Segmented silicone polyamide block copolymers and articles containing the same

US10865330B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10865330-B2
Application numberUS-201716317639-A
CountryUS
Kind codeB2
Filing dateJul 26, 2017
Priority dateJul 28, 2016
Publication dateDec 15, 2020
Grant dateDec 15, 2020

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Segmented silicone polyamide block copolymers that comprise dimer acid residues and articles containing the same.

First claim

Opening claim text (preview).

What is claimed is: 1. A segmented polyamide silicone block copolymer of Formula I wherein each * represents a point of attachment at the end of a repeat unit; each R 1 is independently selected from alkylene, alkenylene, arylene, substituted arylene, heteroarylene, or substituted heteroarylene; each R 2 is independently selected from dimer acid residue, alkene, alkylene, arylene, and heteroarylene, with the proviso that at least one R 2 is dimer acid residue; each R 3 is independently selected from covalent bond, alkylene, substituted alkylene, arylene, and substituted arylene; each R 4 is independently N—R 6 ; each R 5 is independently selected from one or more silicone polymers and one or more polyethers, with the proviso that the one or more silicone polymers constitute at least 60% by weight of all R 5 moieties; each R 6 is independently selected from H and alkyl; each y is the independently from 1 to 1000; each x is independently from 2 to 200; n+m is from 2 to 1000; and m is no more than n/10. 2. A segmented polyamide silicone block copolymer of claim 1 , wherein at least 50% by weight of R 2 , based on the total weight or all R 2 groups, is dimer acid. 3. The segmented block copolymer of claim 1 , wherein each R 5 comprises one or more silicone polymers that are independently selected from poly(diorgano siloxanes). 4. The segmented block copolymer of claim 1 , wherein the poly(diorgano siloxane) is PDMS. 5. The segmented block copolymer of claim 1 , wherein the silicone polymer has a number average molecular weight no less than 1 kD. 6. The segmented block copolymer of claim 1 , wherein the silicone polymer has a number average molecular weight of no greater than 100 kD. 7. The segmented block copolymer of claim 1 , wherein at least one R 5 comprises one or more polyethers. 8. The segmented block copolymer of claim 7 , wherein the one or more polyethers are selected from poly(ethylene glycol), poly(propylene glycol), and copolymers of poly(ethylene glycol) and poly(propylene glycol). 9. The segmented block copolymer of claim 1 , wherein at least one R 3 is alkylene substituted with one or more amines or arylene substituted with one or more amines. 10. The segmented block copolymer of claim 9 , wherein the arylene substituted with one or more amines is m-xylylene diamine. 11. An article comprising a substrate having at least a first major surface and a release layer comprising a segmented block copolymer of claim 1 on the first major surface. 12. An article of claim 11 , wherein the article further comprises a second major surface and an adhesive disposed on the second major surface. 13. An article of claim 12 , wherein the adhesive is a pressure sensitive adhesive. 14. The article of any of claim 11 , wherein the article is a tape. 15. The article of any of claim 11 , wherein the article is a release liner.

Assignees

Inventors

Classifications

  • C08G69/42Primary

    Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen (C08G69/12, C08G69/32 take precedence) · CPC title

  • from polyamines and polymerised unsaturated fatty acids · CPC title

  • Pressure-sensitive adhesives [PSA] · CPC title

  • in the release coating · CPC title

  • the adhesive being pressure-sensitive, i.e. tacky at temperatures inferior to 30°C · CPC title

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What does patent US10865330B2 cover?
Segmented silicone polyamide block copolymers that comprise dimer acid residues and articles containing the same.
Who is the assignee on this patent?
3M Innovative Properties Co
What technology area does this patent fall under?
Primary CPC classification C08G69/42. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 15 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).