Phosphinic vanadium complex, catalytic system comprising said phosphinic vanadium complex and process for the (co) polymerization of conjugated dienes
US-2017275312-A1 · Sep 28, 2017 · US
Vanadium compound
US10882874B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10882874-B2 |
| Application number | US-201716308900-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 15, 2017 |
| Priority date | Jun 22, 2016 |
| Publication date | Jan 5, 2021 |
| Grant date | Jan 5, 2021 |
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- Title
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Abstract
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A vanadium compound represented by following General Formula (1). In General Formula (1), R 1 represents a linear or branched alkyl group having 1 to 7 carbon atoms and n represents a number from 2 to 4. R 1 preferably represents a secondary alkyl or a tertiary alkyl. It is preferred that in General Formula (1), n is 2 and R 1 is tert-butyl group or tert-pentyl group, since the compound has a broad ALD window and high thermal decomposition temperature to be able to form a good quality vanadium-containing thin film that has a small carbon residue when used as an ALD material.
First claim
Opening claim text (preview).
The invention claimed is: 1. A vanadium compound represented by following Formula (1): wherein R 1 represents a linear or branched alkyl group having 1 to 7 carbon atoms; and n represents a number from 2 to 4. 2. A raw material for forming a thin film, comprising the compound according to claim 1 . 3. A method for manufacturing a thin film, comprising: introducing a vapor including a vanadium compound obtained by vaporizing the raw material for forming a thin film according to claim 2 into a film formation chamber in which a substrate is disposed; and forming, on a surface of the substrate, a thin film including vanadium atoms by inducing decomposition and/or chemical reaction of the vanadium compound.
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Classifications
using a gas or vapour · CPC title
of conductive barrier, adhesion or liner layers · CPC title
using selective deposition · CPC title
- C23C16/45553Primary
characterized by the use of precursors specially adapted for ALD · CPC title
Nitrides {(C23C16/303 takes precedence)} · CPC title
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- What does patent US10882874B2 cover?
- A vanadium compound represented by following General Formula (1). In General Formula (1), R 1 represents a linear or branched alkyl group having 1 to 7 carbon atoms and n represents a number from 2 to 4. R 1 preferably represents a secondary alkyl or a tertiary alkyl. It is preferred that in General Fo…
- Who is the assignee on this patent?
- Adeka Corp
- What technology area does this patent fall under?
- Primary CPC classification C23C16/45553. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jan 05 2021 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).