Polishing pads produced by an additive manufacturing process

Patent metadata

Field	Value
Publication number	US-10875145-B2
Application number	US-201514920801-A
Country	US
Kind code	B2
Filing date	Oct 22, 2015
Priority date	Oct 17, 2014
Publication date	Dec 29, 2020
Grant date	Dec 29, 2020

Abstract

Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

First claim

The invention claimed is:

1. A polishing pad having a polishing surface that is configured to polish a surface of a substrate, comprising:
a plurality of polishing elements that are disposed in a pattern relative to the polishing surface, wherein each polishing element is formed of a first polymer material, and the surfaces of the plurality of polishing elements form at least a portion of the polishing surface; and
a base layer that is disposed between each of the plurality of polishing elements and a supporting surface of the polishing pad, the base layer comprising a second polymer material, wherein:
the first polymer material has a first E′30/E′90 ratio and the second polymer material has a second E′30/E′90 ratio that is different from the first E′30/E′90 ratio,
the first polymer material is formed from a first droplet formulation comprising one or more first precursor components having a glass transition temperature (Tg) of greater than or equal to 40° C. and one or more second precursor components having a glass transition temperature of less than 40° C.,
an amount of the one or more first precursor components in the first droplet formulation is greater than an amount of the one or more second precursor components in the first droplet formulation,
the second polymer material is formed from a second droplet formulation comprising the one or more first precursor components and the one or more second precursor components,
an amount of the one or more second precursor components in the second droplet formulation is greater than an amount of the one or more first precursor components in the second droplet formulation,
the first and second precursor components are selected from the group consisting of monomers, oligomers, and functional polymers, and the first polymer material of the plurality of polishing elements and the second polymer material of the base layer are co-mingled and chemically bonded together at one or more boundaries thereof.

2. The polishing pad of claim 1 , wherein a region comprising one or more of the plurality of polishing elements disposed on the base layer has a third E′30/E′90 ratio that is different from the first and second E′30/E′90 ratios when measured by loading of the region in a direction normal to the polishing surface.

3. The polishing pad of claim 1 , wherein the first E′30/E′90 ratio is greater than about 6.

4. The polishing pad of claim 1 , wherein the first polymer material and the second polymer material each comprise a material that is selected from a group consisting of: polyamides, polyether ketones, polyethers, polyether sulfones, polyetherimides, polyimides, polysiloxanes, polysulfones, polyphenylenes, polyphenylene sulfides, polystyrene, polyacrylonitriles, polymethylmethacrylates, polyurethane acrylates, polyester acrylates, polyether acrylates, epoxy acrylates, melamines, polysulfones, acrylonitrile butadiene styrene (ABS), halogenated polymers, block copolymers and copolymers thereof.

5. The polishing pad of claim 1 , wherein an interface region formed at the one or more boundaries between the plurality of polishing elements and the base layer comprises a compositional gradient from the first polymer material to the second polymer material.

6. The polishing pad of claim 1 , wherein the base layer further comprises the first polymer material, and wherein a material composition ratio of the first polymer material to the second polymer material in the base layer is less than one.

7. The polishing pad of claim 6 , wherein the plurality of polishing elements each further comprise the second polymer material, and a material composition ratio of the first polymer material to the second polymer material in the plurality of polishing elements is greater than one.

8. A polishing pad having a polishing surface that is configured to polish a substrate, comprising:
a plurality of polishing elements comprising a first polymer material formed from a plurality of sequentially deposited first polymer layers formed from a plurality of droplets of a first droplet composition, wherein one or more first surfaces of the plurality of polishing elements forms the polishing surface; and
a base layer formed from a plurality of sequentially deposited second polymer layers formed from a mixture of a plurality of droplets of the first droplet composition and droplets of a second droplet composition, wherein the second droplet composition comprises a greater amount by weight of the one or more second resin precursor components than does the first droplet composition, the base layer having a plurality of first regions, one of each disposed between each of the plurality of first polishing elements and a supporting surface of the polishing pad, the base layer comprising a mixture of the first polymer material and a second polymer material, wherein:
the first polymer material has a first storage modulus and the mixture of the first polymer material and the second polymer material has a second storage modulus,
the first storage modulus is greater than the second storage modulus,
the first polymer material is formed of one or more first precursor components having a glass transition temperature (Tg) of greater than or equal to 40° C. and the second polymer material is formed of one or more second precursor components having a glass transition temperature (Tg) of less than 40° C.,
the first and second precursor components are selected from the group consisting of monomers, oligomers, and functional polymers, and

the base layer comprises a greater volume percent of the second polymer material than the first polymer material.

9. The polishing pad of claim 8 , wherein:
the first polymer material has a first E′30/E′90 ratio and the mixture has a second E′30/E′90 ratio that is different from the first E′30/E′90 ratio, and
a region comprising one or more of the plurality of polishing elements disposed on the base layer has a third E′30/E′90 ratio that is different from the first and second E′30/E′90 ratios when measured by loading of the region in a direction normal to the polishing surface.

10. The polishing pad of claim 9 , wherein the first E′30/E′90 ratio is greater than 6.

11. The polishing pad of claim 8 , wherein the first polymer material and the second polymer material each comprise a material that is selected from a group consisting of: polyamides, polyether ketones, polyethers, polyether sulfones, polyetherimides, polyimides, polysiloxanes, polysulfones, polyphenylenes, polyphenylene sulfides, polystyrene, polyacrylonitriles, polymethylmethacrylates, polyurethane acrylates, polyester acrylates, polyether acrylates, epoxy acrylates, melamines, polysulfones, acrylonitrile butadiene styrene (ABS), halogenated polymers, block copolymers and copolymers thereof.

12. The polishing pad of claim 8 , wherein interfaces between one or more of the plurality of polishing elements and the base layer comprise a compositional gradient from the first polymer material to the mixture of the first polymer material and the second polymer material.

13. A polishing pad having a polishing surface that is configured to polish a surface of a substrate, comprising:
a plurality of polishing elements that are disposed in a pattern relative to the polishing surface, wherein each polishing element comprises a plurality of sequentially deposited first polymer layers that comprise a first polymer material, and at least one of the plurality of sequentially deposited first polymer layers in each of the first polishing elements forms a portion of the polishing surface; and
a base layer having a plurality of first portions respectively disposed between each of the plur

Assignees

• Applied Materials Inc

Inventors

• Bajaj Rajeev
• Redfield Daniel
• Orilall Mahendra C
• Fu Boyi
• Khanna Aniruddh
• Fung Jason G
• Cornejo Mario
• Chockalingam Ashwin
• Yamamura Mayu
• Kakireddy Veera Raghava Reddy
• Kumar Ashavani
• Hariharan Venkat
• Menk Gregory E
• Redeker Fred C
• Patibandla Nag B
• Ng Hou T
• Davenport Robert E
• SINHA Amritanshu

Classifications

• B24D11/04

  Zonally-graded surfaces · CPC title

• B24D11/001

  Manufacture of flexible abrasive materials · CPC title

• B24D3/28

  Resins {or natural or synthetic macromolecular compounds (B24D3/22 takes precedence)} · CPC title

• B24D11/00

  Constructional features of flexible abrasive materials; Special features in the manufacture of such materials · CPC title

• B24B37/26 Primary

  characterised by the shape of the lapping pad surface, e.g. grooved · CPC title