Continuous spectra transmission pyrometry

Patent metadata

Field	Value
Publication number	US-10845249-B2
Application number	US-201815990377-A
Country	US
Kind code	B2
Filing date	May 25, 2018
Priority date	May 26, 2017
Publication date	Nov 24, 2020
Grant date	Nov 24, 2020

Abstract

An apparatus for processing substrates includes a continuum radiation source, a source manifold optically coupled to the continuum radiation source and comprising: a plurality of beam guides, each having a first end that optically couples the beam guide to the continuum radiation source; and a second end. The apparatus also includes a detector manifold to detect radiation originating from the source manifold and transmitted through a processing area, and one or more transmission pyrometers configured to analyze the source radiation and the transmitted radiation to determine an inferred temperature proximate the processing area.

First claim

What is claimed is:

1. A system comprising:
a continuum radiation source to provide source radiation, the continuum radiation source having an emission spectrum comprising wavelengths from about 1000 nm to about 1700 nm;
a source manifold optically coupled to the continuum radiation source and comprising a plurality of beam guides, each beam guide having:
a first end that optically couples the beam guide to the continuum radiation source;
a second end; and
a collimating lens at the second end;

a detector manifold to detect radiation originating from the source manifold and transmitted through a processing area, wherein:
the source manifold and the detector manifold are on opposite sides of the processing area, and
the detector manifold comprises:
a plurality of pyrometer probes, each having a third end to receive the transmitted radiation and a fourth end;
a diffraction grating at the fourth end of each pyrometer probe; and
one or more transmission pyrometers configured to analyze the source radiation and the transmitted radiation from the diffraction grating to determine an inferred temperature of a silicon substrate proximate the processing area.

2. The system of claim 1 , wherein the third ends of the plurality of pyrometry probes are distributed across the processing area.

3. The system of claim 2 , wherein:
the second ends of the plurality of beam guides are distributed across the processing area;
and
at least one of the second ends of the plurality of beam guides aligns with at least one of the third ends of the pyrometer probes.

4. The system of claim 1 , wherein at least one of the transmission pyrometers is configured to measure power as a function of wavelength of the transmitted radiation.

5. The system of claim 4 , wherein the at least one of the transmission pyrometers comprises a spectrometer.

6. The system of claim 4 , wherein the at least one of the transmission pyrometers comprises:
a diffraction grating;
a cylinder lens; and
an indium gallium arsenide linear detector array.

7. The system of claim 1 , wherein the detector manifold comprises at least one of an optical splitter and an optical combiner.

8. The system of claim 1 , wherein the detector manifold comprises a plurality of pyrometer probes, the transmission pyrometer comprising a spectrometer for each of the pyrometer probes.

9. The system of claim 1 , wherein the continuum radiation source is a quantum emission source.

10. The system of claim 1 , wherein:
the second end of at least one of the beam guides is directly coupled to the third end of at least one of the pyrometry probes without passing through the processing area.

11. The system of claim 1 , wherein at least one beam guide comprises a single mode optical fiber.

12. A method comprising:
generating source radiation using a continuum radiation source having an emission spectrum comprising wavelengths from about 1000 nm to about 1700 nm;
directing the source radiation through a source manifold to a receiving surface of a silicon substrate; wherein:
the source radiation is collimated at the receiving surface, and
the source manifold is optically coupled to the continuum radiation source and comprises a plurality of beam guides;

detecting transmitted radiation from an emitting surface of the silicon substrate by receiving transmitted radiation with a plurality of photo probes, the emitting surface being opposite of the receiving surface, wherein:
a detector manifold comprises the plurality of photo probes, and
at least one of the photo probes is aligned with at least one of the beam guides; and

analyzing the source radiation and the transmitted radiation to determine an inferred temperature of the silicon substrate.

13. The method of claim 12 , wherein the analyzing the source radiation and the transmitted radiation comprises measuring power as a function of wavelength of the transmitted radiation.

14. The method of claim 13 , wherein at least one spectrometer is used to measure power as a function of wavelength of the transmitted radiation.

15. The method of claim 12 , wherein the emitting surface of the silicon substrate is identified by a plurality of zones, the method further comprising determining an inferred temperature of each of the plurality of zones of the silicon substrate.

16. The method of claim 12 , wherein the inferred temperature is greater than 350° C.

Assignees

• Applied Materials Inc

Inventors

• Howells Samuel C

Classifications

• G01J5/80 Primary

  Calibration (using comparison with reference sources G01J5/52) · CPC title

• G01J5/53

  Reference sources, e.g. standard lamps; Black bodies · CPC title

• G01J5/0007

  of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing · CPC title

• G01J5/60

  using determination of colour temperature · CPC title

• G01J5/58

  using absorption; using extinction effect · CPC title