Treating sulfide glass surfaces and making solid state laminate electrode assemblies

Patent metadata

Field	Value
Publication number	US-10868293-B2
Application number	US-201916663177-A
Country	US
Kind code	B2
Filing date	Oct 24, 2019
Priority date	Jul 7, 2017
Publication date	Dec 15, 2020
Grant date	Dec 15, 2020

Abstract

Methods for making solid-state laminate electrode assemblies include methods of forming a solid electrolyte interphase (SEI) by ion implanting nitrogen and/or phosphorous into the glass surface by ion implantation.

First claim

What is claimed:

1. A method for making a solid-state laminate electrode assembly, the method comprising:
i) providing a lithium ion conducting sulfide glass substrate, the substrate comprising a sulfide glass solid electrolyte sheet having room temperature Li ion conductivity of at least 10 −5 S/cm, the sulfide glass substrate having first and second major surfaces;
ii) injecting nitrogen and/or phosphorous into the first surface of the sulfide glass substrate, wherein the nitrogen and/or phosphorous penetrates the glass surface forming an implanted zone; and
iii) evaporating lithium metal onto the implanted zone of the sulfide glass substrate; wherein at least a portion of the evaporated lithium reacts with the injected nitrogen and/or phosphorous to form a solid electrolyte interphase (SEI) layer comprising lithium and one or both of nitrogen and phosphorous.

2. The method of claim 1 , wherein the implanted zone is substantially uniform and the SEI layer is continuous.

3. The method of claim 1 , wherein the SEI comprises lithium nitride.

4. The method of claim 1 , wherein the SEI comprises lithium phosphide.

5. The method of claim 1 , wherein the SEI is a continuous layer of a lithium nitride and/or lithium phosphide compound.

6. The method of claim 1 , wherein the injecting is performed by ion implantation using a nitrogen and/or phosphorous ion gun.

7. The method of claim 1 , wherein the nitrogen and/or phosphorous ion implantation zone is not greater than 10 nm deep.

8. The method of claim 1 , wherein the nitrogen and/or phosphorous ion implantation zone is not greater than 10-100 nm deep.

9. The method of claim 1 , wherein the nitrogen and/or phosphorous ion implantation zone is not greater than 100-1000 nm deep.

10. The method of claim 1 , wherein the injecting and the lithium evaporation takes place simultaneously.

11. The method of claim 10 , comprising injecting nitrogen and/or phosphorous onto the glass surface prior to lithium evaporation; simultaneously injecting and evaporating lithium metal; and, stopping the nitrogen injection while continuing the evaporation.

Assignees

• Polyplus Battery Co Inc

Inventors

• Visco Steven J
• Nimon Vitaliy
• Nimon Yevgeniy S
• Katz Bruce D
• Swisher Richard L

Classifications

• Y02E60/10

  Energy storage using batteries · CPC title

• C03C17/3626 Primary

  one layer at least containing a nitride, oxynitride, boronitride or carbonitride · CPC title

• C03C2218/151

  by vacuum evaporation · CPC title

• H01M10/052

  Li-accumulators · CPC title

• H01M10/058

  Construction or manufacture · CPC title