Solid-state imaging device
US-2015228684-A1 · Aug 13, 2015 · US
US10872919B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10872919-B2 |
| Application number | US-201716069448-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 13, 2017 |
| Priority date | Jan 29, 2016 |
| Publication date | Dec 22, 2020 |
| Grant date | Dec 22, 2020 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Provided are a solid-state imaging device and an electronic apparatus that include a charge storage unit. The charge storage unit is formed by a method in which a hole is bored in a substrate, a diffusion layer is formed in a surface of the hole, and an insulating film and an upper electrode are formed so as to fill the hole. The charge storage unit is formed by a method in which a hole is bored in a substrate, a diffusion layer is formed in a half (one side) of a surface of the hole, and an insulating film and an upper electrode are formed so as to the hole.
Opening claim text (preview).
The invention claimed is: 1. A solid-state imaging device, comprising: a pixel array including a plurality of unit pixels; and a circuit configured to control an operation of the plurality of unit pixels, wherein each of the plurality of unit pixels includes: a photodiode configured to generate a charge; a trench capacitor configured to store the charge generated by the photodiode; and a reverse-side deep trench isolation (RDTI) joined to the trench capacitor, wherein the RDTI is adjacent to the trench capacitor. 2. The solid-state imaging device according to claim 1 , wherein the trench capacitor is between the photodiode of a first unit pixel of the plurality of unit pixels and the photodiode of a second unit pixel of the plurality of unit pixels, and the first unit pixel is adjacent to the second unit pixel. 3. The solid-state imaging device according to claim 1 , wherein each of the plurality of unit pixels further includes a plurality of photodiodes, the trench capacitor is one of between the plurality of photodiodes or between a first photodiode of the plurality of photodiodes of a first unit pixel of the plurality of unit pixels and a second photodiode of the plurality of photodiodes of a second unit pixel of the plurality of unit pixels, and the first unit pixel is adjacent to the second unit pixel. 4. The solid-state imaging device according to claim 1 , wherein the trench capacitor penetrates a substrate. 5. The solid-state imaging device according to claim 1 , wherein a potential of one end of the trench capacitor is one of a ground potential, a power-supply potential, or a specific potential. 6. The solid-state imaging device according to claim 5 , wherein the potential of the one end of the trench capacitor is set at a first potential at a storing time of the photodiode, the potential of the one end of the trench capacitor is set at a second potential at a reading time of the photodiode, and the first potential is different from the second potential. 7. The solid-state imaging device according to claim 1 , wherein the solid-state imaging device is of a backside-illuminated type. 8. An electronic apparatus, comprising: a solid-state imaging device including: a pixel array including a plurality of unit pixels; and a circuit configured to control an operation of the plurality of unit pixels, wherein each of the plurality of unit pixels includes: a photodiode configured to generate a charge; a trench capacitor configured to store the charge generated by the photodiode; and a reverse-side deep trench isolation (RDTI) joined to the trench capacitor, wherein the RDTI is adjacent to the trench capacitor; a signal processing circuit configured to process an output signal output from the solid-state imaging device; and an optical system configured to provide incident light to the solid-state imaging device.
Manufacture or treatment · CPC title
Isolation regions in semiconductor bodies between components of integrated devices · CPC title
Control of the integration time · CPC title
with pixels having different sensitivities within the sensor, e.g. fast or slow pixels or pixels having different sizes · CPC title
by controlling the amount of charge storable in the pixel, e.g. modification of the charge conversion ratio of the floating node capacitance · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.