Gamma irradiation of ion exchange resins to remove or trap halogenated impurities

US10882965B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10882965-B2
Application numberUS-201615759866-A
CountryUS
Kind codeB2
Filing dateSep 14, 2016
Priority dateSep 16, 2015
Publication dateJan 5, 2021
Grant dateJan 5, 2021

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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A method of producing treated ion exchange resin material includes exposing an enclosed vessel containing ion exchange resin and a pre-treatment solution to high energy radiation. The treated ion exchange resin material has reduced organic impurities or total organic carbon (TOC).

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of producing a treated ion exchange resin material, comprising: providing ion exchange resin having of organic impurities in a vessel comprising a pre-treatment solution and a void space; and exposing the ion exchange resin, the pre-treatment solution, and the void space within the vessel to high energy radiation to produce a treated ion exchange resin material having reduced organic impurities and a treated void space having reduced volatile organic species. 2. The method of claim 1 , wherein the high energy radiation is gamma irradiation. 3. The method of claim 1 , wherein the pre-treatment solution is purified water. 4. The method of claim 2 , wherein a source of gamma irradiation is cobalt 60. 5. The method of claim 1 , further comprising washing the treated ion exchange resin material to remove at least some soluble organic impurities from the treated ion exchange resin material. 6. The method of claim 1 , wherein the organic impurities comprise one or more of organochloride compounds, organosulfonate compounds, and total organic carbon compounds. 7. The method of claim 6 , wherein the organic impurities are selected from the group consisting of: and combinations thereof. 8. The method of claim 7 , wherein the high intensity radiation produces the treated ion exchange resin material comprising less than about 10,000 ion intensity counts of the compound of formula (1). 9. The method of claim 2 , wherein the gamma irradiation is in a range of about 1 Gy to about 1 MGy. 10. The method of claim 9 , wherein the gamma irradiation is in a range of about 0.1 KGy to about 1 MGy. 11. The method of claim 10 , wherein the gamma irradiation is in a range of about 25 KGy to about 75 KGy.

Assignees

Inventors

Classifications

  • Mixed-bed processes · CPC title

  • during which the ion-exchange material is subjected to a physical treatment, e.g. heat, electric current, irradiation or vibration (electrodialysis or electro-osmosis B01D61/42) · CPC title

  • in the strongly basic form · CPC title

  • in the strongly acidic form · CPC title

  • Water in cooling circuits · CPC title

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What does patent US10882965B2 cover?
A method of producing treated ion exchange resin material includes exposing an enclosed vessel containing ion exchange resin and a pre-treatment solution to high energy radiation. The treated ion exchange resin material has reduced organic impurities or total organic carbon (TOC).
Who is the assignee on this patent?
Evoqua Water Tech Llc
What technology area does this patent fall under?
Primary CPC classification C08J3/28. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).