Production apparatus and production method for fine particles

US10898957B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10898957-B2
Application numberUS-201815922838-A
CountryUS
Kind codeB2
Filing dateMar 15, 2018
Priority dateApr 19, 2017
Publication dateJan 26, 2021
Grant dateJan 26, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a plurality of electrodes in a vertical direction inside a vacuum chamber. The material supply device further includes a first gas supply port that supplies a first shield gas arranged in an inner periphery of the plural material supply ports and plural second gas supply ports that supply a second shield gas arranged in an outer periphery of the plural material supply ports.

First claim

Opening claim text (preview).

What is claimed is: 1. A production apparatus for fine particles comprising: a vacuum chamber; plural electrodes connected to the vacuum chamber and generating plasma by arc discharge in a state in which tip ends of the electrodes protrude into the vacuum chamber; AC power sources connected to the electrodes, respectively, and configured to supply power to the respective electrodes so as to generate the arc discharge inside the vacuum chamber; a material supply device connected to the vacuum chamber and supplying material particles to a region of the arc discharge, the material supply device having plural material supply ports that supply a material gas containing the material particles, the material supply ports being arranged below the plural electrodes in a vertical direction inside the vacuum chamber; a collection device connected to the vacuum chamber and collecting fine particles produced from the material particles; and a first gas supply port that supplies a first gas arranged in an inner periphery of the plural material supply ports, and plural second gas supply ports that supply a second gas arranged in an outer periphery of the plural material supply ports. 2. The production apparatus for fine particles according to claim 1 , wherein the plural material supply ports of the material supply device are arranged on an inner side of a circumference connecting tip ends of the plural electrodes. 3. The production apparatus for fine particles according to claim 1 , wherein each second gas supply port is arranged between a corresponding pair of adjacent ones of the plural electrodes. 4. The production apparatus for fine particles according to claim 2 , wherein the second gas supply ports are arranged on an outer side of the circumference connecting tip ends of the plural electrodes. 5. The production apparatus for fine particles according to claim 1 , further comprising: a flow-rate regulating device connected to the material supply device and capable of regulating a flow rate of the material gas supplied from the material supply device and flow rates of the first and second gases supplied from the first and second gas supply ports, respectively. 6. The production apparatus for fine particles according to claim 1 , wherein a number of the plural electrodes is a multiple of 6. 7. The production apparatus for fine particles according to claim 1 , wherein the plural electrodes include tungsten. 8. The production apparatus for fine particles according to claim 1 , wherein the plural electrodes include tantalum. 9. The production apparatus for fine particles according to claim 1 , wherein the plural electrodes include carbon material. 10. A production method for fine particles comprising: generating arc discharge; supplying a material gas to the arc discharge; generating fine particles by using the production apparatus for fine particles according to claim 5 ; and during the supplying of the material gas to the arc discharge inside the vacuum chamber from the material supply ports, supplying the first gas into the vacuum chamber at a flow velocity which is higher than a flow velocity of the material gas, and supplying the second gas into the vacuum chamber at a flow velocity which is lower than the flow velocity of the material gas. 11. The production method for fine particles according to claim 10 , wherein the flow velocity of the second gas is within 25% to 75% of the flow velocity of the material gas. 12. The production method for fine particles according to claim 10 , wherein the flow velocity of the first gas is within 125% to 200% of the flow velocity of the material gas. 13. A production method for fine particles comprising: generating arc discharge; supplying a material gas to the arc discharge; generating fine particles by using the production apparatus for fine particles according to claim 5 ; during the supplying of the material gas to the arc discharge inside the vacuum chamber from the material supply ports, supplying the first gas into the vacuum chamber at a flow velocity which is higher than a flow velocity of the material gas, and supplying the second gas into the vacuum chamber at a flow velocity which is lower than the flow velocity of the material gas; and synchronizing a timing of the supplying of the material gas and a timing of the supplying of the first gas and the second gas with each other by the flow rate regulating device.

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What does patent US10898957B2 cover?
A production apparatus and method for fine particles are capable of increasing a production amount and producing fine particles at low cost by efficiently inputting a large amount of material to plasma. The production apparatus includes a material supply device, which includes a plurality of material supply ports that supply a material gas containing material particles and are arranged below a …
Who is the assignee on this patent?
Panasonic Ip Man Co Ltd
What technology area does this patent fall under?
Primary CPC classification B01J19/08. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jan 26 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).