Coating apparatus and method of forming coating film

Patent metadata

Field	Value
Publication number	US-10864530-B2
Application number	US-201715435417-A
Country	US
Kind code	B2
Filing date	Feb 17, 2017
Priority date	May 30, 2014
Publication date	Dec 15, 2020
Grant date	Dec 15, 2020

Abstract

A coating apparatus for forming a coating film over a substrate includes a spin chuck for holding and rotating the substrate, a central coating nozzle over a central portion of the substrate, a plurality of first coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same first distance, and a plurality of second coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same second distance, wherein the second distance is greater than the first distance.

First claim

What is claimed is:

1. A coating apparatus for forming a coating film over a substrate, comprising:
a spin chuck for holding and rotating the substrate;
a central coating nozzle over a central portion of the substrate;
a plurality of coating nozzles over the substrate, wherein the coating nozzles comprises all coating nozzles over the substrate, and the coating nozzles comprises:
a plurality of first coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same first distance, the first coating nozzles are nearest ones of the coating nozzles related to the central coating nozzle, the substrate is in a circular shape and has a radius, the first distance between the first coating nozzles and the central coating nozzle is greater than a half of the radius; and
a plurality of second coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same second distance,

wherein the second distance is greater than the first distance;
a coating liquid supply source;
a first supply pipe connecting the coating liquid supply source to the central coating nozzle for transferring a coating liquid from the coating liquid supply source to the central coating nozzle;
a first flow control valve directly connecting the first supply pipe for controlling a first flow rate of the coating liquid in the first supply pipe;
a plurality of second supply pipes connecting the coating liquid supply source to the first coating nozzles for transferring the coating liquid from the coating liquid supply source to the first coating nozzles; and
a plurality of second flow control valves respectively and directly connecting the second supply pipes for controlling a second flow rate of the coating liquid in the second supply pipes.

2. The coating apparatus for forming a coating film over a substrate as claimed in claim 1 , wherein the first coating nozzles are at substantially a same first angular distance from one another with respect to the central coating nozzle.

3. The coating apparatus for forming a coating film over a substrate as claimed in claim 2 , wherein the second coating nozzles are at substantially a same second angular distance from one another with respect to the central coating nozzle.

4. The coating apparatus for forming a coating film over a substrate as claimed in claim 3 , wherein the first angular distance is greater than the second angular distance.

5. The coating apparatus for forming a coating film over a substrate as claimed in claim 1 , wherein there is no coating nozzle between the first coating nozzles and the central coating nozzle.

6. The coating apparatus for forming a coating film over a substrate as claimed in claim 1 , wherein the second coating nozzles are at substantially a same angular distance from one another with respect to the central coating nozzle.

7. The coating apparatus for forming a coating film over a substrate as claimed in claim 1 , wherein the first distance is greater than the difference between the second distance and the first distance.

8. The coating apparatus for forming a coating film over a substrate as claimed in claim 7 , wherein the difference between the second distance and the first distance is greater than a third distance between the second coating nozzles and an edge of the substrate.

9. A coating apparatus for forming a coating film over a substrate, comprising:
a spin chuck for holding and rotating the substrate;
a central coating nozzle over a central portion of the substrate;
a plurality of coating nozzles over the substrate, wherein the coating nozzles comprises all coating nozzles over the substrate, and the coating nozzles comprises:
a plurality of first coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same first distance, the first coating nozzles are nearest ones of the coating nozzles related to the central coating nozzle, the substrate is in a circular shape and has a radius, the first distance between the first coating nozzles and the central coating nozzle is greater than a half of the radius; and
a plurality of second coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same second distance, wherein the second distance is greater than the first distance, and a first number of the second coating nozzles is greater than a second number of the first coating nozzles;

a coating liquid supply source;
a plurality of first supply pipes connecting the coating liquid supply source to the first coating nozzles for transferring a coating liquid from the coating liquid supply source to the first coating nozzles;
a plurality of first flow control valves respectively and directly connecting the first supply pipes for controlling a first flow rate of the coating liquid in the first supply pipes;
a plurality of second supply pipes connecting the coating liquid supply source to the second coating nozzles for transferring the coating liquid from the coating liquid supply source to the second coating nozzles; and
a plurality of second flow control valves respectively and directly connecting the second supply pipes for controlling a second flow rate of the coating liquid in the second supply pipes.

10. The coating apparatus for forming a coating film over a substrate as claimed in claim 9 , further comprising:
a shower head, wherein the central coating nozzle, the first coating nozzles, and the second coating nozzles are fixed to the shower head.

11. The coating apparatus for forming a coating film over a substrate as claimed in claim 10 , further comprising:
a third supply pipe connecting the coating liquid supply source to the central coating nozzle for transferring the coating liquid from the coating liquid supply source to the central coating nozzle; and
a third flow control valve directly connecting the third supply pipe for controlling a third flow rate of the coating liquid in the third supply pipe.

12. The coating apparatus for forming a coating film over a substrate as claimed in claim 11 , wherein the first supply pipes, the second supply pipes, and the third supply pipe pass through the shower head.

13. The coating apparatus for forming a coating film over a substrate as claimed in claim 9 , wherein the first coating nozzles are at substantially a same first angular distance from one another with respect to the central coating nozzle.

14. The coating apparatus for forming a coating film over a substrate as claimed in claim 13 , wherein the second coating nozzles are at substantially a same second angular distance from one another with respect to the central coating nozzle.

15. A coating apparatus for forming a coating film over a substrate, comprising:
a spin chuck for holding and rotating the substrate;
a central coating nozzle over a central portion of the substrate;
a plurality of coating nozzles over the substrate and comprising:
a plurality of first coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same first distance;
a plurality of second coating nozzles surrounding the central coating nozzle and spaced apart from the central coating nozzle by substantially a same second distance, wherein the second distance is greater than the first distance, and there is no coating nozzle between the plurality of first coating nozzles and the plurality of second coating nozzles; and
a plurality of third coating nozzles surrou

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Wang Lan-Hai
• Yang Yong-Hung
• Liu Ding-I
• Liao Si-Wen
• Leu Po-Hsiung
• Lin mao-cheng

Classifications

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• B05B1/185

  characterised by their outlet element; Mounting arrangements therefor · CPC title

• B05B1/30 Primary

  designed to control volume of flow, e.g. with adjustable passages {(B05B11/0094 takes precedence)} · CPC title

• B05B15/60

  Arrangements for mounting, supporting or holding spraying apparatus · CPC title