Gas permeable superstrate and methods of using the same

US10892167B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10892167-B2
Application numberUS-201916293053-A
CountryUS
Kind codeB2
Filing dateMar 5, 2019
Priority dateMar 5, 2019
Publication dateJan 12, 2021
Grant dateJan 12, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A gas permeable superstrate and method using the same is disclosed. The superstrate can include a body and an amorphous fluoropolymer layer on the body. The method of planarization can include dispensing a planarization precursor material over a substrate and contacting the planarization precursor material with a body of a superstrate. In one embodiment, the substrate includes a non-uniform surface topography. The method can also include curing the planarization precursor material to form a planarization layer over the substrate, where curing can be performed while the superstrate is contacting the planarization precursor material.

First claim

Opening claim text (preview).

What is claimed is: 1. A superstrate, comprising: a body, wherein the body comprises a contact surface; and an amorphous fluoropolymer layer on the contact surface of the body, wherein the amorphous fluoropolymer layer is permeable to gases having an atomic mass greater than 4, wherein the amorphous fluoropolymer layer has a helium permeability coefficient of greater than 2.5×10 −8 cm 3 *cm/cm 2 *S*cmHg. 2. The superstrate of claim 1 , wherein the amorphous fluoropolymer comprises a dioxolane ring. 3. The superstrate of claim 1 , wherein the amorphous fluoropolymer comprises a perflurorodioxole tetrafluoroethylene copolymer. 4. The superstrate of claim 1 , wherein the amorphous fluoropolymer comprises perfluoro(3-butenyl vinyl ether). 5. The superstrate of claim 1 , wherein the body comprises a hydrocarbon polymer layer between the contact surface and the amorphous fluoropolymer layer. 6. The superstrate of claim 5 , wherein the hydrocarbon polymer layer comprises polytrimethylsilyl propyne, polymethyl methacrylate, polycarbonate polymers, polyimides, and any combination thereof. 7. The superstrate of claim 1 , wherein the amorphous fluoropolymer layer has a critical surface tension of at least 20 mN/m and no more than 40 mN/m. 8. The superstrate of claim 1 , wherein the amorphous fluoropolymer layer comprises: —(CXY—CF2-) a -(-Z-) b -; wherein X and Y comprise F, Cl, or H; and Z comprises a four (4), five (5), or six (6) member fluorocarbon ring structure containing at least one C—O—C linkage. 9. The superstrate of claim 1 , wherein the amorphous fluoropolymer layer is permeable to nitrogen, oxygen, and argon. 10. The superstrate of claim 1 , wherein the amorphous fluoropolymer layer comprises an oxygen permeation coefficient of greater than 1.0×10 −10 cm3*cm/cm2*S*cmHg. 11. A method of planarization, comprising: dispensing a planarization precursor material over a substrate, wherein the substrate includes a non-uniform surface topography; contacting the planarization precursor material with a superstrate, wherein the superstrate comprises: a body, wherein the body comprises a contact surface; and an amorphous fluoropolymer layer on the contact surface of the body, wherein the amorphous fluoropolymer layer is permeable to gases having an atomic mass greater than 4, wherein the amorphous fluoropolymer layer has a helium permeability coefficient of greater than 2.5×10-8 cm3*cm/cm2*S*cmHg; and curing the planarization precursor material to form a planarization layer over the substrate, wherein curing is performed while the superstrate is contacting the planarization precursor material. 12. The method of claim 11 , further comprising flowing a gas before contacting the planarization precursor material with the body of the superstrate. 13. The method of claim 12 , wherein the gas comprises oxygen, nitrogen, argon, or any combination thereof. 14. The method of claim 12 , wherein the gas comprises an inert gas and wherein the inert gas does not comprise helium. 15. The method of claim 11 , wherein the amorphous fluoropolymer comprises a dioxolane ring. 16. The method of claim 11 , wherein the amorphous fluoropolymer comprises a perflurorodioxole tetrafluoroethylene copolymer. 17. The method of claim 10 , wherein the amorphous fluoropolymer is a polymer or copolymer of perfluoro(3-butenyl vinyl ether). 18. The method of claim 11 , wherein the amorphous fluoropolymer layer is permeable to nitrogen, oxygen, and argon. 19. The method of claim 11 , wherein the amorphous fluoropolymer layer comprises an oxygen permeation coefficient of greater than 1.0×10 −10 cm3*cm/cm2*S*cmHg. 20. A method of manufacturing an article, comprising: depositing a formable material on a substrate; contacting the formable material on the substrate with a superstrate to form a planar layer, wherein the superstrate comprises: a body, wherein the body comprises a contact surface; and an amorphous fluoropolymer layer on the contact surface of the body, wherein the amorphous fluoropolymer layer is permeable to gases having an atomic mass greater than 4, wherein the amorphous fluoropolymer layer has a helium permeability coefficient of greater than 2.5×10-8 cm3*cm/cm2*S*cmHg; separating the superstrate and the planar layer on the substrate; processing the substrate on which the planar layer has been formed; and manufacturing the article from the processed substrate.

Assignees

Inventors

Classifications

  • carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC · CPC title

  • H10P95/06Primary

    Planarisation of inorganic insulating materials · CPC title

  • Apparatus for applying a liquid, a resin, an ink or the like · CPC title

  • with the semiconductor substrates being dipped in baths or vessels · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

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What does patent US10892167B2 cover?
A gas permeable superstrate and method using the same is disclosed. The superstrate can include a body and an amorphous fluoropolymer layer on the body. The method of planarization can include dispensing a planarization precursor material over a substrate and contacting the planarization precursor material with a body of a superstrate. In one embodiment, the substrate includes a non-uniform sur…
Who is the assignee on this patent?
Canon Kk
What technology area does this patent fall under?
Primary CPC classification H10P95/06. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 12 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).