Catalyst composition and method of preparing polymer including the same
US-2015361196-A1 · Dec 17, 2015 · US
Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2
US10870921B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10870921-B2 |
| Application number | US-201415107170-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 20, 2014 |
| Priority date | Dec 22, 2013 |
| Publication date | Dec 22, 2020 |
| Grant date | Dec 22, 2020 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
Such organotitanium compounds are usefully employed in vapor deposition processes for depositing titanium on substrates, e.g., in the manufacture of microelectronic devices and microelectronic device precursor structures.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of forming a titanium-containing film on a substrate comprising conducting a vapor deposition process using an organotitanium compound comprising a compound of the formula wherein Cp is and each of R 3 , R 4 , R 5 , R 6 , and R 7 is the same as or different from the others, and each is independently selected from H and C 1 -C 12 alkyl.
Assignees
Inventors
Classifications
the material containing titanium, e.g. TiO2 · CPC title
the precursor containing a compound comprising Si · CPC title
using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition (deposition by physical ablation of a target H10P14/6329) · CPC title
- C07F7/28Primary
Titanium compounds · CPC title
- C23C16/45553Primary
characterized by the use of precursors specially adapted for ALD · CPC title
Patent family
Related publications grouped by family.
External sources
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US10870921B2 cover?
- Such organotitanium compounds are usefully employed in vapor deposition processes for depositing titanium on substrates, e.g., in the manufacture of microelectronic devices and microelectronic device precursor structures.
- Who is the assignee on this patent?
- Entegris Inc
- What technology area does this patent fall under?
- Primary CPC classification C07F7/28. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Dec 22 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).