Superhydrophilic and antifogging non-porous TiO2 films for glass and methods of providing the same

Patent metadata

Field	Value
Publication number	US-10875807-B2
Application number	US-202016736860-A
Country	US
Kind code	B2
Filing date	Jan 8, 2020
Priority date	Sep 1, 2016
Publication date	Dec 29, 2020
Grant date	Dec 29, 2020

Abstract

Superhydrophilic and antifogging non-porous TiO 2 films for glass substrates and methods of providing the TiO 2 films are provided. The TiO 2 films may maintain a water contact angle less than 5° in the dark for five days after an annealing treatment, and the water contact angle of the TiO 2 films may stabilize at less than 20° after ten days from the annealing treatment. The TiO 2 films may have a thickness of about 20 nm and may be transparent. The methods may include depositing a TiO 2 film on a glass substrate using e-beam evaporation. The methods may further include annealing the TiO 2 film after depositing the TiO 2 film on the glass substrate. The methods may not include UV radiation.

First claim

What is claimed is:

1. A method of providing a coated glass, the method comprising depositing a TiO 2 film on a glass substrate using e-beam evaporation, wherein the TiO 2 film is non-porous, and wherein the TiO 2 film maintains a water contact angle less than 5° in the dark for five days after an annealing treatment.

2. The method of claim 1 , further comprising annealing the TiO 2 film after depositing the TiO 2 film on the glass substrate.

3. The method of claim 1 , wherein annealing the TiO 2 film is carried out in air.

4. The method of claim 3 , wherein annealing the TiO 2 film comprises:
a first annealing step comprising annealing at 475° C.; and
a second annealing step comprising annealing at 500° C.

5. The method of claim 4 , wherein annealing of the first annealing step is carried out for about 5 min, and
wherein annealing of the second annealing step is carried out for about 4 hours.

6. The method of claim 4 , wherein the first annealing step comprises heating with a ramp rate of about 10° C./min to 475° C., and
wherein the second annealing step comprises heating with a ramp rate of about 2.5° C./min to 500° C.

7. The method of claim 1 , wherein depositing the TiO 2 film comprises rotating the glass substrate.

8. The method of claim 7 , wherein the glass substrate is rotated at about 40 rpm.

9. The method of claim 1 , wherein depositing the TiO 2 film is carried out after a base pressure reaches at about 3.0×10 −6 Torr.

10. The method of claim 1 , wherein depositing the TiO 2 film is carried out while maintaining a constant evaporation rate of about 1 Å s −1 .

11. The method of claim 1 , wherein depositing the TiO 2 film is carried out at an accelerating voltage of about 10 kV with a filament current of about 26.5 A and emission current in a range of about 55 mA to about 65 mA.

Assignees

• Univ Khalifa Science & Technology

Inventors

• Palmisano Giovanni
• Garlisi Corrado

Classifications

• C03C2217/71

  Photocatalytic coatings · CPC title

• C03C2217/212

  TiO2 · CPC title

• C03C2218/15

  from the vapour phase · CPC title

• C03C2217/75

  Hydrophilic and oleophilic coatings · CPC title

• C03C17/2456 Primary

  Coating containing TiO2 · CPC title