Negative ion-based beam injector

US10887976B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10887976-B2
Application numberUS-201916453949-A
CountryUS
Kind codeB2
Filing dateJun 26, 2019
Priority dateMar 8, 2013
Publication dateJan 5, 2021
Grant dateJan 5, 2021

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A negative ion-based beam injector comprising a negative ion source and an accelerator. The ions produced by the ion source are pre-accelerated before injection into a high energy accelerator by an electrostatic multi-aperture grid pre-accelerator, which is used to extract ion beams from the plasma and accelerate to some fraction of the required beam energy. The beam from the ion source passes through a pair of deflecting magnets, which enable the beam to shift off axis before entering the high energy accelerator. The negative ion-based beam injector can be combined with a neutralizer to produce about a 5 MW neutral beam with energy of about 0.50 to 1.0 MeV. After acceleration to full energy, the beam enters the neutralizer where it is partially converted into a neutral beam. The remaining ion species are separated by a magnet and directed into electrostatic energy converters. The neutral beam passes through a gate valve and enters a plasma chamber.

First claim

Opening claim text (preview).

What is claimed is: 1. An ion-based beam injector comprises an ion source configured to produce an ion beam, the ion source including a pre-accelerator comprising an electrostatic grid and external magnets positioned adjacent the electrostatic grid to deflect co-extracted electrons in an ion extraction and pre-acceleration region, and an accelerator spaced apart from the pre-accelerator. 2. The injector of claim 1 , further comprising a transition zone interposing the ion source and the accelerator. 3. The injector of claim 2 , wherein the transition zone comprises a low energy beam transport line. 4. The injector of claim 3 , wherein the low energy beam transport line includes cesium traps. 5. The injector of claim 3 , wherein the low energy beam transport line includes bending magnets that deflect orthogonally to its direction of motion and focus the beam onto the axis of the accelerator. 6. The injector of claim 2 , wherein the ion source includes a plasma container and plasma drivers. 7. The injector of claim 6 , wherein internal walls of the plasma container are configured to maintain elevated temperatures of 150-200° C. 8. The injector of claim 1 , wherein the ion source includes a plasma container and plasma drivers. 9. The injector of claim 8 , wherein internal walls of the plasma container are configured to maintain elevated temperatures of 150-200° C. 10. The injector of claim 1 , wherein the electrostatic grid having a plurality of electrodes, wherein each of the plurality of electrodes having a plurality of apertures. 11. The injector of claim 10 , further comprising a pumping system to pump gas out from a pre-acceleration gap. 12. The injector of claim 10 , wherein at least one of the plurality of electrodes is biased to pre-accelerate ions of opposite polarity in the ion beam. 13. The injector of claim 10 , wherein the plurality of apertures are configured for focusing and passing ions to form the ion beam. 14. The injector of claim 1 , further comprising a pumping system to pump gas out from a pre-acceleration gap. 15. The injector of claim 1 , further comprising a neutralizer interconnected to the accelerator.

Assignees

Inventors

Classifications

  • Arrangements for handling particles or ionising radiation, e.g. focusing or moderating · CPC title

  • H05H3/02Primary

    Molecular or atomic-beam generation, e.g. resonant beam generation · CPC title

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What does patent US10887976B2 cover?
A negative ion-based beam injector comprising a negative ion source and an accelerator. The ions produced by the ion source are pre-accelerated before injection into a high energy accelerator by an electrostatic multi-aperture grid pre-accelerator, which is used to extract ion beams from the plasma and accelerate to some fraction of the required beam energy. The beam from the ion source passes …
Who is the assignee on this patent?
Tae Tech Inc
What technology area does this patent fall under?
Primary CPC classification H05H3/02. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jan 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).