Laser apparatus and extreme ultraviolet light generation system

Patent metadata

Field	Value
Publication number	US-10868403-B2
Application number	US-201916502053-A
Country	US
Kind code	B2
Filing date	Jul 3, 2019
Priority date	Feb 27, 2017
Publication date	Dec 15, 2020
Grant date	Dec 15, 2020

Abstract

A laser apparatus of the present disclosure includes: a master oscillator configured to emit a laser beam; a laser amplifier disposed on an optical path of the laser beam; a propagation optical system disposed on an optical path between the laser amplifier and a target supplied into an EUV chamber in which EUV light is generated; and a polarization isolator disposed on an optical path between the laser amplifier and the propagation optical system. The polarization isolator includes: a polarizer configured to emit, selecting from the laser beam incident on the polarizer, a laser beam linearly polarized in a predetermined polarization direction; and a reflection retarder disposed on an optical path between the polarizer and the propagation optical system to convert, through reflection, the laser beam linearly polarized in the predetermined polarization direction into an elliptically polarized laser beam having retardation that reduces retardation occurring at the propagation optical system.

First claim

What is claimed is:

1. A laser apparatus comprising:
a master oscillator configured to emit a laser beam;
a laser amplifier disposed on an optical path of the laser beam;
a propagation optical system disposed on an optical path between the laser amplifier and a target supplied into an EUV chamber in which EUV light is generated;
a polarization isolator disposed on an optical path between the laser amplifier and the propagation optical system, the polarization isolator including:
a polarizer configured to emit, selecting from the laser beam incident on the polarizer, a laser beam linearly polarized in a predetermined polarization direction; and
a reflection retarder disposed on an optical path between the polarizer and the propagation optical system to convert, through reflection, the laser beam linearly polarized in the predetermined polarization direction into an elliptically polarized laser beam having retardation that reduces retardation occurring at the propagation optical system; and

a direction adjustment mechanism configured to adjust a traveling direction of the elliptically polarized laser beam so that an incident optical axis of the elliptically polarized laser beam on the propagation optical system is substantially constant.

2. A laser apparatus comprising:
a master oscillator configured to emit a laser beam;
a laser amplifier disposed on an optical path of the laser beam;
a propagation optical system disposed on an optical path between the laser amplifier and a target supplied into an EUV chamber in which EUV light is generated;
a polarization isolator disposed on an optical path between the laser amplifier and the propagation optical system, the polarization isolator including:
a polarizer configured to emit, selecting from the laser beam incident on the polarizer, a laser beam linearly polarized in a predetermined polarization direction; and
a reflection retarder disposed on an optical path between the polarizer and the propagation optical system to convert, through reflection, the laser beam linearly polarized in the predetermined polarization direction into an elliptically polarized laser beam having retardation that reduces retardation occurring at the propagation optical system; and

an arrangement adjusting mechanism configured to adjust an orientation of the reflection retarder;
wherein the arrangement adjusting mechanism includes a rotation mechanism configured to rotate the reflection retarder about an incident optical axis of the laser beam linearly polarized in the predetermined polarization direction.

3. A laser apparatus comprising:
a master oscillator configured to emit a laser beam;
a laser amplifier disposed on an optical path of the laser beam;
a propagation optical system disposed on an optical path between the laser amplifier and a target supplied into an EUV chamber in which EUV light is generated;
a polarization isolator disposed on an optical path between the laser amplifier and the propagation optical system, the polarization isolator including:
a polarizer configured to emit, selecting from the laser beam incident on the polarizer, a laser beam linearly polarized in a predetermined polarization direction; and
a reflection retarder disposed on an optical path between the polarizer and the propagation optical system to convert, through reflection, the laser beam linearly polarized in the predetermined polarization direction into an elliptically polarized laser beam having retardation that reduces retardation occurring at the propagation optical system;

an arrangement adjusting mechanism configured to adjust an orientation of the reflection retarder; and
a rotation mechanism configured to rotate the reflection retarder about an intersection point between an incident optical axis of the laser beam linearly polarized in the predetermined polarization direction and a reflection surface of the reflection retarder.

4. The laser apparatus according to claim 2 , further comprising:
a light detection unit disposed on an optical path between the master oscillator and the polarization isolator and configured to detect a returning laser beam from the target; and
a control unit configured to control the arrangement adjusting mechanism based on a result of the detection by the light detection unit.

5. The laser apparatus according to claim 3 , further comprising:
a light detection unit disposed on an optical path between the master oscillator and the polarization isolator and configured to detect a returning laser beam from the target; and
a control unit configured to control the arrangement adjusting mechanism based on a result of the detection by the light detection unit.

Assignees

• Gigaphoton Inc

Inventors

• Kawasuji Yasufumi

Classifications

• H05G2/0086 Primary

  Optical arrangements for conveying the laser beam to the plasma generation location · CPC title

• H01S3/10015 Primary

  by monitoring or controlling, e.g. attenuating, the input signal · CPC title

• H01S3/2232

  Carbon dioxide (CO2) or monoxide [CO] · CPC title

• H01S3/034

  Optical devices within, or forming part of, the tube, e.g. windows, mirrors (reflectors having variable properties or positions for initial adjustment of the resonator H01S3/086) · CPC title

• H01S3/10023

  by functional association of additional optical elements, e.g. filters, gratings, reflectors · CPC title