Monolithically integrated nanoemitter light source assembly
US-2020075664-A1 · Mar 5, 2020 · US
US10897119B1 · US · B1
| Field | Value |
|---|---|
| Publication number | US-10897119-B1 |
| Application number | US-201916570830-A |
| Country | US |
| Kind code | B1 |
| Filing date | Sep 13, 2019 |
| Priority date | Sep 13, 2019 |
| Publication date | Jan 19, 2021 |
| Grant date | Jan 19, 2021 |
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Techniques and circuitry for a semiconductor laser with enhanced lasing wavelengths stabilization are described. A semiconductor laser can generate an optical signal (e.g., single or multi-wavelength), for use in a Dense Wavelength Division Multiplexing (DWDM) interconnect system. The stabilization circuitry can include temperature sensor circuitry that measures an operational temperature of the semiconductor laser, and a feedback controller that can determine a temperature-induced wavelength shift that may be experienced by the multi-wavelength optical signal based on the laser's temperature. The feedback controller is also configured to generate a compensation signal that is determined to cause a complimentary shift in the multi-wavelength optical signal, where the complimentary shift can compensate for the temperature-induced wavelength shift. An integrated MOS capacitor of the laser can be charged by the signal in a manner that effectuates the complimentary shift and tunes the multi-wavelength optical signal to compensate for temperature-induced shift, thereby enhancing stabilization.
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What is claimed is: 1. A circuit for stabilizing lasing wavelengths of a laser, comprising: laser circuitry generating a optical signal having at least one wavelength; temperature sensor circuitry measuring a signal indicative of an operational temperature of the laser circuitry; a metal-oxide semiconductor (MOS) capacitor integrated within the laser circuitry; and controller circuitry receiving the signal from the temperature sensor circuitry such that an operation temperature of the laser circuitry is determined and generating a control signal for tuning the MOS capacitor to compensate for a wavelength shift of the optical signal based on the determined operation temperature of the laser circuitry. 2. The circuit of claim 1 , wherein the MOS capacitor is formed within the laser circuitry by deposited a capacitor dielectric between a III-V material and silicon. 3. The circuit of claim 2 , wherein the MOS capacitor receives the control signal generated by the controller circuitry and tunes the laser circuitry to generate a shifted optical signal such that the wavelength shift of the multi-optical signal is compensated. 4. The circuit of claim 3 , wherein the temperature sensor circuitry comprises a resistor proximal to the laser circuitry. 5. The circuit of claim 4 , wherein the signal indicative of the operational temperature of the laser circuitry comprises a voltage across the resistor. 6. The circuit of claim 5 , wherein the temperature sensor circuit comprises a diode. 7. The circuit of claim 6 , wherein the diode is integrated proximal to the laser circuitry. 8. The circuit of claim 6 , wherein the diode is integrated within the laser circuitry. 9. The circuit of claim 6 , wherein the signal indicative of the operational temperature of the laser circuitry comprises a voltage signal across the diode. 10. The circuit of claim 6 , wherein the temperature sensor circuit comprises: a light source; a Mach-Zehnder Interferometer (MZI) receiving light from the light source further transmitting the light; and a photodetector measuring power associated with the transmitted light from the MZI. 11. The circuitry of claim 10 , wherein the signal indicative of the operational temperature of the laser circuitry comprises the power measured by the photodetector. 12. The circuitry of claim 3 , wherein the controller determines a value of temperature-induced wavelength shift based on the measured temperature. 13. The circuitry of claim 12 , wherein the control signal generated by the control circuitry comprises a voltage corresponding to the value of temperature-induced wavelength, and the voltage is applied to the MOS capacitor to effectuate a shift that decreases the wavelengths of the optical signal or that increases the wavelengths of the optical signal. 14. A multi-wavelength semiconductor laser with stabilization enhancements, comprising: a silicon-on-insulator (SOI) substrate layer; an upper silicon layer deposited on the SOI substrate layer; a III-V material layer deposited on the upper silicon layer forming an active region of a semiconductor laser to generate a multi-wavelength optical signal; a dielectric layer deposited between the III-V material layer and the upper silicon layer forming a MOS capacitor, wherein the MOS capacitor tunes the multi-wavelength optical signal for stabilization; and a temperature sensor layer deposited on the silicon substrate layer, wherein the temperature sensor measures a temperature that is indicative of a temperature-induced wavelength shift of the generated multi-wavelength optical signal. 15. The multi-wavelength semiconductor laser of claim 14 , wherein the MOS capacitor tunes the multi-wavelength optical signal by effectuating a wavelength shift such that compensates for the indicated temperature-induced wavelength shift of the generated multi-wavelength optical signal. 16. The multi-wavelength semiconductor laser of claim 15 , comprising: a cladding layer; and a metal layer deposited on the cladding layer receiving an applied voltage that charges the active region of the semiconductor laser to generate a multi-wavelength optical signal. 17. The multi-wavelength semiconductor laser of claim 16 , comprising: an additional metal layer deposited on the MOS capacitor receiving an additional applied voltage that charges the MOS capacitor to tune the multi-wavelength optical signal. 18. The multi-wavelength semiconductor laser of claim 14 , wherein the temperature sensor layer comprises a silicon diode. 19. A method of stabilization lasing wavelengths of a semiconductor laser, comprising: measuring a signal indicative of an operational temperature of the semiconductor laser during operation; determining an operational temperature of the semiconductor laser during operation based on the measured signal; determining a temperature-induced wavelength shift based on the measured operational temperature; and generating a compensation signal to apply to an integrated MOS capacitor of the semiconductor laser to compensate for the temperature-induced wavelength shift of the multi-wavelength optical signal. 20. The method of claim 19 , wherein the compensation signal comprises a voltage that is applied to the MOS capacitor to effectuate a shift that decreases the wavelengths of the optical signal or that increases the wavelengths of the optical signal.
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