Micromechanical component and method for producing a micromechanical component

Patent metadata

Field	Value
Publication number	US-10866407-B2
Application number	US-201816190333-A
Country	US
Kind code	B2
Filing date	Nov 14, 2018
Priority date	Nov 16, 2017
Publication date	Dec 15, 2020
Grant date	Dec 15, 2020

Abstract

A micromechanical component includes a micromirror connected to a mounting support via at least one spring such that the micromirror is adjustable about at least one axis of rotation relative to the mounting support, where the micromirror includes a reflective surface developed at least partially on a first diaphragm surface of a mounted diaphragm of the micromirror, the diaphragm including a second diaphragm surface that faces away from the first diaphragm surface and that is mounted in air or vacuum.

First claim

What is claimed is:

1. A micromechanical component comprising:
a mounting support;
a micromirror that includes a mounted diaphragm including a first diaphragm surface, which is reflective, and a second diaphragm surface that faces away from the first diaphragm surface and is mounted in air or in a vacuum; and
at least one spring via which the micromirror is connected to the mounting support such that the micromirror is adjustable relative to the mounting support about at least one axis of rotation,
wherein a total diaphragm thickness of the mounted diaphragm, from the first diaphragm surface to the second diaphragm surface in a direction perpendicular to the reflective surface, is smaller than or equal to 5 μm.

2. The micromechanical component of claim 1 , wherein the reflective surface is an outer surface of a platinum layer.

3. The micromechanical component of claim 1 , wherein the mounted diaphragm includes a layer stack of at least one silicon oxide layer and at least one silicon nitride layer covering the at least one adjacent silicon oxide layer.

4. The micromechanical component of claim 3 , wherein a total layer thickness, in a direction perpendicular to the reflective surface, of the at least one silicon oxide layer is greater by a factor of at least 2 than a total layer thickness, in the direction perpendicular to the reflective surface, of the at least one silicon nitride layer.

5. The micromechanical component of claim 1 , further comprising, on or in the diaphragm, one or both of (a) a conductor loop that is suppliable with current and (b) a coil that is suppliable with current.

6. The micromechanical component of claim 1 , wherein the diaphragm is mounted by at least one beam.

7. The micromechanical component of claim 1 , wherein the diaphragm is mounted by at least one sub-frame structure.

8. The micromechanical component of claim 1 , wherein the diaphragm is mounted by at least one frame structure.

9. The micromechanical component of claim 1 , wherein the diaphragm is mounted exclusively by at least one tensile force exerted on it by one or both of (a) the at least one spring and (b) the mounting support.

10. A method for producing a micromechanical component, the method comprising:
mounting a micromirror on a mounting support via at least one spring, such that the micromirror is adjustable relative to the mounting support about at least one axis of rotation, wherein the micromirror includes a mounted diaphragm including a first diaphragm surface, which is reflective, and a second diaphragm surface that faces away from the first diaphragm surface and is mounted in air or in a vacuum,
wherein a total diaphragm thickness of the mounted diaphragm, from the first diaphragm surface to the second diaphragm surface in a direction perpendicular to the reflective surface, is smaller than or equal to 5 μm.

11. The production method of claim 10 , wherein the micromirror includes, on or in the diaphragm, one or both of (a) a conductor loop that is suppliable with current and (b) a coil that is suppliable with current.

Assignees

• Bosch Gmbh Robert

Inventors

• Maier Daniel
• Muchow Joerg
• Koepernik Corinna
• Grutzeck Helmut
• Straub Rainer
• Mark Stefan
• Balslink Thorsten

Classifications

• G02B26/085 Primary

  the reflecting means being moved or deformed by electromagnetic means · CPC title

• B81B3/00

  Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes (B81B5/00 takes precedence) · CPC title

• G02B26/105

  with one or more pivoting mirrors or galvano-mirrors (G02B26/101 takes precedence) · CPC title

• G02B26/0833 Primary

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• B81B2203/0154

  Torsion bars · CPC title