Selector Device Having Asymmetric Conductance for Memory Applications
US-2018240844-A1 · Aug 23, 2018 · US
US10871528B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10871528-B2 |
| Application number | US-201716083202-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 27, 2017 |
| Priority date | Feb 28, 2017 |
| Publication date | Dec 22, 2020 |
| Grant date | Dec 22, 2020 |
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A magnetoresistive effect element includes a magnetization fixed layer, a magnetization free layer, and a non-magnetic spacer layer that is stacked between the magnetization fixed layer and the magnetization free layer. The magnetization fixed layer includes a first fixed layer and a second fixed layer that are formed of a ferromagnetic material, and a magnetic coupling layer that is stacked between the first fixed layer and the second fixed layer. The first fixed layer and the second fixed layer are magnetically coupled to each other by exchange coupling via the magnetic coupling layer such that magnetization directions of the first fixed layer and the second fixed layer are antiparallel to each other. The magnetic coupling layer is a non-magnetic layer that includes Ir and at least one of the following elements: Cr, Mn, Fe, Co and Ni.
Opening claim text (preview).
The invention claimed is: 1. A magnetoresistive effect element comprising: a magnetization fixed layer; a magnetization free layer; and a non-magnetic spacer layer stacked between the magnetization fixed layer and the magnetization free layer, wherein the magnetization fixed layer includes a first fixed layer and a second fixed layer formed of a ferromagnetic material, and a magnetic coupling layer stacked between the first fixed layer and the second fixed layer, the first fixed layer and the second fixed layer are magnetically coupled to each other by exchange coupling via the magnetic coupling layer such that magnetization directions of the first fixed layer and the second fixed layer are antiparallel to each other, and the magnetic coupling layer is a non-magnetic layer that includes Ir and at least one of the following elements: Fe, Co, and Ni. 2. The magnetoresistive effect element according to claim 1 , wherein an absolute value of a lattice mismatch ratio between the magnetic coupling layer and the first fixed layer or the second fixed layer is less than or equal to 7%. 3. The magnetoresistive effect element according to claim 1 , wherein the magnetic coupling layer has an fcc structure or an hcp structure, and each of the first fixed layer and the second fixed layer includes Co, Ni, or an alloy thereof, and has the fcc structure or the hcp structure. 4. A magnetoresistive effect element comprising: a magnetization fixed layer; a magnetization free layer; and a non-magnetic spacer layer stacked between the magnetization fixed layer and the magnetization free layer, wherein the magnetization fixed layer includes a first fixed layer and a second fixed layer formed of a ferromagnetic material, and a magnetic coupling layer stacked between the first fixed layer and the second fixed layer, the first fixed layer and the second fixed layer are magnetically coupled to each other by exchange coupling via the magnetic coupling layer such that magnetization directions of the first fixed layer and the second fixed layer are antiparallel to each other, the magnetic coupling layer is a non-magnetic layer that includes Ir and at least one of the following elements: Cr, Mn, Fe, Co, and Ni, the magnetization fixed layer further includes a first interposed layer and a second interposed layer stacked between the first fixed layer and the magnetic coupling layer, the first interposed layer is in contact with the first fixed layer, and the second interposed layer is in contact with the first interposed layer and the magnetic coupling layer, a main element of the magnetic coupling layer and the first interposed layer is Ir, a main element of the second interposed layer is an element other than Ir, a thickness of the first interposed layer is greater than or equal to 1.5 times and less than or equal to 3.2 times an atomic radius of Ir, and a thickness of the second interposed layer is less than or equal to 1.5 times an atomic radius of the main element of the second interposed layer. 5. The magnetoresistive effect element according to claim 1 , wherein a thickness of the magnetic coupling layer is less than or equal to 1 nm. 6. A magnetoresistive effect element comprising: a magnetization fixed layer; a magnetization free layer; and a non-magnetic spacer layer stacked between the magnetization fixed layer and the magnetization free layer, wherein the magnetization fixed layer includes a first fixed layer and a second fixed layer formed of a ferromagnetic material, and a magnetic coupling layer stacked between the first fixed layer and the second fixed layer, the first fixed layer and the second fixed layer are magnetically coupled to each other by exchange coupling via the magnetic coupling layer such that magnetization directions of the first fixed layer and the second fixed layer are antiparallel to each other, the magnetic coupling layer is a non-magnetic layer that includes Ir and at least one of the following elements: Cr, Mn, Fe, Co, and Ni, and the magnetic coupling layer includes a first non-magnetic layer and a second non-magnetic layer that include Ir and at least one of the following elements: Cr, Mn, Fe, Co, and Ni, and an intermediate non-magnetic layer formed of Ir or Ru and stacked between the first non-magnetic layer and the second non-magnetic layer. 7. The magnetoresistive effect element according to claim 1 , wherein at least one of the first fixed layer and the second fixed layer has a stack structure represented by [Co/Pt]n, [Co/Pd]n, or [Co/Ni]n. 8. The magnetoresistive effect element according to claim 1 , wherein the magnetization free layer includes a first free layer and a second free layer formed of a ferromagnetic material, and a magnetic coupling layer formed of a non-magnetic material and stacked between the first free layer and the second free layer, and the first free layer and the second free layer are magnetically coupled to each other by exchange coupling via the magnetic coupling layer such that magnetization directions of the first free layer and the second free layer are antiparallel to each other. 9. The magnetoresistive effect element according to claim 1 , further comprising a spin orbit torque interconnect layer disposed such that a spin orbit torque is applied to the magnetization free layer. 10. A magnetic memory comprising the magnetoresistive effect element according to claim 1 as a storage element. 11. The magnetoresistive effect element according to claim 2 , wherein the magnetic coupling layer has an fcc structure or an hcp structure, and each of the first fixed layer and the second fixed layer includes Co, Ni, or an alloy thereof, and has the fcc structure or the hcp structure. 12. A magnetoresistive effect element comprising: a magnetization fixed layer; a magnetization free layer; and a non-magnetic spacer layer stacked between the magnetization fixed layer and the magnetization free layer, wherein the magnetization fixed layer includes a first fixed layer and a second fixed layer formed of a ferromagnetic material, and a magnetic coupling layer stacked between the first fixed layer and the second fixed layer, the first fixed layer and the second fixed layer are magnetically coupled to each other by exchange coupling via the magnetic coupling layer such that magnetization directions of the first fixed layer and the second fixed layer are antiparallel to each other, the magnetic coupling layer is a non-magnetic layer that includes Ir and at least one of the following elements: Cr, Mn, Fe, Co, and Ni, an absolute value of a lattice mismatch ratio between the magnetic coupling layer and the first fixed layer or the second fixed layer is less than or equal to 7%, the magnetization fixed layer further includes a first interposed layer and a second interposed layer stacked between the first fixed layer and the magnetic coupling layer, the first interposed layer is in contact with the first fixed layer, and the second interposed layer is in contact with the first interposed layer and the magnetic coupling layer, a main element of the magnetic coupling layer and the first interposed layer is Ir, a main element of the second interposed layer is an element other than Ir, a thickness of the first interposed layer is greater than or equal to 1.5 times and less than or equal to 3.2 times an atomic radius of Ir, and a thickness of the second interposed layer is less than or equal to 1.5 times an atomic radius of the main element of the second interposed layer. 13. A magnetoresistive effect element comprising: a magnetization fixed layer; a magnetization free layer; and a non-m
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