielectric material. The structured electrode includes at least one conductive zone and at least one non-conductive zone and it is confined between the amorphous inorganic material to be treated and the dielectric material.

First claim

The invention claimed is:

1. A device for inducing by thermal poling a spatially controlled refractive index gradient inside at least one amorphous inorganic material to be treated, said device comprising:
a structured electrode arranged on a surface or in proximity to the surface of the material to be treated and having a structure defined by at least three geometrical parameters;
at least one dielectric material,
wherein
the structured electrode comprises at least one conductive zone and at least one non-conductive zone and the structure electrode is confined between the amorphous inorganic material to be treated and the dielectric material, the refractive index gradient being controlled in three directions of space by the at least three geometrical parameters defining the structure of the structured electrode, and wherein a value of each of the at least three geometrical parameters is selected to induce said spatially controlled refractive index gradient inside said amorphous inorganic material.

2. The device according to claim 1 , wherein the structured electrode comprises an electrical conductive material alternated by volumes of air or an atmosphere of a gas different from air, wherein at least one parameter of the gas selected from the group consisting of a composition of the gas, a temperature of the gas, a density of the gas, a pressure of the gas and any combination thereof is controlled.

3. The device according to claim 2 , wherein the gas is an inert gas.

4. The device according to claim 1 , wherein the structured electrode is a composite material made of an alternation of conductive material and non-conductive material.

5. The device according to claim 1 , wherein the structured electrode is made of a metallic grid.

6. The device according to claim 1 , wherein the structured electrode is an electronic conductive layer deposited on an electrically insulating substrate.

7. The device according to claim 1 , wherein said at least three geometrical parameters of the structured electrode are:
a distance between the dielectric material to be treated and the confining dielectric material;
a distance between two conductive zones connected to an electric potential;
a size of the zone of the structured electrode in direct contact with the amorphous material to be treated.

8. The device according to claim 7 , wherein the distance between the dielectric material to be treated and the confining dielectric material is comprised between 50 nm and 1 mm, the distance between two conductive zones is comprised between 0.1 μm and 1 mm and the size of the zone of the structured electrode in direct contact with the amorphous material to be treated is comprised between 100 nm and 1 mm.

9. The device according to claim 1 , comprising at least a first reference electrode.

10. The device according to claim 1 , comprising a first reference electrode and a second reference electrode.

11. The device according to claim 10 , wherein the first reference electrode is connected to a first reference electric potential and the first reference electrode is in contact with the material to be treated and the second reference electrode is connected to a second reference electric potential and the second reference electrode is in contact with the dielectric material.

12. An amorphous inorganic material comprising a refractive index gradient controlled in the three directions of space, said refractive index gradient being induced by the device of claim 1 .

13. A method for inducing by thermal poling a spatially controlled gradient of a refractive index in an amorphous dielectric material comprising:
confining a structured electrode between the amorphous material to be treated and a dielectric material, said structured electrode being arranged on a surface or in proximity to the surface of the material to be treated and having a structure defined by at least three geometrical parameters, said structured electrode comprising at least one conductive zone and at least one non-conductive zone;
performing a thermal poling treatment for inducing a spatially controlled gradient of a refractive index, the refractive index gradient being controlled in three directions of space by the at least three geometrical parameters defining the structure of the structured electrode;
removing the structured electrode.

14. An amorphous inorganic material according to claim 12 comprising an array of micro-lenses.

15. The method according to claim 13 , further comprising:
preliminary defining the geometrical characteristics of the structured electrode in view of obtaining a given refractive index profile;
placing at least one reference electrode providing a voltage reference.

16. The method according to claim 13 , wherein the thermal poling treatment comprises generating a plasma in a region of space confined between the material to be treated and the dielectric material.

17. The method according to claim 13 , wherein the amorphous inorganic material to be treated is a chalcogenide glass or an oxide glass of the soda-lime silicate family, the dielectric material is an oxide glass of the soda-lime silicate family, the structured electrode is a thin layer of ITO deposited on an electrically insulating substrate and partially ablated to induce a structuration of alternating electrically conductive and electrically insulating zones or a nickel grid and the controlled atmosphere is formed by N 2 .

18. An amorphous inorganic material produced with the method according to claim 13 .

Assignees

• Univ Bordeaux
• Inst Polytechnique Bordeaux
• Centre Nat Rech Scient
• Univ Central Florida Res Found Inc

Inventors

• Dussauze Marc
• Lepicard Antoine
• Bondu Flavie Marie
• Rodriguez Vincent Jean-Paul
• Adamietz Frédéric
• Cardinal Thierry
• Fargin Evelyne Claude
• Richardson Kathleen

Classifications

• C03C23/007

  by thermal treatment · CPC title

• G02B3/0087

  with index gradient · CPC title

• C03C23/009 Primary

  Poling glass · CPC title

• G02F1/3558

  Poled materials, e.g. with periodic poling; Fabrication of domain inverted structures, e.g. for quasi-phase-matching [QPM] · CPC title

• G02B5/1847

  Manufacturing methods · CPC title