Upper-layer film forming composition and method for producing a phase-separated pattern

Patent metadata

Field	Value
Publication number	US-10865262-B2
Application number	US-201716332330-A
Country	US
Kind code	B2
Filing date	Sep 8, 2017
Priority date	Sep 13, 2016
Publication date	Dec 15, 2020
Grant date	Dec 15, 2020

Abstract

An overlay film-forming composition used to cause phase separation to a block copolymer-containing layer formed on a substrate, the composition including: (A) a copolymer that includes (a) a unit structure derived from maleimide structure and a unit structure derived from styrene structure; and (B) an ether compound having 8-16 carbon atoms as a solvent. The overlay film-forming composition exhibits good solubility with respect to a hydrophobic solvent, and is able to induce vertical alignment of a block copolymer without causing dissolution, swelling, and the like of the block copolymer-containing layer formed on the substrate.

First claim

The invention claimed is:

1. A composition, comprising:
an upper-layer that is present directly on a layer comprising a block copolymer that is formed on a substrate, the upper layer including:
(A) a random copolymer comprising (a) a unit structure derived from maleimide structure and a unit structure derived from styrene structure; and
(B) an ether compound as a solvent, the ether compound represented by the following formula (6):
A 1 -O-A 2   Formula (6)

wherein each of A 1 and A 2 independently represents a linear, branched, or cyclic saturated alkyl group having 1 to 15 carbon atoms and being optionally substituted, with the proviso that the ether compound has 8 to 16 carbon atoms; wherein
the layer comprising the block copolymer has domains of the block copolymer that are oriented vertically; and the upper-layer is in the form of an upper-layer film, which is configured for causing phase separation and inducing reorientation of the block copolymer such that the domains of the block copolymer that are oriented vertically are present on the surface of the substrate without dissolving or swelling the layer comprising the block copolymer formed on the substrate, and
the upper-layer film is soluble in a hydrophobic solvent and the block copolymer is insoluble in the hydrophobic solvent.

2. The composition according to claim 1 , wherein the unit structure derived from maleimide structure is represented by the following formula (1):

wherein R 1 represents a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 10 carbon atoms and being optionally substituted with a halogen atom.

3. The composition according to claim 1 , wherein the unit structure derived from styrene structure is represented by the following formula (2):

wherein each of R 2 to R 4 , R 7 , and R 8 independently represents a hydrogen atom, an alkoxy group having 1 to 5 carbon atoms, or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms and being optionally substituted with a halogen atom.

4. The composition according to claim 2 , wherein the unit structure derived from styrene structure is represented by the following formula (2):

wherein each of R 2 to R 4 , R 7 , and R 8 independently represents a hydrogen atom, an alkoxy group having 1 to 5 carbon atoms, or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms and being optionally substituted with a halogen atom.

5. The composition according to claim 1 , wherein the random copolymer (A) further comprises (b) a unit structure derived from (meth)acryl group.

6. The composition according to claim 2 , wherein the random copolymer (A) further comprises (b) a unit structure derived from (meth)acryl group.

7. The composition according to claim 3 , wherein the random copolymer (A) further comprises (b) a unit structure derived from (meth)acryl group.

8. The composition according to claim 4 , wherein the random copolymer (A) further comprises (b) a unit structure derived from (meth)acryl group.

9. The composition according to claim 5 , wherein the unit structure derived from (meth)acryl group is represented by the following formula (3):

wherein each of R 5 and R 6 independently represents a hydrogen atom, an alkoxy group having 1 to 5 carbon atoms, or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms and being optionally substituted with a halogen atom.

10. The composition according to claim 6 , wherein the unit structure derived from (meth)acryl group is represented by the following formula (3):

wherein each of R 5 and R 6 independently represents a hydrogen atom, an alkoxy group having 1 to 5 carbon atoms, or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms and being optionally substituted with a halogen atom.

11. The composition according to claim 7 , wherein the unit structure derived from (meth)acryl group is represented by the following formula (3):

wherein each of R 5 and R 6 independently represents a hydrogen atom, an alkoxy group having 1 to 5 carbon atoms, or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms and being optionally substituted with a halogen atom.

12. The composition according to claim 8 , wherein the unit structure derived from (meth)acryl group is represented by the following formula (3):

wherein each of R 5 and R 6 independently represents a hydrogen atom, an alkoxy group having 1 to 5 carbon atoms, or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms and being optionally substituted with a halogen atom.

13. The composition according to claim 1 , comprising copolymer (A) from copolymerization of a monomer mixture comprising:
a compound represented by the following formula (4):

wherein R 1 represents a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, or an aryl group having 6 to 10 carbon atoms and being optionally substituted with a halogen atom, and
a compound represented by the following formula (5):

wherein each of R 2 to R 4 , R 7 , and R 8 independently represents a hydrogen atom, an alkoxy group having 1 to 5 carbon atoms, or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms and being optionally substituted with a halogen atom.

14. The composition according to claim 1 , wherein each of the A 1 and A 2 of the ether compound independently represents a linear, branched, or cyclic saturated alkyl group having 1 to 15 carbon atoms, with the proviso that the ether compound has 8 to 16 carbon atoms.

Assignees

• Nissan Chemical Corp

Inventors

• Mizuochi Ryuta
• Someya Yasunobu
• Wakayama Hiroyuki
• Sakamoto Rikimaru

Classifications

• H10P76/00

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• H10P50/242

  of Group IV materials · CPC title

• H10P14/2901

  Materials · CPC title

• H10P76/20

  of masks comprising organic materials · CPC title

• C09D153/00

  Coating compositions based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Coating compositions based on derivatives of such polymers · CPC title