Photosensitive adhesive composition

US10844255B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10844255-B2
Application numberUS-201716329068-A
CountryUS
Kind codeB2
Filing dateAug 25, 2017
Priority dateAug 30, 2016
Publication dateNov 24, 2020
Grant dateNov 24, 2020

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A novel photosensitive adhesive composition including the following components (A), (B), (C), and (D): Component (A): a polymer having a structural unit of the following formula (1) and a structure of the following formula (2) at a terminal, Component (B): a polymer having the structural unit of formula (1), and a carboxy group or hydroxy group at a terminal, Component (C): a radical photopolymerization initiator, and Component (D): a solvent, wherein the content by mass of the component (B) is larger than that of the component (A), (wherein X is a C 1-6 alkyl group, a vinyl group, an allyl group, or a glycidyl group, m and n are each independently 0 or 1, Q is a divalent C 1-16 hydrocarbon group, Z is a divalent C 1-4 linking group, the divalent linking group being bonded to an —O— group in formula (1), and R 1 is a hydrogen atom or a methyl group.)

First claim

Opening claim text (preview).

The invention claimed is: 1. A photosensitive adhesive composition comprising the following components (A), (B), (C), and (D): Component (A): a polymer having a structural unit of the following formula (1) and a structure of the following formula (2) at a terminal, Component (B): a polymer having the structural unit of formula (1), and a carboxy group or hydroxy group at a terminal, Component (C): a radical photopolymerization initiator, and Component (D): a solvent, wherein the content by mass of the component (B) is larger than that of the component (A), wherein X is methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, s-butyl group, t-butyl group, n-pentyl group, 1-methyl-n-butyl group, 2-methyl-n-butyl group, 3-methyl-n-butyl group, 1,1-dimethyl-n-propyl group, 1,2-dimethyl-n-propyl group, 2,2-dimethyl-n-propyl group, 1-ethyl-n-propyl group, n-hexyl group, 1-methyl-n-pentyl group, 2-methyl-n-pentyl group, 3-methyl-n-pentyl group, 4-methyl-n-pentyl group, 1,1-dimethyl-n-butyl group, 1,2-dimethyl-n-butyl group, 1,3-dimethyl-n-butyl group, 2,2-dimethyl-n-butyl group, 2,3-dimethyl-n-butyl group, 3,3-dimethyl-n-butyl group, 1-ethyl-n-butyl group, 2-ethyl-n-butyl group, 1,1,2-trimethyl-n-propyl group, 1,2,2-trimethyl-n-propyl group, 1-ethyl-1-methyl-n-propyl group, 1-ethyl-2-methyl-n-propyl group, —CH═CH 2 , —CH 2 —CH═CH 2 , or m and n are each independently 0 or 1, Q is a divalent C 1-16 hydrocarbon group, Z is a divalent C 1-4 linking group, the divalent linking group being bonded to an —O— group in formula (1), and R 1 is a hydrogen atom or a methyl group. 2. The photosensitive adhesive composition according to claim 1 , wherein the divalent hydrocarbon group of Q in formula (1) is a linear or branched alkylene group, a group containing two carbon atoms bonded through a double bond, or a group containing in a main chain an alicyclic hydrocarbon group or aromatic hydrocarbon group optionally having at least one substituent. 3. The photosensitive adhesive composition according to claim 1 , wherein the divalent linking group of Z in formula (2) is a linear or branched alkylene group optionally having at least one hydroxy group as a substituent. 4. The photosensitive adhesive composition according to claim 1 , wherein the mass ratio of the component (A) to the component (B) is 1:2 to 1:20. 5. The photosensitive adhesive composition according to claim 1 , further comprising a bifunctional (meth)acrylate and/or a multifunctional thiol. 6. An adhesion method comprising steps of: applying the photosensitive adhesive composition according to claim 1 to a first substrate; pre-baking the photosensitive adhesive composition applied to the first substrate at 50° C. to 160° C.; exposing the coating film on the first substrate after the pre-baking; developing the coating film after the exposure; and bonding a second substrate to the first substrate after the development and thermally curing the coating film by heating.

Assignees

Inventors

Classifications

  • Treatment after imagewise removal, e.g. baking · CPC title

  • Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

  • C09J171/08Primary

    Polyethers derived from hydroxy compounds or from their metallic derivatives (C09J171/02 takes precedence) · CPC title

  • having terminal carbon-to-carbon unsaturated bonds · CPC title

  • involving heating of the applied adhesive · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10844255B2 cover?
A novel photosensitive adhesive composition including the following components (A), (B), (C), and (D): Component (A): a polymer having a structural unit of the following formula (1) and a structure of the following formula (2) at a terminal, Component (B): a polymer having the structural unit of formula (1), and a carboxy group or hydroxy group at a terminal, Component (C): a radical photopolym…
Who is the assignee on this patent?
Nissan Chemical Corp
What technology area does this patent fall under?
Primary CPC classification C09J171/08. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 24 2020 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).