Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-10847388-B2
Application number	US-201715465031-A
Country	US
Kind code	B2
Filing date	Mar 21, 2017
Priority date	Mar 30, 2016
Publication date	Nov 24, 2020
Grant date	Nov 24, 2020

Abstract

A guard that receives a processing liquid removed off a substrate, is disposed so as to surround a substrate holding unit and a facing member in plan view. The guard forms, together with the substrate and the facing member having a facing surface facing an upper surface of the substrate, a space isolated from an ambient atmosphere. An inert gas supplying unit supplies an inert gas to the space to replace an atmosphere inside the space by the inert gas. A processing liquid supplying nozzle, which extends from an inner wall of the guard so as to be disposed inside the space in a state where the space is formed, supplies the processing liquid to the upper surface of the substrate.

First claim

What is claimed is:

1. A substrate processing apparatus that processes a substrate by a processing liquid, the substrate processing apparatus comprising:
a substrate holder that holds a substrate horizontally;
a facing member, having a facing surface that faces an upper surface of the substrate held by the substrate holder;
a guard that is disposed so as to surround the substrate holder and the facing member in plan view, being capable of defining, together with the substrate held by the substrate holder and the facing member, a space isolated from an ambient atmosphere, and receives the processing liquid removed off the substrate;
a processing liquid supplying nozzle that extends from an inner wall of the guard so as to be disposed inside the space in a state where the space is defined, and supplies the processing liquid to the upper surface of the substrate held by the substrate holder;
an inert gas nozzle that supplies an inert gas to the space to replace an atmosphere inside the space by the inert gas;
a lower side guard that is disposed so as to surround the substrate holder and the facing member in plan view, defines the space from below the guard, and receives the processing liquid removed off the substrate;
a guard lifter which elevates and lowers the guard; and
a lower side guard lifter which elevates and lowers the lower side guard independently from the guard,
wherein an inner side end of the guard in a radial direction of the substrate held by the substrate holder and an inner side end of the lower side guard in the radial direction are positioned radially outward from an outer side end of the facing member in the radial direction,
the guard and the lower side guard are brought towards each other in a vertical direction such that the inner side end of the guard and the inner side end of the lower side guard are located above the upper surface of the substrate, in a state where the processing liquid supplying nozzle is housed in a housing space which is between the guard and the lower side guard,
the apparatus further comprises a second processing liquid supplying nozzle which moves between a retracted position and a processing position, and supplies a second processing liquid to the substrate when the second processing liquid supplying nozzle is positioned at the processing position,
the retracted position is a position where the second processing liquid supplying nozzle is retracted from a gap between the substrate held by the substrate holder and the facing member,
the processing position is a position where the second processing liquid supplying position is positioned in the gap between the substrate held by the substrate holder and the facing member,
the second processing liquid supplying nozzle moves, through a vertical gap between the guard and the facing member, to go between the retracted position and the processing position,
wherein the apparatus further comprises:
a pivoting shaft that supports the processing liquid supplying nozzle and moves the processing liquid supplying nozzle between the substrate held by the substrate holder and the facing member, and a driving motor that is fixed to the guard and drives the pivoting shaft,
a bracket that is mounted to the guard lifter and fixes the driving motor to the guard,
wherein a portion of the driving motor that is fixed by the bracket overlaps with the guard lifter in plan view, and
a fixed member that is disposed above the guard and is fixed in position in a vertical direction with respect to the substrate holder, and a bellows that is disposed between the guard and the fixed member, isolates the driving motor from the ambient atmosphere, and is extensible and contractible vertically.

2. The substrate processing apparatus according to claim 1 , wherein the pivoting shaft is inserted through a penetrating hole formed in the guard, and the driving motor is disposed outside the space in the state where the space is defined.

3. The substrate processing apparatus according to claim 1 , wherein the guard includes a cylindrical portion that surrounds the substrate holder, and a flat portion that extends from the cylindrical portion and is flat in a horizontal direction,
the lower side guard includes a facing portion that extends incliningly with respect to the horizontal direction and faces the flat portion from below, and
the housing space is defined by the cylindrical portion, the flat portion, and the facing portion.

4. The substrate processing apparatus according to claim 1 , further comprising: a base which is supported by the bracket and on which the driving motor is placed and fixed; and
a second bracket which is connected to the guard and supports the base.

5. The substrate processing apparatus according to claim 1 , further comprising: a cover which houses a lower end of the driving motor, and is fixed to the guard from above,
wherein the bellows extends between the cover and the fixed member so as to surround the driving motor which partially protrudes upward from the cover.

6. The substrate processing apparatus according to claim 1 , wherein the guard includes a cylinder portion which surrounds the substrate holder, and an extension portion which extends from the cylinder portion toward the substrate holder,
the extension portion includes an inclined portion which is inclined with respect to a horizontal direction so as to head upward toward the substrate holder, and a flat portion which is adjacent to the inclined portion from a circumferential direction of the cylinder portion and extends in the horizontal direction so as to be located higher than the inclined portion,
the lower side guard includes a facing portion which extends incliningly with respect to the horizontal direction and faces the extension portion from below, and
the housing space is defined by the cylinder portion, the flat portion and the facing portion.

7. The substrate processing apparatus according to claim 1 , further comprising:
a liquid eliminating unit that eliminates a liquid attached to a surface of the processing liquid supplying nozzle,
wherein the liquid eliminating unit includes an elastic contacting member which comes in elastic contact with the processing liquid supplying nozzle to eliminate the liquid attached to the surface of the processing liquid supplying nozzle.

8. The substrate processing apparatus according to claim 1 , further comprising:
a liquid eliminating unit that eliminates a liquid attached to a surface of the processing liquid supplying nozzle,
wherein the liquid eliminating unit includes a housing member which has a housing recess for housing the processing liquid supplying nozzle, and a pump which suctions inside the housing recess.

9. The substrate processing apparatus according to claim 1 , wherein the processing liquid supplying nozzle includes:
a circular cylindrical portion which has a nozzle axis extending in a horizontal direction; and
a discharge direction adjusting member which has a discharge port discharging the processing liquid in a direction orthogonal to the horizontal direction, wherein the discharge direction adjusting member is attached to a tip end portion of the circular cylindrical portion so as to adjust a position of the discharge port with respect to the circular cylindrical portion in a circumferential direction of the circular cylindrical portion.

10. The substrate processing apparatus according to claim 1 , wherein the processing liquid supplying nozzle includes:
a circular cylindrical portion which has a nozzle axis extending in a horizontal direction; and
a discharge direction adjusting member which has a discharge port discharging the processing liquid in a direction ot

Assignees

• Screen Holdings Co Ltd

Inventors

• Yoshida Takeshi

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title

• F26B5/08

  by centrifugal treatment · CPC title

• B08B15/04

  from a small area, e.g. a tool {(removing chips B23Q11/0042)} · CPC title