Silicon compound-coated metal particles

Patent metadata

Field	Value
Publication number	US-10882109-B2
Application number	US-201716306242-A
Country	US
Kind code	B2
Filing date	Jun 1, 2017
Priority date	Jun 2, 2016
Publication date	Jan 5, 2021
Grant date	Jan 5, 2021

Abstract

The present invention relates to silicon-compound-coated fine metal particles, with which surfaces of fine metal particles, composed of at least one type of metal element or metalloid element, are at least partially coated with a silicon compound and a ratio of Si—OH bonds contained in the silicon-compound-coated fine metal particles is controlled to be 0.1% or more and 70% or less. By the present invention, silicon-compound-coated fine metal particles that are controlled in dispersibility and other properties can be provided by controlling the ratio of Si—OH bonds or the ratio of Si—OH bonds/Si—O bonds contained in the silicon-compound-coated fine metal particles. By controlling the ratio of Si—OH bonds or the ratio of Si—OH bonds/Si—O bonds, a composition that is more appropriate for diversifying applications and targeted properties of silicon-compound-coated fine metal particles than was conventionally possible can be designed easily.

First claim

The invention claimed is:

1. Silicon-compound-coated fine metal particles, wherein surfaces of fine metal particles, composed of at least one type of metal element or metalloid element, are at least partially coated with a silicon compound and a ratio of Si—OH bonds contained in the silicon-compound-coated fine metal particles is controlled to be 0.1% or more and 70% or less, or
a ratio of Si—OH bonds/Si—O bonds that is a ratio of Si—OH bonds to a ratio of Si—O bonds contained in the silicon-compound-coated fine metal particles is controlled to be 0.001 or more and 700 or less,
wherein the ratio of Si—OH bonds or the ratio of Si—OH bonds/Si—O bonds is that obtained by waveform separation of peaks in a wavenumber region of 750 cm −1 to 1300 cm −1 in an infrared absorption spectrum of the silicon-compound-coated fine metal particles measured using an attenuated total reflection method (ATR method).

2. The silicon-compound-coated fine metal particles according to claim 1 , wherein the ratio of Si—OH bonds or the ratio of Si—OH bonds/Si—O bonds contained in the silicon-compound-coated fine metal particles is controlled by a functional group changing treatment.

3. The silicon-compound-coated fine metal particles according to claim 2 , wherein the functional group changing treatment is at least one type of reaction selected from among a substitution reaction, an addition reaction, an elimination reaction, a dehydration reaction, a condensation reaction, a reduction reaction, and an oxidation reaction.

4. The silicon-compound-coated fine metal particles according to claim 1 , wherein the silicon-compound-coated fine metal particles are those with which surfaces of single fine metal particles are at least partially coated with a silicon compound, a primary particle diameter of the fine metal particles is 1 μm or less, and a primary particle diameter of the silicon-compound-coated fine metal particles is 100.5% or more and 190% or less of the primary particle diameter of the fine metal particles.

5. The silicon-compound-coated fine metal particles according to claim 4 , wherein the silicon-compound-coated fine metal particles are core-shell type silicon-compound-coated fine metal particles, with each of which an entire surface of a single fine metal particle serving as a core is coated with a silicon compound serving as a shell.

6. The silicon-compound-coated fine metal particles according to claim 1 , wherein the silicon-compound-coated fine metal particles are those with which surfaces of aggregates, each formed by aggregation of a plurality of fine metal particles, are at least partially coated with a silicon compound, a diameter of the aggregates is 1 μm or less, and a particle diameter of the silicon-compound-coated fine metal particles is 100.5% or more and 190% or less of the diameter of the aggregates.

7. The silicon-compound-coated fine metal particles according to claim 1 , wherein the metal element or metalloid element includes at least one type of element selected from a group consisting of silver, copper, and nickel.

8. The silicon-compound-coated fine metal particles according to claim 1 , wherein the Si—OH bonds are attributed to a peak of greatest area ratio among waveform-separated Si—OH-bond-derived peaks in a wavenumber region of 850 cm −1 to 980 cm −1 obtained by waveform separation of peaks in a wavenumber region of 750 cm −1 to 1300 cm −1 in an infrared absorption spectrum of the silicon-compound-coated fine metal particles measured using an attenuated total reflection method (ATR method), and the ratio of Si—OH bonds is a ratio of an area of the peak attributed to the Si—OH bonds to a total area of peaks obtained by waveform separation of peaks in the wavenumber region of 750 cm −1 to 1300 cm −1 .

9. The silicon-compound-coated fine metal particles according to claim 1 , wherein the Si—O bonds are attributed to a peak of greatest area ratio among waveform-separated Si—O-bond-derived peaks in a wavenumber region of 1000 cm −1 or more and 1300 cm −1 or less obtained by waveform separation of peaks in a wavenumber region of 750 cm −1 to 1300 cm −1 in an infrared absorption spectrum of the silicon-compound-coated fine metal particles measured using an attenuated total reflection method (ATR method), the Si—OH bonds are attributed to a peak of greatest area ratio among Si—OH-bond-derived peaks in the wavenumber region of 850 cm −1 to 980 cm −1 obtained by waveform separation of peaks in a wavenumber region of 750 cm −1 to 1300 cm −1 in an infrared absorption spectrum of the silicon-compound-coated fine metal particles measured using an attenuated total reflection method (ATR method), and the ratio of Si—OH bonds/Si—O bonds is the ratio of an area of the peak attributed to the Si—OH bonds to an area of the peak attributed to the Si—O bonds.

10. The silicon-compound-coated fine metal particles according to claim 1 , wherein the silicon-compound-coated fine metal particles are those obtained by fine metal particles being precipitated and a silicon compound being coated on the surfaces of the fine metal particles continuously subsequent to the precipitation between processing surfaces that are capable of approaching and separating from each other and rotate relative to each other.

11. The silicon-compound-coated fine metal particles according to claim 1 , wherein the silicon-compound-coated fine metal particles are silicon-compound-coated fine metal particles, with which silicon is contained in interiors of the fine metal particles at least before a heat treatment is applied and, by application of the heat treatment, the silicon is migrated from the interior toward an outer circumference of each fine metal particle in comparison to before application of the heat treatment.

12. The silicon-compound-coated fine metal particles according to claim 1 , wherein dispersibility of the silicon-compound-coated fine metal particles in a solvent is controlled
by the ratio of the Si—OH bonds being controlled to be 0.1% or more and 70% or less or the ratio of Si—OH bonds/Si—O bonds being controlled to be 0.001 or more and 700 or less.

13. A coating composition, a composition for transparent material, a magnetic composition, a conductive composition, a coloring composition, a reaction composition, or a catalyst composition that contains the silicon-compound-coated fine metal particles according to claim 1 .

Assignees

• M Technique Co Ltd
• M Techinque Co Ltd

Inventors

• Enomura Masakazu
• Honda Daisuke

Classifications

• B22F1/056

  Submicron particles having a size above 100 nm up to 300 nm · CPC title

• B22F1/054

  Nanosized particles · CPC title

• B22F1/102

  Metallic powder coated with organic material · CPC title

• C09C3/06

  Treatment with inorganic compounds {(C09C3/006, C09C3/048 take precedence)} · CPC title

• C09C1/24

  Oxides of iron · CPC title