Antireflection film

US10895667B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10895667-B2
Application numberUS-201716068249-A
CountryUS
Kind codeB2
Filing dateMar 9, 2017
Priority dateMar 9, 2016
Publication dateJan 19, 2021
Grant dateJan 19, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu—K-alpha rays.

First claim

Opening claim text (preview).

The invention claimed is: 1. An antireflection film comprising a hard coating layer, and a low refractive index layer disposed on the hard coating layer, the low refractive index layer containing a binder resin, and hollow inorganic nanoparticles and solid inorganic nanoparticles dispersed in the binder resin, the low refractive index layer exhibiting one extremum at a thickness of 35 nm to 55 nm and another extremum at a thickness of 85 nm to 105 nm, in a graph showing a result of Fourier transform analysis for X-ray reflectivity measurement using Cu—K-alpha rays, wherein each of the thickness of 35 nm to 55 nm and the thickness of 85 nm to 105 nm is a thickness from a surface of the low refractive index layer, wherein 70% by volume or more of the entire solid inorganic nanoparticles are present within 50% of the total thickness of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer. 2. The antireflection film of claim 1 , wherein the graph showing the result of Fourier transform analysis for X-ray reflectivity measurement using Cu—K-alpha rays represents a Fourier transform magnitude of y-axis relative to the film thickness from a surface of the low refractive index layer of x-axis. 3. The antireflection film of claim 2 , wherein the X-ray reflectivity measurement using Cu—K-alpha rays is performed for an antireflection film having a size of 1 cm*1 cm (width*length) using Cu—K-alpha rays having a wavelength of 1.5418 Å. 4. The antireflection film of claim 1 , wherein the X-ray reflectivity measurement using Cu—K-alpha rays is performed for an antireflection film having a size of 1 cm*1 cm (width*length) using Cu—K-alpha rays having a wavelength of 1.5418 Å. 5. The antireflection film of claim 1 , wherein 30% by volume or more of the entire hollow inorganic nanoparticles are present at a greater distance in the thickness direction of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer, compared to the solid inorganic nanoparticles. 6. The antireflection film of claim 1 , wherein 70% by volume or more of the entire solid inorganic nanoparticles are present within 30% of the total thickness of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer. 7. The antireflection film of claim 6 , wherein 70% by volume or more of the entire hollow inorganic nanoparticles are present in a region exceeding 30% of the total thickness of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer. 8. The antireflection film of claim 1 , wherein the low refractive index layer includes a first layer containing 70% by volume or more of the entire solid inorganic nanoparticles and a second layer containing 70% by volume or more of the entire hollow inorganic nanoparticles, and the first layer is located closer to the interface between the hard coating layer and the low refractive index layer, compared to the second layer. 9. The antireflection film of claim 8 , wherein 70% or more by volume of the entire solid inorganic nanoparticles are present within 50% of the total thickness of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer. 10. The antireflection film of claim 1 , wherein the solid inorganic nanoparticles have a higher density by 0.50 g/m 3 or more compared to the hollow inorganic nanoparticles. 11. The antireflection film of claim 1 , wherein each of the solid inorganic nanoparticles and the hollow inorganic nanoparticles has on the surface thereof at least one reactive functional group selected from the group consisting of a (meth)acrylate group, an epoxide group, a vinyl group, and a thiol group. 12. The antireflection film of claim 1 , wherein the binder resin contained in the low refractive index layer may include a crosslinked (co)polymer between a (co)polymer of a photopolymerizable compound and a fluorine-containing compound containing a photoreactive functional group. 13. The antireflection film of claim 12 , wherein the low refractive index layer includes 10 to 400 parts by weight of the hollow inorganic nanoparticles and 10 to 400 parts by weight of the solid inorganic nanoparticles, relative to 100 parts by weight of the (co)polymer of the photopolymerizable compound. 14. The antireflection film of claim 12 , wherein each of the fluorine-containing compounds containing the photoreactive functional group has a weight average molecular weight of 2000 to 200,000. 15. The antireflection film of claim 12 , wherein the binder resin includes 20 to 300 parts by weight of the fluorine-containing compound containing the photoreactive functional group based on 100 parts by weight of the (co)copolymer of the photopolymerizable compound. 16. The antireflection film of claim 1 , wherein the hard coating layer includes a binder resin containing a photocurable resin, and organic or inorganic fine particles dispersed in the binder resin. 17. The antireflection film of claim 16 , wherein the organic fine particles have a particle diameter of 1 to 10 μm, and the inorganic fine particles have a particle diameter of 1 nm to 500 nm.

Assignees

Inventors

Classifications

  • G02B1/113Primary

    using inorganic layer materials only · CPC title

  • Physical, chemical or physicochemical properties · CPC title

  • G02B1/115Primary

    Multilayers · CPC title

  • G02B1/11Primary

    Anti-reflection coatings · CPC title

  • with two or more layers, where at least one layer of a composition contains a polymer binder · CPC title

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What does patent US10895667B2 cover?
The present invention relates to an antireflection film which exhibits one extremum at a thickness of 35 nm to 55 nm from the surface and exhibiting one extremum at a thickness of 85 nm to 105 nm from the surface in a graph showing the result of Fourier transform analysis for the result of X-ray reflectivity measurement using Cu—K-alpha rays.
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification G02B1/113. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jan 19 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 11 related publications on this page (citations in our corpus or others sharing the same primary CPC).