Semiconductor Device and Method of Manufacturing the Same
US-2018240887-A1 · Aug 23, 2018 · US
US10883176B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10883176-B2 |
| Application number | US-201816198877-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 23, 2018 |
| Priority date | May 9, 2018 |
| Publication date | Jan 5, 2021 |
| Grant date | Jan 5, 2021 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A method for directly synthesizing graphene on a surface of a target object includes: forming a non-metal layer on a support substrate; disposing the target object in a space above the support substrate, which is opposite to the non-metal layer; and injecting a carbon precursor to form graphene on the surface of the target object to synthesize a graphene film, wherein the graphene is nucleated and grown by a decomposition of the carbon precursor, the carbon precursor is decomposed by heat with catalytic assistance from the non-metal layer, and a carbon atom from the decomposition of the precursor is anchored on the surface to form the graphene film.
Opening claim text (preview).
What is claimed is: 1. A method for directly synthesizing graphene on a surface of a target object, comprising: forming a non-metal layer on a support substrate; disposing the target object in a space above the support substrate; and injecting a carbon precursor to form graphene on the surface of the target object to synthesize a graphene film, wherein the graphene is nucleated and grown on the surface of the target object by a decomposition of the carbon precursor, the carbon precursor is decomposed by heat with catalytic assistance from the non-metal layer to diffuse a carbon atom into the space above the support substrate, and the carbon atom from the decomposition of the precursor is anchored on the surface of the target object to form the graphene film, wherein the target object is located within the space above the support substrate comprising the diffused carbon atom. 2. The method according to claim 1 , wherein the carbon atom is supplied to surface of the target object by means of dissociative adsorption to nucleate and grow the graphene, an energy of metastable atom of the non-metallic catalytic layer is supplied to the carbon precursor for the decomposition of the carbon precursor to generate the carbon atom. 3. The method according to claim 1 , wherein at least a part of the surface of the target object has a three-dimensional shape. 4. The method according to claim 1 , wherein the disposing the target object includes that the non-metal layer and the target object are at least partially not in contact with each other. 5. The method according to claim 4 , wherein a non-contact interval between the target object and the non-metal layer is 1 nm to 2000 um. 6. The method according to claim 1 , wherein the support substrate has a groove having a V-shaped form or has a constant interval between the support substrate and the target object. 7. The method according to claim 1 , further comprising: installing a screen to block at least a part of an ambient space of the target object. 8. The method according to claim 1 , wherein the non-metal layer is made of gamma (γ) alumina. 9. The method according to claim 1 , wherein the forming a non-metal layer includes forming an amorphous non-metal layer by using atomic layer deposition (ALD). 10. The method according to claim 9 , wherein the forming a non-metal layer further includes crystallizing the amorphous non-metal layer. 11. The method according to claim 10 , wherein the precursor for forming the non-metal layer includes any one aluminum precursor selected from the group consisting of trimethyl aluminum ((CH 3 ) 3 Al, TMA), aluminum isopropoxide ([Al(OC 3 H 7 ) 3 ], IPA), methyl pyrrolidine-tri-methyl aluminum (MPTMA), ethyl-pyridine-triethyl-aluminum (EPPTEA), ethyl-pyridine-dimethyl-aluminum hydride (EPPDMAH), trimethyl aluminum (AlCH 3 ), and combinations thereof. 12. The method according to claim 1 , further comprising: synthesizing another graphene on a surface of another target object by reusing the non-metal layer formed on the support substrate. 13. The method according to claim 1 , wherein the carbon precursor includes any one selected from the group consisting of methane, ethane, propane, acetylene, methanol, ethanol, propanol, and combinations thereof. 14. The method according to claim 1 , wherein the reaction gas includes any one selected from the group consisting of nitrogen, helium, neon, argon, hydrogen, and combinations thereof. 15. The method according to claim 1 , wherein the target object is an optical fiber, and a surface of the optical fiber is at least partially removed. 16. The method according to claim 4 , wherein when the graphene is synthesized, conductivity or semi-conductivity is determined according to a distance between the non-metal layer and the target object surface, and wherein a conductive graphene is synthesized when the non-metal layer is formed in contact with the surface of the target object, and a semi-conductive graphene is synthesized when the non-metal layer is formed not in contact with the surface of the target object. 17. The method according to claim 1 , wherein the target object is opposite to the non-metal layer.
Carbon, e.g. diamond-like carbon · CPC title
Surface structures · CPC title
using chemical vapour deposition [CVD] · CPC title
being insulating materials · CPC title
Structure · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.